DE69432092D1 - Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters - Google Patents

Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters

Info

Publication number
DE69432092D1
DE69432092D1 DE69432092T DE69432092T DE69432092D1 DE 69432092 D1 DE69432092 D1 DE 69432092D1 DE 69432092 T DE69432092 T DE 69432092T DE 69432092 T DE69432092 T DE 69432092T DE 69432092 D1 DE69432092 D1 DE 69432092D1
Authority
DE
Germany
Prior art keywords
scale
changing
printed pattern
printed
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69432092T
Other languages
English (en)
Inventor
Francis Stace Murray Clube
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HOLTRONIC TECHNOLOGIES PLC LON
Original Assignee
HOLTRONIC TECHNOLOGIES PLC LON
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HOLTRONIC TECHNOLOGIES PLC LON filed Critical HOLTRONIC TECHNOLOGIES PLC LON
Application granted granted Critical
Publication of DE69432092D1 publication Critical patent/DE69432092D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/20—Copying holograms by holographic, i.e. optical means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Holo Graphy (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Exposure In Printing And Copying (AREA)
DE69432092T 1993-05-24 1994-05-21 Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters Expired - Lifetime DE69432092D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US6548893A 1993-05-24 1993-05-24

Publications (1)

Publication Number Publication Date
DE69432092D1 true DE69432092D1 (de) 2003-03-13

Family

ID=22063091

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69432092T Expired - Lifetime DE69432092D1 (de) 1993-05-24 1994-05-21 Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters

Country Status (5)

Country Link
US (1) US5695894A (de)
EP (1) EP0627666B1 (de)
JP (1) JP3616658B2 (de)
KR (1) KR100313355B1 (de)
DE (1) DE69432092D1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69432092D1 (de) * 1993-05-24 2003-03-13 Holtronic Technologies Plc Lon Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters
US5566199A (en) * 1993-12-29 1996-10-15 Kepros; John G. Holographic technique for extreme microcircuitry size reduction
DE19532038A1 (de) * 1995-08-31 1997-03-06 Daimler Benz Aerospace Ag Verfahren zum Vortäuschen von Objekten
JP3634563B2 (ja) * 1997-05-09 2005-03-30 キヤノン株式会社 露光方法および装置並びにデバイス製造方法
US5834785A (en) * 1997-06-06 1998-11-10 Nikon Corporation Method and apparatus to compensate for thermal expansion in a lithographic process
JP4033360B2 (ja) * 1997-06-27 2008-01-16 大日本印刷株式会社 反射型ホログラム複製方法
US6384764B1 (en) 2000-01-14 2002-05-07 Todd Cumberland Inflatable radar reflector
US7049617B2 (en) * 2001-07-26 2006-05-23 Seiko Epson Corporation Thickness measurement in an exposure device for exposure of a film with a hologram mask, exposure method and semiconductor device manufacturing method
JP2003279705A (ja) * 2002-03-25 2003-10-02 Sanyo Electric Co Ltd 反射防止部材
EP1810085B1 (de) * 2004-10-22 2011-03-16 Eulitha AG System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe
US20060121357A1 (en) * 2004-12-02 2006-06-08 Holtronic Technologies Plc. Large pattern printing
JP4822022B2 (ja) * 2005-02-25 2011-11-24 株式会社ニコン 露光方法および装置、ならびに電子デバイス製造方法
US7522323B2 (en) * 2005-10-24 2009-04-21 Francis Stace Murray Clube Method and apparatus for printing a pattern with improved focus correction and higher throughput
JP4950550B2 (ja) * 2006-04-21 2012-06-13 株式会社東芝 パターン合わせずれ計測方法およびプログラム
KR20100093665A (ko) * 2009-02-17 2010-08-26 삼성전자주식회사 홀로그램 노광 장치
KR20100093666A (ko) * 2009-02-17 2010-08-26 삼성전자주식회사 홀로그램 노광 장치
US20140030895A1 (en) * 2012-07-30 2014-01-30 University Of Utah Research Foundation Methods and system for generating a three-dimensional holographic mask
WO2015077666A1 (en) * 2013-11-22 2015-05-28 Wasatch Photonics, Inc. System and method for holography-based fabrication
US20160159232A1 (en) * 2013-11-22 2016-06-09 Wasatch Photonics, Inc. Contact apparatus and charging contact unit and method for electrically connecting a vehicle to a charging station

