DE69132441T2 - Ladungsträgerstrahlgerät - Google Patents

Ladungsträgerstrahlgerät

Info

Publication number
DE69132441T2
DE69132441T2 DE69132441T DE69132441T DE69132441T2 DE 69132441 T2 DE69132441 T2 DE 69132441T2 DE 69132441 T DE69132441 T DE 69132441T DE 69132441 T DE69132441 T DE 69132441T DE 69132441 T2 DE69132441 T2 DE 69132441T2
Authority
DE
Germany
Prior art keywords
beam device
charge beam
charge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69132441T
Other languages
English (en)
Other versions
DE69132441D1 (de
Inventor
Hironobu Matsui
Mikio Ichihashi
Shinjiroo Ueda
Tadashi Otaka
Kazue Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP02159663A external-priority patent/JP3091850B2/ja
Priority claimed from JP2159664A external-priority patent/JP3058657B2/ja
Priority claimed from JP2175214A external-priority patent/JPH0465057A/ja
Priority claimed from JP2211579A external-priority patent/JPH0779016B2/ja
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE69132441D1 publication Critical patent/DE69132441D1/de
Application granted granted Critical
Publication of DE69132441T2 publication Critical patent/DE69132441T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69132441T 1990-06-20 1991-06-18 Ladungsträgerstrahlgerät Expired - Fee Related DE69132441T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP02159663A JP3091850B2 (ja) 1990-06-20 1990-06-20 荷電粒子線装置
JP2159664A JP3058657B2 (ja) 1990-06-20 1990-06-20 荷電粒子線装置
JP2175214A JPH0465057A (ja) 1990-07-04 1990-07-04 荷電粒子線装置
JP2211579A JPH0779016B2 (ja) 1990-08-13 1990-08-13 荷電粒子線装置

Publications (2)

Publication Number Publication Date
DE69132441D1 DE69132441D1 (de) 2000-11-16
DE69132441T2 true DE69132441T2 (de) 2001-06-07

Family

ID=27473627

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69132441T Expired - Fee Related DE69132441T2 (de) 1990-06-20 1991-06-18 Ladungsträgerstrahlgerät

Country Status (3)

Country Link
US (2) US5254856A (de)
EP (1) EP0462554B1 (de)
DE (1) DE69132441T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
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DE102005042809A1 (de) * 2005-09-08 2007-03-15 Geoforschungszentrum Potsdam Aktive Messeinrichtung, insbesondere Sekundärionen-Massenspektrometer

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EP0462554B1 (de) * 1990-06-20 2000-10-11 Hitachi, Ltd. Ladungsträgerstrahlgerät
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EP1623790B1 (de) * 2004-08-06 2008-12-10 Trumpf Werkzeugmaschinen GmbH + Co. KG Laserbearbeitungskopf
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JP4930754B2 (ja) * 2006-01-25 2012-05-16 エスアイアイ・ナノテクノロジー株式会社 荷電粒子ビーム装置
EP1982346A4 (de) * 2006-02-02 2014-05-07 Cebt Co Ltd Einrichtung zum aufrechterhalten von differenzunterdruckgraden für eine elektronensäule
ATE512457T1 (de) * 2006-06-07 2011-06-15 Fei Co Gleitlager zur verwendung mit einer eine vakuumkammer umfassenden vorrichtung
CN101461026B (zh) 2006-06-07 2012-01-18 Fei公司 与包含真空室的装置一起使用的滑动轴承
JP4946256B2 (ja) * 2006-08-11 2012-06-06 日新イオン機器株式会社 電界レンズおよびそれを備えるイオン注入装置
US8246314B2 (en) * 2007-02-16 2012-08-21 National Institute Of Information And Communications Technology Ion pump device
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EP2249373B1 (de) * 2008-02-14 2017-08-02 National Institute of Information and Communications Technology Ionenpumpensystem und elektromagnetischer feldgenerator
JP5306186B2 (ja) * 2008-03-26 2013-10-02 株式会社堀場製作所 荷電粒子線用静電レンズ
DE112009001537B8 (de) 2008-06-20 2019-01-24 Hitachi High-Technologies Corporation Vorrichtung mit geladenem Teilchenstrahl und Verfahren zum Steuern der Vorrichtung
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EP2431996B1 (de) 2010-09-17 2016-03-23 Deutsches Elektronen-Synchrotron DESY Vakuumionenpumpe
WO2013006085A1 (ru) * 2011-07-04 2013-01-10 Misakyan Mamikon Aramovich Микроволновой газоразрядный источник уф излучения
TWI489222B (zh) * 2012-02-16 2015-06-21 Nuflare Technology Inc Electron beam rendering device and electron beam rendering method
TWI674620B (zh) * 2013-12-13 2019-10-11 日商荏原製作所股份有限公司 真空磁性遮蔽容器的構造
TWI674392B (zh) * 2014-03-27 2019-10-11 日商荏原製作所股份有限公司 頂板開閉機構及檢查裝置
US10804084B2 (en) 2015-09-16 2020-10-13 Hitachi High-Tech Corporation Vacuum apparatus
CN106935478B (zh) * 2015-12-31 2018-08-17 合肥美亚光电技术股份有限公司 一种离子加速偏转装置
JP6872380B2 (ja) * 2017-02-03 2021-05-19 日立造船株式会社 ノズル式電子線照射装置
WO2019049261A1 (ja) * 2017-09-07 2019-03-14 株式会社日立ハイテクノロジーズ 電子銃および電子ビーム応用装置
JP7150634B2 (ja) * 2019-02-21 2022-10-11 株式会社荏原製作所 電子線照射装置および電子ビームの位置合わせ方法
SE543575C2 (en) * 2019-08-30 2021-04-06 Scienta Omicron Ab Electrostatic lens for controlling beam of charged particles
CN114303229A (zh) * 2019-08-30 2022-04-08 盛达欧米科有限公司 用于控制电子束的静电透镜

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005042809A1 (de) * 2005-09-08 2007-03-15 Geoforschungszentrum Potsdam Aktive Messeinrichtung, insbesondere Sekundärionen-Massenspektrometer
DE102005042809B4 (de) * 2005-09-08 2008-12-11 Geoforschungszentrum Potsdam Aktive Messeinrichtung, insbesondere Sekundärionen-Massenspektrometer

Also Published As

Publication number Publication date
DE69132441D1 (de) 2000-11-16
EP0462554B1 (de) 2000-10-11
US5442183A (en) 1995-08-15
EP0462554A3 (en) 1992-06-24
EP0462554A2 (de) 1991-12-27
US5254856A (en) 1993-10-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee