DE69202014T2 - Verfahren zur Reinigung von gasförmigen organometallischen Verbindungen. - Google Patents

Verfahren zur Reinigung von gasförmigen organometallischen Verbindungen.

Info

Publication number
DE69202014T2
DE69202014T2 DE69202014T DE69202014T DE69202014T2 DE 69202014 T2 DE69202014 T2 DE 69202014T2 DE 69202014 T DE69202014 T DE 69202014T DE 69202014 T DE69202014 T DE 69202014T DE 69202014 T2 DE69202014 T2 DE 69202014T2
Authority
DE
Germany
Prior art keywords
catalyst
gas
process according
copper
purification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69202014T
Other languages
German (de)
English (en)
Other versions
DE69202014D1 (de
Inventor
Keiichi Iwata
Takashi Shimada
Masako Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Pionics Ltd
Original Assignee
Japan Pionics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Pionics Ltd filed Critical Japan Pionics Ltd
Publication of DE69202014D1 publication Critical patent/DE69202014D1/de
Application granted granted Critical
Publication of DE69202014T2 publication Critical patent/DE69202014T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/06—Aluminium compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4402—Reduction of impurities in the source gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
    • C07F3/06—Zinc compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/06—Aluminium compounds
    • C07F5/061—Aluminium compounds with C-aluminium linkage
    • C07F5/062—Al linked exclusively to C
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Catalysts (AREA)
DE69202014T 1991-07-17 1992-07-08 Verfahren zur Reinigung von gasförmigen organometallischen Verbindungen. Expired - Fee Related DE69202014T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP26812291 1991-07-17
JP26812191 1991-07-17

Publications (2)

Publication Number Publication Date
DE69202014D1 DE69202014D1 (de) 1995-05-18
DE69202014T2 true DE69202014T2 (de) 1995-08-31

Family

ID=26548176

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69202014T Expired - Fee Related DE69202014T2 (de) 1991-07-17 1992-07-08 Verfahren zur Reinigung von gasförmigen organometallischen Verbindungen.

Country Status (5)

Country Link
US (1) US5470555A (OSRAM)
EP (1) EP0523525B1 (OSRAM)
KR (1) KR0150470B1 (OSRAM)
DE (1) DE69202014T2 (OSRAM)
TW (1) TW260620B (OSRAM)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69421249T2 (de) * 1993-12-14 2000-07-13 Sumitomo Chemical Co., Ltd. Verfahren zur Entfernung von Sauerstoff-enthaltenden Verunreinigungen aus Organo-Gallium oder -Indium Verbindungen
EP1001049A1 (en) * 1998-11-13 2000-05-17 Epichem Limited Process for purification of organometallic compounds
US6447576B1 (en) * 1999-10-29 2002-09-10 Japan Pionics Co., Ltd. Cleaning agent and cleaning process of harmful gas
TW510820B (en) * 1999-11-30 2002-11-21 Japan Pionics Method of cleaning of harmful gas and cleaning apparatus
JP4073146B2 (ja) * 2000-03-17 2008-04-09 株式会社高純度化学研究所 ガリウムアルコキシドの精製方法
TW550307B (en) * 2000-04-19 2003-09-01 Getters Spa A process for the purification of organometallic compounds or heteroatomic organic compounds with hydrogenated getter alloys
AU5254801A (en) * 2000-04-19 2001-10-30 Saes Getters S.P.A. A process for the purification of organometallic compounds or heteroatomic organic compounds with a catalyst based on iron and manganese supported on zeolites
WO2001078869A1 (en) * 2000-04-19 2001-10-25 Saes Getters S.P.A. A process for the purification of organometallic compounds or heteroatomic organic compounds with a palladium-based catalyst
US6911065B2 (en) * 2002-12-26 2005-06-28 Matheson Tri-Gas, Inc. Method and system for supplying high purity fluid
GB2432364B (en) * 2005-11-18 2009-11-11 Rohm & Haas Elect Mat Organometallic compound purification
KR102043480B1 (ko) 2012-02-10 2019-11-11 엔테그리스, 아이엔씨. 가스 정제기
WO2014105272A1 (en) * 2012-12-31 2014-07-03 Albemarle Corporation Oxygenate removal from organometallic compounds

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2144497A (en) * 1935-11-21 1939-01-17 Westinghouse Electric & Mfg Co Process for freeing gas of oxygen
US2351167A (en) * 1941-10-04 1944-06-13 Du Pont Removal of oxygen from normally gaseous olefins
US3852406A (en) * 1967-06-20 1974-12-03 Messer Griesheim Gmbh Method of removing oxygen from gases
JPS506440A (OSRAM) * 1973-05-17 1975-01-23
US4034062A (en) * 1975-03-20 1977-07-05 Borden, Inc. Removal of oxygen from gas stream with copper catalyst
JPS60209249A (ja) * 1984-04-02 1985-10-21 Olympus Optical Co Ltd 工業用原料ガスの純化剤，その製造方法およびその使用方法
US4713224A (en) * 1986-03-31 1987-12-15 The Boc Group, Inc. One-step process for purifying an inert gas
DE3618942A1 (de) * 1986-06-05 1987-12-10 Messer Griesheim Gmbh Masse zur entfernung durch chemiesorption von homogen geloesten beimengungen, insbesondere sauerstoff, aus gasen oder fluessigkeiten
US4772296A (en) * 1987-05-12 1988-09-20 Eagle-Picher Industries, Inc. Method of purifying and depositing group IIIa and group Va compounds to produce epitaxial films
KR960010082B1 (ko) * 1988-09-26 1996-07-25 니혼 파이오닉스 가부시끼가이샤 기체성 수소화물의 정제방법
JP2732262B2 (ja) * 1988-09-26 1998-03-25 日本パイオニクス株式会社 アルシンの精製方法
JP2700412B2 (ja) * 1989-06-08 1998-01-21 日本パイオニクス株式会社 水素化物ガスの精製方法
US5356672A (en) * 1990-05-09 1994-10-18 Jet Process Corporation Method for microwave plasma assisted supersonic gas jet deposition of thin films
JPH04318920A (ja) * 1991-04-17 1992-11-10 Mitsubishi Electric Corp 気相結晶成長装置

Also Published As

Publication number Publication date
DE69202014D1 (de) 1995-05-18
EP0523525B1 (en) 1995-04-12
KR0150470B1 (ko) 1998-10-15
US5470555A (en) 1995-11-28
TW260620B (OSRAM) 1995-10-21
EP0523525A1 (en) 1993-01-20
KR930002360A (ko) 1993-02-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee