DE69233617D1 - Verfahren zum Entfernen einer B2O3-Einkapselungsmasse von einer Struktur - Google Patents

Verfahren zum Entfernen einer B2O3-Einkapselungsmasse von einer Struktur

Info

Publication number
DE69233617D1
DE69233617D1 DE69233617T DE69233617T DE69233617D1 DE 69233617 D1 DE69233617 D1 DE 69233617D1 DE 69233617 T DE69233617 T DE 69233617T DE 69233617 T DE69233617 T DE 69233617T DE 69233617 D1 DE69233617 D1 DE 69233617D1
Authority
DE
Germany
Prior art keywords
encapsulant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69233617T
Other languages
English (en)
Inventor
Paul Klocek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Raytheon Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Raytheon Co filed Critical Raytheon Co
Application granted granted Critical
Publication of DE69233617D1 publication Critical patent/DE69233617D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C30B29/42—Gallium arsenide
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C30B29/44—Gallium phosphide
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/46—Sulfur-, selenium- or tellurium-containing compounds
    • C30B29/48—AIIBVI compounds wherein A is Zn, Cd or Hg, and B is S, Se or Te
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
    • C30B29/64—Flat crystals, e.g. plates, strips or discs
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/207—Filters comprising semiconducting materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/06—Gettering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE69233617T 1991-08-22 1992-08-21 Verfahren zum Entfernen einer B2O3-Einkapselungsmasse von einer Struktur Expired - Lifetime DE69233617D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US74860291A 1991-08-22 1991-08-22

Publications (1)

Publication Number Publication Date
DE69233617D1 true DE69233617D1 (de) 2006-05-24

Family

ID=25010146

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69230962T Expired - Lifetime DE69230962T2 (de) 1991-08-22 1992-08-21 Kristallzüchtungsverfahren zur Herstellung von grossflächigen GaAs und damit hergestellte Infrarot-Fenster/Kuppel
DE69233617T Expired - Lifetime DE69233617D1 (de) 1991-08-22 1992-08-21 Verfahren zum Entfernen einer B2O3-Einkapselungsmasse von einer Struktur

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69230962T Expired - Lifetime DE69230962T2 (de) 1991-08-22 1992-08-21 Kristallzüchtungsverfahren zur Herstellung von grossflächigen GaAs und damit hergestellte Infrarot-Fenster/Kuppel

Country Status (3)

Country Link
US (6) US6010638A (de)
EP (3) EP0906971A3 (de)
DE (2) DE69230962T2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3201305B2 (ja) * 1996-04-26 2001-08-20 住友電気工業株式会社 Ｉｉｉ−ｖ族化合物半導体結晶の製造方法
US6123026A (en) * 1996-11-12 2000-09-26 Raytheon Company System and method for increasing the durability of a sapphire window in high stress environments
KR100381686B1 (ko) * 1997-08-19 2003-04-26 레이티언 캄파니 스트레스가 높은 환경에서 사파이어 윈도우의 내구성을 향상시키기 위한 시스템 및 방법
JP3596337B2 (ja) 1998-03-25 2004-12-02 住友電気工業株式会社 化合物半導体結晶の製造方法
JP3648703B2 (ja) 2000-01-07 2005-05-18 株式会社日鉱マテリアルズ 化合物半導体単結晶の製造方法
US6676847B2 (en) * 2000-02-25 2004-01-13 Ashland Inc. Monocarboxylic acid based antifreeze composition for diesel engines
IL139304A (en) * 2000-10-26 2006-07-05 Rafael Advanced Defense Sys Optical window assembly for use in a supersonic platform
WO2004014870A1 (en) * 2002-08-08 2004-02-19 Boehringer Ingelheim Pharmaceuticals, Inc. Fluorinated phenyl-naphthalenyl-urea compounds as inhibitors of cytokines involved in inflammatory processes
US7148480B2 (en) * 2004-07-14 2006-12-12 The Regents Of The University Of California Polycrystalline optical window materials from nanoceramics
EP1739210B1 (de) * 2005-07-01 2012-03-07 Freiberger Compound Materials GmbH Verfahren zur Herstellung von dotierten Halbleiter-Einkristallen, und III-V-Halbleiter-Einkristall
DE102008032628A1 (de) * 2008-07-11 2010-01-28 Freiberger Compound Materials Gmbh Verfahren zur Herstellung von dotierten Galliumarsenidsubstratwafern mit niedrigem optischen Absorptionskoeffizienten
US8329295B2 (en) * 2008-07-11 2012-12-11 Freiberger Compound Materials Gmbh Process for producing doped gallium arsenide substrate wafers having low optical absorption coefficient
US8023818B2 (en) * 2008-07-24 2011-09-20 Fluke Corporation Articulating infrared window
US9575219B2 (en) 2011-02-11 2017-02-21 Duraiswamy Ravichandran Ultra-high densification of ZnS for nano-grain optical windows
US8426817B2 (en) 2011-03-02 2013-04-23 Texas Biochemicals, Inc. Monodispersed and spherical ZnS for nano-grain optical windows
CN104913897B (zh) * 2015-07-02 2017-09-12 中国科学院光电研究院 一种高空高速环境气动效应的模拟装置

