DE69217734D1 - Verfahren zur Herstellung eines supraleitenden Bi-Sr-Ca-Cu-O Films - Google Patents

Verfahren zur Herstellung eines supraleitenden Bi-Sr-Ca-Cu-O Films

Info

Publication number
DE69217734D1
DE69217734D1 DE69217734T DE69217734T DE69217734D1 DE 69217734 D1 DE69217734 D1 DE 69217734D1 DE 69217734 T DE69217734 T DE 69217734T DE 69217734 T DE69217734 T DE 69217734T DE 69217734 D1 DE69217734 D1 DE 69217734D1
Authority
DE
Germany
Prior art keywords
superconducting
producing
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69217734T
Other languages
English (en)
Other versions
DE69217734T2 (de
Inventor
Tsunemi Sugimoto
Mikio Nakagawa
Kazushi Sugawara
Yuh Shiohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Ltd
International Superconductivity Technology Center
Sharp Corp
Ube Corp
Original Assignee
Fujikura Ltd
International Superconductivity Technology Center
Sharp Corp
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Ltd, International Superconductivity Technology Center, Sharp Corp, Ube Industries Ltd filed Critical Fujikura Ltd
Publication of DE69217734D1 publication Critical patent/DE69217734D1/de
Application granted granted Critical
Publication of DE69217734T2 publication Critical patent/DE69217734T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming superconductor layers
    • H10N60/0436—Processes for depositing or forming superconductor layers by chemical vapour deposition [CVD]
    • H10N60/0464—Processes for depositing or forming superconductor layers by chemical vapour deposition [CVD] by metalloorganic chemical vapour deposition [MOCVD]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/922—Static electricity metal bleed-off metallic stock
    • Y10S428/9265—Special properties
    • Y10S428/93—Electric superconducting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/734—From organometallic precursors, e.g. acetylacetonates

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE69217734T 1991-06-24 1992-06-23 Verfahren zur Herstellung eines supraleitenden Bi-Sr-Ca-Cu-O Films Expired - Fee Related DE69217734T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3151689A JP2650513B2 (ja) 1991-06-24 1991-06-24 Ｂｉ−Ｓｒ−Ｃａ−Ｃｕ−Ｏ系超電導膜の製造方法

Publications (2)

Publication Number Publication Date
DE69217734D1 true DE69217734D1 (de) 1997-04-10
DE69217734T2 DE69217734T2 (de) 1997-06-12

Family

ID=15524115

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69217734T Expired - Fee Related DE69217734T2 (de) 1991-06-24 1992-06-23 Verfahren zur Herstellung eines supraleitenden Bi-Sr-Ca-Cu-O Films

Country Status (4)

Country Link
US (1) US5254530A (de)
EP (1) EP0520365B1 (de)
JP (1) JP2650513B2 (de)
DE (1) DE69217734T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5648114A (en) * 1991-12-13 1997-07-15 Symetrix Corporation Chemical vapor deposition process for fabricating layered superlattice materials
JP2518121B2 (ja) * 1991-12-02 1996-07-24 財団法人国際超電導産業技術研究センター ＢｉＳｒＣａＣｕＯ系超電導膜の製造方法
DE19730119A1 (de) * 1997-07-14 1999-01-21 Siemens Ag Verfahren zur Herstellung von Dünnfilmen aus oxidischer Keramik
DE19803740C2 (de) * 1998-01-30 2001-05-31 Mtu Aero Engines Gmbh Gasphasenbeschichtungsverfahren und Vorrichtung zur Gasphasenbeschichtung von Werkstücken
US20040020430A1 (en) * 2002-07-26 2004-02-05 Metal Oxide Technologies, Inc. Method and apparatus for forming a thin film on a tape substrate
US20040016401A1 (en) * 2002-07-26 2004-01-29 Metal Oxide Technologies, Inc. Method and apparatus for forming superconductor material on a tape substrate
US20040023810A1 (en) * 2002-07-26 2004-02-05 Alex Ignatiev Superconductor material on a tape substrate
CN103757692B (zh) * 2014-01-13 2016-05-25 中南大学 一种有序有机半导体单晶阵列薄膜的制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2635355B2 (ja) * 1988-03-22 1997-07-30 日本電信電話株式会社 酸化物超伝導体膜の製造方法
JPH01257194A (ja) * 1988-04-06 1989-10-13 Ube Ind Ltd 単結晶薄膜の製造法
JPH01275434A (ja) * 1988-04-26 1989-11-06 Natl Res Inst For Metals 酸化物高温超電導膜の製造法
JPH02252618A (ja) * 1989-03-27 1990-10-11 Hitachi Ltd Ｂｉ系超電導薄膜の製造方法
US5108983A (en) * 1989-11-21 1992-04-28 Georgia Tech Research Corporation Method for the rapid deposition with low vapor pressure reactants by chemical vapor deposition
CA2037795C (en) * 1990-03-09 1998-10-06 Saburo Tanaka Process for preparing high-temperature superconducting thin films
US5358927A (en) * 1990-05-31 1994-10-25 Bell Communications Research, Inc. Growth of a,b-axis oriented pervoskite thin films

Also Published As

Publication number Publication date
EP0520365A1 (de) 1992-12-30
JPH054897A (ja) 1993-01-14
DE69217734T2 (de) 1997-06-12
US5254530A (en) 1993-10-19
EP0520365B1 (de) 1997-03-05
JP2650513B2 (ja) 1997-09-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee