DE69221340T2 - Verfahren und Vorrichtung zur wiederholten Abbildung eines Maskermusters auf einem Substrat - Google Patents

Verfahren und Vorrichtung zur wiederholten Abbildung eines Maskermusters auf einem Substrat

Info

Publication number
DE69221340T2
DE69221340T2 DE69221340T DE69221340T DE69221340T2 DE 69221340 T2 DE69221340 T2 DE 69221340T2 DE 69221340 T DE69221340 T DE 69221340T DE 69221340 T DE69221340 T DE 69221340T DE 69221340 T2 DE69221340 T2 DE 69221340T2
Authority
DE
Germany
Prior art keywords
substrate
mask pattern
repetitively imaging
repetitively
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69221340T
Other languages
English (en)
Other versions
DE69221340D1 (de
Inventor
Den Brink Marinus Aart Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=19858843&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69221340(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE69221340D1 publication Critical patent/DE69221340D1/de
Application granted granted Critical
Publication of DE69221340T2 publication Critical patent/DE69221340T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE69221340T 1991-02-07 1992-01-30 Verfahren und Vorrichtung zur wiederholten Abbildung eines Maskermusters auf einem Substrat Expired - Lifetime DE69221340T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL9100215A NL9100215A (nl) 1991-02-07 1991-02-07 Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.

Publications (2)

Publication Number Publication Date
DE69221340D1 DE69221340D1 (de) 1997-09-11
DE69221340T2 true DE69221340T2 (de) 1998-02-12

Family

ID=19858843

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69221340T Expired - Lifetime DE69221340T2 (de) 1991-02-07 1992-01-30 Verfahren und Vorrichtung zur wiederholten Abbildung eines Maskermusters auf einem Substrat

Country Status (6)

Country Link
US (1) US5801832A (de)
EP (1) EP0498499B1 (de)
JP (1) JP3034115B2 (de)
KR (1) KR100262992B1 (de)
DE (1) DE69221340T2 (de)
NL (1) NL9100215A (de)

Cited By (1)

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Publication number Priority date Publication date Assignee Title
DE102007049103A1 (de) * 2007-10-11 2009-04-16 Vistec Semiconductor Systems Gmbh System zum Bestimmen der lagerichtigen Position einer Maske in einer Ablage einer Koordinaten-Messmaschine

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DE102007049103A1 (de) * 2007-10-11 2009-04-16 Vistec Semiconductor Systems Gmbh System zum Bestimmen der lagerichtigen Position einer Maske in einer Ablage einer Koordinaten-Messmaschine
DE102007049103B4 (de) * 2007-10-11 2011-03-31 Vistec Semiconductor Systems Gmbh System zum Bestimmen der lagerichtigen Position einer Maske in einer Ablage einer Koordinaten-Messmaschine

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KR920016864A (ko) 1992-09-25
EP0498499B1 (de) 1997-08-06
DE69221340D1 (de) 1997-09-11
US5801832A (en) 1998-09-01
KR100262992B1 (ko) 2000-08-01
EP0498499A1 (de) 1992-08-12
JP3034115B2 (ja) 2000-04-17
JPH04316312A (ja) 1992-11-06

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