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE927658C (de) * 1952-03-10 1955-05-12 Marconi Wireless Telegraph Co Verfahren zur Gewinnung von Germaniummetall
GB803347A (en) * 1954-08-30 1958-10-22 Siemens Ag Improvements in or relating to optical systems
US3496118A (en) * 1966-04-19 1970-02-17 Bell & Howell Co Iiib-vb compounds
US3533967A (en) * 1966-11-10 1970-10-13 Monsanto Co Double-doped gallium arsenide and method of preparation
US3591340A (en) * 1968-07-11 1971-07-06 Ibm Method for preparing high purity crystalline semiconductive materials in bulk
US3898051A (en) * 1973-12-28 1975-08-05 Crystal Syst Crystal growing
FR2345253A1 (fr) * 1976-03-23 1977-10-21 Radiotechnique Compelec Creuset pour la fabrication d'un lingot de materiau cristallin
SU1124992A1 (ru) * 1977-12-26 1984-11-23 Предприятие П/Я А-3605 Массообменный аппарат
US4243471A (en) * 1978-05-02 1981-01-06 International Business Machines Corporation Method for directional solidification of silicon
JPS58115085A (ja) * 1981-12-28 1983-07-08 Fujitsu Ltd 半導体結晶の製造方法
DE3375410D1 (de) * 1982-09-01 1988-02-25 N.V. Philips' Gloeilampenfabrieken
US4590043A (en) * 1982-12-27 1986-05-20 Sri International Apparatus for obtaining silicon from fluosilicic acid
US4585511A (en) * 1983-07-22 1986-04-29 Cominco Ltd. Method of growing gallium arsenide crystals using boron oxide encapsulant
JPS60221388A (ja) * 1984-04-17 1985-11-06 Sumitomo Electric Ind Ltd ＧａＡｓ単結晶の製造方法
DE3441707C2 (de) * 1984-11-15 1994-01-27 Ringsdorff Werke Gmbh Tiegel zum Herstellen von Kristallen und Verwendung des Tiegels
US4589898A (en) * 1984-12-17 1986-05-20 Ppg Industries, Inc. Method of cleaning heat transfer fins
JPS61256993A (ja) * 1985-05-09 1986-11-14 Toyo Tanso Kk シリコン単結晶引上げ装置用黒鉛子るつぼ及びヒ−タ−
US4773852A (en) * 1985-06-11 1988-09-27 Denki Kagaku Kogyo Kabushiki Kaisha Pyrolytic boron nitride crucible and method for producing the same
JPS6212695A (ja) * 1985-07-10 1987-01-21 Nec Corp 坩堝処理方法
FR2596777B1 (fr) * 1986-04-08 1994-01-21 Etat Francais Cnet Procede de preparation de semi-isolants 3-5 mono-cristallins par dopage et application des semi-isolants ainsi obtenus
US4888242A (en) * 1986-05-27 1989-12-19 Toyo Tanson Co., Ltd. Graphite sheet material
US4826266A (en) * 1986-10-23 1989-05-02 Lockheed Corporation Conductive infrared window
US4738831A (en) * 1986-10-31 1988-04-19 The United States Of America As Represented By The Administrator Of The National Aeronautics & Space Administration Method and apparatus for growing crystals
JPH0712998B2 (ja) * 1986-11-13 1995-02-15 住友電気工業株式会社 ▲ｉｉ▼−▲ｖｉ▼族化合物単結晶成長用ボ−ト
JPS63152186A (ja) * 1986-12-17 1988-06-24 Hitachi Metals Ltd 炭酸ガスレ−ザ用窓材
US5173443A (en) * 1987-02-13 1992-12-22 Northrop Corporation Method of manufacture of optically transparent electrically conductive semiconductor windows
US4840699A (en) * 1987-06-12 1989-06-20 Ghemini Technologies Gallium arsenide crystal growth
DE3732073A1 (de) * 1987-09-23 1989-04-06 Siemens Ag Hochreine innenauskleidung fuer einen elektroniederschachtofen
US5116456A (en) * 1988-04-18 1992-05-26 Solon Technologies, Inc. Apparatus and method for growth of large single crystals in plate/slab form
US4946542A (en) * 1988-12-05 1990-08-07 At&T Bell Laboratories Crystal growth method in crucible with step portion
JPH02160687A (ja) * 1988-12-14 1990-06-20 Mitsui Mining Co Ltd 単結晶製造方法
US4999082A (en) * 1989-09-14 1991-03-12 Akzo America Inc. Process for producing monocrystalline group II-IV or group III-V compounds and products thereof
US5077593A (en) * 1989-12-27 1991-12-31 Hughes Aircraft Company Dark current-free multiquantum well superlattice infrared detector
US5064497A (en) * 1990-03-09 1991-11-12 At&T Bell Laboratories Crystal growth method and apparatus
US5134261A (en) * 1990-03-30 1992-07-28 The United States Of America As Represented By The Secretary Of The Air Force Apparatus and method for controlling gradients in radio frequency heating
US5131975A (en) * 1990-07-10 1992-07-21 The Regents Of The University Of California Controlled growth of semiconductor crystals
JP2543782B2 (ja) * 1990-10-25 1996-10-16 コマツ電子金属株式会社 半導体単結晶引上装置の黒鉛ルツボ

Also Published As

Publication number Publication date
US6010638A (en) 2000-01-04
US5611866A (en) 1997-03-18
EP0529963A2 (de) 1993-03-03
EP0906971A2 (de) 1999-04-07
EP0529963A3 (de) 1995-06-14
EP0913505B1 (de) 2006-04-12
DE69230962T2 (de) 2000-10-05
EP0906971A3 (de) 2002-01-30
EP0913505A3 (de) 2002-03-27
US6287381B1 (en) 2001-09-11
US6277297B1 (en) 2001-08-21
US5716449A (en) 1998-02-10
DE69230962D1 (de) 2000-05-31
EP0913505A2 (de) 1999-05-06
US6287478B1 (en) 2001-09-11
EP0529963B1 (de) 2000-04-26

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