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3551018A (en) * 1969-05-01 1970-12-29 Karl A Stetson Total internal reflection holography
US3610721A (en) * 1969-10-29 1971-10-05 Du Pont Magnetic holograms
SE363173B (de) * 1972-05-25 1974-01-07 Misomex Ab
DE2454750C3 (de) * 1974-11-19 1982-03-18 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren und Anordnung zur Herstellung von Bildmustern für Masken integrierter Schaltkreise mittels aberrationsfreier Bildpunkte von Punkthologrammen
JPS6018983B2 (ja) * 1975-05-20 1985-05-14 ソニー株式会社 露光方法
JPS563618A (en) * 1979-06-21 1981-01-14 Nippon Steel Corp Skid mark removing method in continuous heating furnace
US4735877A (en) * 1985-10-07 1988-04-05 Canon Kabushiki Kaisha Lithographic mask structure and lithographic process
GB8615908D0 (en) * 1986-06-30 1986-08-06 Hugle W B Integrated circuits
US4872747A (en) * 1987-04-15 1989-10-10 Cyberoptics Corporation Use of prisms to obtain anamorphic magnification
GB2211957B (en) * 1987-10-31 1991-12-18 Gen Electric Co Plc Optical projection printing
GB8802333D0 (en) * 1988-02-03 1988-03-02 Holtronic Technologies Ltd Improvements in manufacture of integrated circuits using holographic techniques
DE68922929T2 (de) * 1988-03-23 1996-02-22 Fujitsu Ltd., Kawasaki, Kanagawa Photokathoden-Bildprojektionsapparat für die Mustergestaltung auf einer Halbleitervorrichtung.
DE3879471T2 (de) * 1988-04-21 1993-09-16 Ibm Verfahren zur herstellung eines photoresistmusters und apparat dafuer.
JPH02109086A (ja) * 1988-10-18 1990-04-20 Canon Inc ホログラム焼付装置
DE3910048A1 (de) * 1989-03-28 1990-08-30 Heidelberg Instr Gmbh Laser Un Verfahren zur herstellung oder inspektion von mikrostrukturen auf grossflaechigen substraten
GB8922341D0 (en) * 1989-10-04 1989-11-22 Holtronic Technologies Ltd Apparatus for and method of optical inspection in a total internal reflection holographic imaging system
GB9011165D0 (en) * 1990-05-18 1990-07-04 Holtronic Technologies Ltd Anti-reflection masks
US5157746A (en) * 1990-06-08 1992-10-20 Brother Kogyo Kabushiki Kaisha Optical waveguide array including two-dimensional lens and its manufacturing method
GB2249387B (en) * 1990-10-11 1995-01-25 Holtronic Technologies Ltd Apparatus for and a method of transverse position measurement in proximity lithographic systems
GB2267356B (en) * 1992-03-13 1995-12-06 Holtronic Technologies Ltd Manufacture of high accuracy T1R holograms for full-field lithography processes
GB2271648B (en) * 1992-10-14 1996-04-03 Holtronic Technologies Ltd Apparatus and method for the manufacture of high uniformity total internal reflection holograms
DE69432092D1 (de) * 1993-05-24 2003-03-13 Holtronic Technologies Plc Lon Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters
GB2293459B (en) * 1994-09-22 1997-10-01 Holtronic Technologies Ltd Method for printing of a pattern of features

Also Published As

Publication number Publication date
EP0627666A1 (de) 1994-12-07
JP3616658B2 (ja) 2005-02-02
US5695894A (en) 1997-12-09
EP0627666B1 (de) 2003-02-05
KR940027067A (ko) 1994-12-10
JPH07140885A (ja) 1995-06-02
KR100313355B1 (ko) 2002-04-06

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Legal Events

Date Code Title Description
8332 No legal effect for de