DE69312142D1 - Verfahren zum Herstellen einer zugespitzten Elektrode - Google Patents

Verfahren zum Herstellen einer zugespitzten Elektrode

Info

Publication number
DE69312142D1
DE69312142D1 DE69312142T DE69312142T DE69312142D1 DE 69312142 D1 DE69312142 D1 DE 69312142D1 DE 69312142 T DE69312142 T DE 69312142T DE 69312142 T DE69312142 T DE 69312142T DE 69312142 D1 DE69312142 D1 DE 69312142D1
Authority
DE
Germany
Prior art keywords
making
tapered electrode
tapered
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69312142T
Other languages
English (en)
Other versions
DE69312142T2 (de
Inventor
Remko Horne
Den Heuvel Cornelius Anton Van
Veen Gerardus Nicolaas Ann Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronics NV filed Critical Philips Electronics NV
Application granted granted Critical
Publication of DE69312142D1 publication Critical patent/DE69312142D1/de
Publication of DE69312142T2 publication Critical patent/DE69312142T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3447—Collimators, shutters, apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
DE69312142T 1992-04-02 1993-03-24 Verfahren zum Herstellen einer zugespitzten Elektrode Expired - Fee Related DE69312142T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP92200939 1992-04-02

Publications (2)

Publication Number Publication Date
DE69312142D1 true DE69312142D1 (de) 1997-08-21
DE69312142T2 DE69312142T2 (de) 1998-02-05

Family

ID=8210521

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69312142T Expired - Fee Related DE69312142T2 (de) 1992-04-02 1993-03-24 Verfahren zum Herstellen einer zugespitzten Elektrode

Country Status (4)

Country Link
US (1) US5344352A (de)
EP (1) EP0564028B1 (de)
JP (1) JP3425178B2 (de)
DE (1) DE69312142T2 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5584739A (en) * 1993-02-10 1996-12-17 Futaba Denshi Kogyo K.K Field emission element and process for manufacturing same
JP3212755B2 (ja) * 1993-05-19 2001-09-25 株式会社東芝 針状物質の製造方法およびマイクロエミッタアレイの製造方法
JP2783498B2 (ja) * 1993-10-26 1998-08-06 大阪府 電界放射カソードの製造方法
EP0682125A1 (de) * 1994-05-11 1995-11-15 Applied Materials, Inc. Kontrolle eines Materials, welches von einem Target zerstäubt wird
FR2721751B1 (fr) * 1994-06-27 1996-08-02 Commissariat Energie Atomique Procédé d'élaboration de micropointes à composition contrôlée sur de grandes surfaces.
US5643428A (en) * 1995-02-01 1997-07-01 Advanced Micro Devices, Inc. Multiple tier collimator system for enhanced step coverage and uniformity
FR2733253B1 (fr) 1995-04-24 1997-06-13 Commissariat Energie Atomique Dispositif pour deposer un materiau par evaporation sur des substrats de grande surface
US5746634A (en) * 1996-04-03 1998-05-05 The Regents Of The University Of California Process system and method for fabricating submicron field emission cathodes
US5908340A (en) * 1997-02-03 1999-06-01 Motorola, Inc. Method for fabricating an array of conical electron emitters
KR100627255B1 (ko) * 1998-12-10 2006-11-30 삼성에스디아이 주식회사 전계방출구조 및 그 제조방법_
US6534300B1 (en) 1999-09-14 2003-03-18 Genzyme Glycobiology Research Institute, Inc. Methods for producing highly phosphorylated lysosomal hydrolases
US6770468B1 (en) 1999-09-14 2004-08-03 Genzyme Glycobiology Research Institute, Inc. Phosphodiester-α-GlcNAcase of the lysosomal targeting pathway
US6521897B1 (en) * 2000-11-17 2003-02-18 The Regents Of The University Of California Ion beam collimating grid to reduce added defects
US6800472B2 (en) 2001-12-21 2004-10-05 Genzyme Glycobiology Research Institute, Inc. Expression of lysosomal hydrolase in cells expressing pro-N-acetylglucosamine-1-phosphodiester α-N-acetyl glucosimanidase
US6905856B2 (en) 2001-12-21 2005-06-14 Genzyme Glycobiology Research Institute, Inc. Soluble GlcNAc phosphotransferase
US20030124652A1 (en) * 2001-12-21 2003-07-03 Novazyme Pharmaceuticals, Inc. Methods of producing high mannose glycoproteins in complex carbohydrate deficient cells
DK1350863T3 (da) * 2002-03-19 2006-11-27 Scheuten Glasgroep Bv Anordning og fremgangsmåde til retningsbestemt påföring af deponeringsmateriale på et substrat
US20050056535A1 (en) * 2003-09-15 2005-03-17 Makoto Nagashima Apparatus for low temperature semiconductor fabrication
US7695590B2 (en) 2004-03-26 2010-04-13 Applied Materials, Inc. Chemical vapor deposition plasma reactor having plural ion shower grids
US7291360B2 (en) 2004-03-26 2007-11-06 Applied Materials, Inc. Chemical vapor deposition plasma process using plural ion shower grids
US7244474B2 (en) 2004-03-26 2007-07-17 Applied Materials, Inc. Chemical vapor deposition plasma process using an ion shower grid
US7767561B2 (en) 2004-07-20 2010-08-03 Applied Materials, Inc. Plasma immersion ion implantation reactor having an ion shower grid
US8058156B2 (en) 2004-07-20 2011-11-15 Applied Materials, Inc. Plasma immersion ion implantation reactor having multiple ion shower grids
US20070205096A1 (en) * 2006-03-06 2007-09-06 Makoto Nagashima Magnetron based wafer processing
US8395199B2 (en) 2006-03-25 2013-03-12 4D-S Pty Ltd. Systems and methods for fabricating self-aligned memory cell
US8454810B2 (en) 2006-07-14 2013-06-04 4D-S Pty Ltd. Dual hexagonal shaped plasma source
US7932548B2 (en) 2006-07-14 2011-04-26 4D-S Pty Ltd. Systems and methods for fabricating self-aligned memory cell
US8308915B2 (en) 2006-09-14 2012-11-13 4D-S Pty Ltd. Systems and methods for magnetron deposition
US9567666B2 (en) 2009-01-12 2017-02-14 Guardian Industries Corp Apparatus and method for making sputtered films with reduced stress asymmetry

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2593953B1 (fr) * 1986-01-24 1988-04-29 Commissariat Energie Atomique Procede de fabrication d'un dispositif de visualisation par cathodoluminescence excitee par emission de champ
US4824544A (en) * 1987-10-29 1989-04-25 International Business Machines Corporation Large area cathode lift-off sputter deposition device
DE69129081T2 (de) * 1990-01-29 1998-07-02 Varian Associates Gerät und Verfahren zur Niederschlagung durch einen Kollimator
US5007873A (en) * 1990-02-09 1991-04-16 Motorola, Inc. Non-planar field emission device having an emitter formed with a substantially normal vapor deposition process
US5141459A (en) * 1990-07-18 1992-08-25 International Business Machines Corporation Structures and processes for fabricating field emission cathodes

Also Published As

Publication number Publication date
EP0564028A1 (de) 1993-10-06
DE69312142T2 (de) 1998-02-05
JPH0660805A (ja) 1994-03-04
JP3425178B2 (ja) 2003-07-07
US5344352A (en) 1994-09-06
EP0564028B1 (de) 1997-07-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8339 Ceased/non-payment of the annual fee