DE69221474D1 - Reinigungsbürste für halbleiterscheibe - Google Patents
Reinigungsbürste für halbleiterscheibeInfo
- Publication number
- DE69221474D1 DE69221474D1 DE69221474T DE69221474T DE69221474D1 DE 69221474 D1 DE69221474 D1 DE 69221474D1 DE 69221474 T DE69221474 T DE 69221474T DE 69221474 T DE69221474 T DE 69221474T DE 69221474 D1 DE69221474 D1 DE 69221474D1
- Authority
- DE
- Germany
- Prior art keywords
- cleaning brush
- semiconductor disc
- disc
- semiconductor
- brush
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004140 cleaning Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/674,594 US5144711A (en) | 1991-03-25 | 1991-03-25 | Cleaning brush for semiconductor wafer |
PCT/US1992/002331 WO1992016965A1 (en) | 1991-03-25 | 1992-03-24 | Cleaning brush for semiconductor wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69221474D1 true DE69221474D1 (de) | 1997-09-11 |
DE69221474T2 DE69221474T2 (de) | 1997-12-11 |
Family
ID=24707209
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69221474T Expired - Fee Related DE69221474T2 (de) | 1991-03-25 | 1992-03-24 | Reinigungsbürste für halbleiterscheibe |
Country Status (5)
Country | Link |
---|---|
US (1) | US5144711A (de) |
EP (1) | EP0577762B1 (de) |
JP (1) | JPH06508721A (de) |
DE (1) | DE69221474T2 (de) |
WO (1) | WO1992016965A1 (de) |
Families Citing this family (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04363022A (ja) * | 1991-06-06 | 1992-12-15 | Enya Syst:Kk | 貼付板洗浄装置 |
JP2571487B2 (ja) * | 1991-12-27 | 1997-01-16 | 信越半導体株式会社 | 薄円板状ワークのスクラバー洗浄装置 |
JP3052105B2 (ja) * | 1992-11-20 | 2000-06-12 | 東京エレクトロン株式会社 | 洗浄処理装置 |
DE69421353T2 (de) * | 1993-08-31 | 2000-05-11 | Shoyo Seiki Ohme Kk | Reinigungsgerät |
US5733175A (en) | 1994-04-25 | 1998-03-31 | Leach; Michael A. | Polishing a workpiece using equal velocity at all points overlapping a polisher |
JP3328426B2 (ja) * | 1994-05-12 | 2002-09-24 | 東京エレクトロン株式会社 | 洗浄装置 |
JP3427111B2 (ja) * | 1994-05-13 | 2003-07-14 | 株式会社ニコン | 半導体製造装置、および、液晶表示素子製造用装置 |
US5607341A (en) | 1994-08-08 | 1997-03-04 | Leach; Michael A. | Method and structure for polishing a wafer during manufacture of integrated circuits |
US6080092A (en) * | 1994-10-06 | 2000-06-27 | Xomed Surgical Products, Inc. | Industrial cleaning sponge |
US6130264A (en) | 1994-10-06 | 2000-10-10 | Xomed Surgical Products, Inc. | Synthetic sponge and surgical spear comprising synthetic sponge |
US6004402A (en) * | 1994-10-06 | 1999-12-21 | Xomed Surgical Products, Inc. | Method of cleaning silicon material with a sponge |
TW316995B (de) * | 1995-01-19 | 1997-10-01 | Tokyo Electron Co Ltd | |
JPH08238463A (ja) * | 1995-03-03 | 1996-09-17 | Ebara Corp | 洗浄方法及び洗浄装置 |
US5639311A (en) * | 1995-06-07 | 1997-06-17 | International Business Machines Corporation | Method of cleaning brushes used in post CMP semiconductor wafer cleaning operations |
US6239038B1 (en) | 1995-10-13 | 2001-05-29 | Ziying Wen | Method for chemical processing semiconductor wafers |
US5778481A (en) * | 1996-02-15 | 1998-07-14 | International Business Machines Corporation | Silicon wafer cleaning and polishing pads |
JP3007566B2 (ja) * | 1996-02-16 | 2000-02-07 | 株式会社共立 | ディスククリーナ |
US5861066A (en) * | 1996-05-01 | 1999-01-19 | Ontrak Systems, Inc. | Method and apparatus for cleaning edges of contaminated substrates |
US5675856A (en) * | 1996-06-14 | 1997-10-14 | Solid State Equipment Corp. | Wafer scrubbing device |
US5868857A (en) * | 1996-12-30 | 1999-02-09 | Intel Corporation | Rotating belt wafer edge cleaning apparatus |
US5901399A (en) * | 1996-12-30 | 1999-05-11 | Intel Corporation | Flexible-leaf substrate edge cleaning apparatus |
US5870792A (en) * | 1997-03-31 | 1999-02-16 | Speedfam Corporation | Apparatus for cleaning wafers and discs |
US5870793A (en) * | 1997-05-02 | 1999-02-16 | Integrated Process Equipment Corp. | Brush for scrubbing semiconductor wafers |
JP3320640B2 (ja) * | 1997-07-23 | 2002-09-03 | 東京エレクトロン株式会社 | 洗浄装置 |
JPH1154471A (ja) | 1997-08-05 | 1999-02-26 | Tokyo Electron Ltd | 処理装置及び処理方法 |
EP0898301B1 (de) | 1997-08-18 | 2006-09-27 | Tokyo Electron Limited | Doppelseitenreinigungsmaschine für ein Substrat |
US6234883B1 (en) | 1997-10-01 | 2001-05-22 | Lsi Logic Corporation | Method and apparatus for concurrent pad conditioning and wafer buff in chemical mechanical polishing |
US6006391A (en) * | 1997-11-10 | 1999-12-28 | Speedfam-Ipec Corporation | Workpiece cleaning element with improved rib configuration |
US5894622A (en) * | 1997-12-31 | 1999-04-20 | International Business Machines Corporation | Brush conditioner wing |
US6098867A (en) * | 1998-03-17 | 2000-08-08 | Advanced Micro Devices, Inc. | Automated brush fluxing system for application of controlled amount of flux to packages |
US6076217A (en) | 1998-04-06 | 2000-06-20 | Micron Technology, Inc. | Brush alignment platform |
US5944588A (en) * | 1998-06-25 | 1999-08-31 | International Business Machines Corporation | Chemical mechanical polisher |
JP2000180469A (ja) * | 1998-12-18 | 2000-06-30 | Fujitsu Ltd | 半導体装置用コンタクタ及び半導体装置用コンタクタを用いた試験装置及び半導体装置用コンタクタを用いた試験方法及び半導体装置用コンタクタのクリーニング方法 |
US6368183B1 (en) | 1999-02-03 | 2002-04-09 | Speedfam-Ipec Corporation | Wafer cleaning apparatus and associated wafer processing methods |
DE19919152C1 (de) * | 1999-04-27 | 2000-05-04 | Wacker Chemie Gmbh | Verfahren zur Herstellung von Triorganylhalogensilanen und Diorganyldihalogensilanen |
US6711775B2 (en) * | 1999-06-10 | 2004-03-30 | Lam Research Corporation | System for cleaning a semiconductor wafer |
US6620257B1 (en) * | 1999-06-30 | 2003-09-16 | Hoya Corporation | Scrub cleaning method for substrate and manufacturing method for information recording medium |
US6406358B1 (en) * | 1999-08-05 | 2002-06-18 | Micron Technology, Inc. | Method and apparatus for cleaning a surface of a microelectronic substrate |
US6502271B1 (en) | 2000-01-26 | 2003-01-07 | Speedfam-Ipec Corporation | Method and apparatus for cleaning workpieces with uniform relative velocity |
US6446296B1 (en) | 2000-03-06 | 2002-09-10 | Rite Track Equipment Services, Inc. | Substrate cleaning apparatus with brush force control and method |
US6540841B1 (en) * | 2000-06-30 | 2003-04-01 | Chartered Semiconductor Manufacturing Ltd. | Method and apparatus for removing contaminants from the perimeter of a semiconductor substrate |
US6550091B1 (en) * | 2000-10-04 | 2003-04-22 | Lam Research Corporation | Double-sided wafer edge scrubbing apparatus and method for using the same |
EP1337398A4 (de) | 2000-11-29 | 2005-09-14 | Polymer Group Inc | Bifunktionelles vliestuch |
US6634539B2 (en) | 2001-09-21 | 2003-10-21 | 3M Innovative Properties Company | Adjustable-gap rotary ultrasonic horn mounting apparatus and method for mounting |
KR100462820B1 (ko) * | 2001-11-23 | 2004-12-17 | 학교법인연세대학교 | 작업공구유닛의 배열을 이용한 가공기계장치 |
WO2005016599A1 (en) * | 2003-08-08 | 2005-02-24 | Mykrolys Corporation | Methods and materials for making a monolithic porous pad cast onto a rotatable base |
US7066506B2 (en) * | 2003-09-30 | 2006-06-27 | Key Plastics, Llc | System for preventing inadvertent locking of a vehicle door |
JP5385537B2 (ja) * | 2008-02-26 | 2014-01-08 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP2010114123A (ja) * | 2008-11-04 | 2010-05-20 | Tokyo Electron Ltd | 基板処理装置及び基板洗浄方法 |
CN102755980A (zh) * | 2011-04-25 | 2012-10-31 | 中芯国际集成电路制造(上海)有限公司 | 晶圆清洗刷和晶圆清洗装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2530530A (en) * | 1947-10-29 | 1950-11-21 | Frank W Littlefield | Buffing and polishing wheel |
US3150401A (en) * | 1963-01-31 | 1964-09-29 | William W Taylor | Phonograph record cleaner |
JPS58182234A (ja) * | 1982-04-17 | 1983-10-25 | Dainippon Screen Mfg Co Ltd | 複数種のブラシ使用可能な洗浄装置 |
JPS596974A (ja) * | 1982-07-05 | 1984-01-14 | カネボウ株式会社 | 洗浄方法 |
US4486911A (en) * | 1983-12-02 | 1984-12-11 | Beke Steven J | Automatic barbecue-grille cleaner |
JPH0695508B2 (ja) * | 1986-11-28 | 1994-11-24 | 大日本スクリ−ン製造株式会社 | 基板の両面洗浄装置 |
JP2660248B2 (ja) * | 1988-01-06 | 1997-10-08 | 株式会社 半導体エネルギー研究所 | 光を用いた膜形成方法 |
-
1991
- 1991-03-25 US US07/674,594 patent/US5144711A/en not_active Expired - Lifetime
-
1992
- 1992-03-24 EP EP92910811A patent/EP0577762B1/de not_active Expired - Lifetime
- 1992-03-24 DE DE69221474T patent/DE69221474T2/de not_active Expired - Fee Related
- 1992-03-24 WO PCT/US1992/002331 patent/WO1992016965A1/en active IP Right Grant
- 1992-03-24 JP JP4509976A patent/JPH06508721A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPH06508721A (ja) | 1994-09-29 |
EP0577762A1 (de) | 1994-01-12 |
EP0577762B1 (de) | 1997-08-06 |
WO1992016965A1 (en) | 1992-10-01 |
DE69221474T2 (de) | 1997-12-11 |
US5144711A (en) | 1992-09-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |