TW260620B - - Google Patents
Info
- Publication number
- TW260620B TW260620B TW081105509A TW81105509A TW260620B TW 260620 B TW260620 B TW 260620B TW 081105509 A TW081105509 A TW 081105509A TW 81105509 A TW81105509 A TW 81105509A TW 260620 B TW260620 B TW 260620B
- Authority
- TW
- Taiwan
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic System
- C07F5/06—Aluminium compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4402—Reduction of impurities in the source gas
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic System
- C07F3/06—Zinc compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic System
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic System
- C07F5/06—Aluminium compounds
- C07F5/061—Aluminium compounds with C-aluminium linkage
- C07F5/062—Al linked exclusively to C
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26812191 | 1991-07-17 | ||
JP26812291 | 1991-07-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW260620B true TW260620B (zh) | 1995-10-21 |
Family
ID=26548176
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW081105509A TW260620B (zh) | 1991-07-17 | 1992-07-13 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5470555A (zh) |
EP (1) | EP0523525B1 (zh) |
KR (1) | KR0150470B1 (zh) |
DE (1) | DE69202014T2 (zh) |
TW (1) | TW260620B (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69421249T2 (de) * | 1993-12-14 | 2000-07-13 | Sumitomo Chemical Co | Verfahren zur Entfernung von Sauerstoff-enthaltenden Verunreinigungen aus Organo-Gallium oder -Indium Verbindungen |
DE1001049T1 (de) * | 1998-11-13 | 2000-11-02 | Epichem Ltd | Verfahren zur Reinigung von organometallischen Verbindungen |
US6447576B1 (en) * | 1999-10-29 | 2002-09-10 | Japan Pionics Co., Ltd. | Cleaning agent and cleaning process of harmful gas |
TW510820B (en) * | 1999-11-30 | 2002-11-21 | Japan Pionics | Method of cleaning of harmful gas and cleaning apparatus |
JP4073146B2 (ja) * | 2000-03-17 | 2008-04-09 | 株式会社高純度化学研究所 | ガリウムアルコキシドの精製方法 |
TW550307B (en) * | 2000-04-19 | 2003-09-01 | Getters Spa | A process for the purification of organometallic compounds or heteroatomic organic compounds with hydrogenated getter alloys |
AU5255001A (en) * | 2000-04-19 | 2001-10-30 | Saes Getters S.P.A. | A process for the purification of organometallic compounds or heteroatomic organic compounds with a palladium-based catalyst |
WO2001079586A1 (en) * | 2000-04-19 | 2001-10-25 | Saes Getters S.P.A. | A process for the purification of organometallic compounds or heteroatomic organic compounds with a catalyst based on iron and manganese supported on zeolites |
US6911065B2 (en) * | 2002-12-26 | 2005-06-28 | Matheson Tri-Gas, Inc. | Method and system for supplying high purity fluid |
GB2432364B (en) * | 2005-11-18 | 2009-11-11 | Rohm & Haas Elect Mat | Organometallic compound purification |
EP3207976B1 (en) | 2012-02-10 | 2021-06-30 | Entegris, Inc. | Gas purifier |
WO2014105272A1 (en) * | 2012-12-31 | 2014-07-03 | Albemarle Corporation | Oxygenate removal from organometallic compounds |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2144497A (en) * | 1935-11-21 | 1939-01-17 | Westinghouse Electric & Mfg Co | Process for freeing gas of oxygen |
US2351167A (en) * | 1941-10-04 | 1944-06-13 | Du Pont | Removal of oxygen from normally gaseous olefins |
US3852406A (en) * | 1967-06-20 | 1974-12-03 | Messer Griesheim Gmbh | Method of removing oxygen from gases |
JPS506440A (zh) * | 1973-05-17 | 1975-01-23 | ||
US4034062A (en) * | 1975-03-20 | 1977-07-05 | Borden, Inc. | Removal of oxygen from gas stream with copper catalyst |
JPS60209249A (ja) * | 1984-04-02 | 1985-10-21 | Olympus Optical Co Ltd | 工業用原料ガスの純化剤,その製造方法およびその使用方法 |
US4713224A (en) * | 1986-03-31 | 1987-12-15 | The Boc Group, Inc. | One-step process for purifying an inert gas |
DE3618942A1 (de) * | 1986-06-05 | 1987-12-10 | Messer Griesheim Gmbh | Masse zur entfernung durch chemiesorption von homogen geloesten beimengungen, insbesondere sauerstoff, aus gasen oder fluessigkeiten |
US4772296A (en) * | 1987-05-12 | 1988-09-20 | Eagle-Picher Industries, Inc. | Method of purifying and depositing group IIIa and group Va compounds to produce epitaxial films |
JP2732262B2 (ja) * | 1988-09-26 | 1998-03-25 | 日本パイオニクス株式会社 | アルシンの精製方法 |
KR960010082B1 (ko) * | 1988-09-26 | 1996-07-25 | 니혼 파이오닉스 가부시끼가이샤 | 기체성 수소화물의 정제방법 |
JP2700412B2 (ja) * | 1989-06-08 | 1998-01-21 | 日本パイオニクス株式会社 | 水素化物ガスの精製方法 |
US5356672A (en) * | 1990-05-09 | 1994-10-18 | Jet Process Corporation | Method for microwave plasma assisted supersonic gas jet deposition of thin films |
JPH04318920A (ja) * | 1991-04-17 | 1992-11-10 | Mitsubishi Electric Corp | 気相結晶成長装置 |
-
1992
- 1992-07-08 DE DE69202014T patent/DE69202014T2/de not_active Expired - Fee Related
- 1992-07-08 EP EP92111557A patent/EP0523525B1/en not_active Expired - Lifetime
- 1992-07-13 TW TW081105509A patent/TW260620B/zh active
- 1992-07-16 KR KR1019920012699A patent/KR0150470B1/ko not_active IP Right Cessation
-
1994
- 1994-02-23 US US08/202,701 patent/US5470555A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0523525A1 (en) | 1993-01-20 |
DE69202014T2 (de) | 1995-08-31 |
EP0523525B1 (en) | 1995-04-12 |
US5470555A (en) | 1995-11-28 |
KR930002360A (ko) | 1993-02-23 |
KR0150470B1 (ko) | 1998-10-15 |
DE69202014D1 (de) | 1995-05-18 |