DE69133063T2 - Ladungsträgerstrahlgerät - Google Patents

Ladungsträgerstrahlgerät

Info

Publication number
DE69133063T2
DE69133063T2 DE69133063T DE69133063T DE69133063T2 DE 69133063 T2 DE69133063 T2 DE 69133063T2 DE 69133063 T DE69133063 T DE 69133063T DE 69133063 T DE69133063 T DE 69133063T DE 69133063 T2 DE69133063 T2 DE 69133063T2
Authority
DE
Germany
Prior art keywords
charged particle
particle beam
beam device
charged
particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69133063T
Other languages
English (en)
Other versions
DE69133063D1 (de
Inventor
Hironobu Matsui
Mikio Ichihashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27309543&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69133063(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE69133063D1 publication Critical patent/DE69133063D1/de
Application granted granted Critical
Publication of DE69133063T2 publication Critical patent/DE69133063T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y15/00—Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69133063T 1990-04-19 1991-04-19 Ladungsträgerstrahlgerät Expired - Fee Related DE69133063T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10177890 1990-04-19
JP10177990 1990-04-19
JP2110116A JPH071681B2 (ja) 1990-04-19 1990-04-27 荷電粒子線装置

Publications (2)

Publication Number Publication Date
DE69133063D1 DE69133063D1 (de) 2002-08-14
DE69133063T2 true DE69133063T2 (de) 2003-01-30

Family

ID=27309543

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69133063T Expired - Fee Related DE69133063T2 (de) 1990-04-19 1991-04-19 Ladungsträgerstrahlgerät

Country Status (4)

Country Link
US (1) US5187371A (de)
EP (1) EP0452969B1 (de)
JP (1) JPH071681B2 (de)
DE (1) DE69133063T2 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0462554B1 (de) * 1990-06-20 2000-10-11 Hitachi, Ltd. Ladungsträgerstrahlgerät
JPH0582067A (ja) * 1991-09-20 1993-04-02 Jeol Ltd 対物レンズの励磁電流発生方式
JPH10216460A (ja) * 1997-01-31 1998-08-18 Hitachi Ltd 電子ビームガス処理装置
US6504393B1 (en) 1997-07-15 2003-01-07 Applied Materials, Inc. Methods and apparatus for testing semiconductor and integrated circuit structures
EP0989583A1 (de) * 1998-09-25 2000-03-29 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Verfahren und Vorrichtung zur Fokusierung eines Ladungsträgerstrahls
US6252412B1 (en) 1999-01-08 2001-06-26 Schlumberger Technologies, Inc. Method of detecting defects in patterned substrates
JP3738734B2 (ja) * 2002-02-06 2006-01-25 日新電機株式会社 静電加速管およびそれを備えるイオン注入装置
US7528614B2 (en) * 2004-12-22 2009-05-05 Applied Materials, Inc. Apparatus and method for voltage contrast analysis of a wafer using a tilted pre-charging beam
JP3967351B2 (ja) 2004-10-20 2007-08-29 株式会社椿本チエイン 屈曲ストッパピンを備えたテンショナ
ATE537550T1 (de) 2005-07-08 2011-12-15 Nexgen Semi Holding Inc Vorrichtung und verfahren zur kontrollierten fertigung von halbleitern mittels teilchenstrahlen
WO2008140585A1 (en) 2006-11-22 2008-11-20 Nexgen Semi Holding, Inc. Apparatus and method for conformal mask manufacturing
GB0700754D0 (en) * 2007-01-15 2007-02-21 Oxford Instr Analytical Ltd Charged particle analyser and method
JP2008222028A (ja) 2007-03-13 2008-09-25 Honda Motor Co Ltd シリンダ機構
JP5241353B2 (ja) * 2007-07-31 2013-07-17 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡の調整方法、及び走査電子顕微鏡
US8642959B2 (en) * 2007-10-29 2014-02-04 Micron Technology, Inc. Method and system of performing three-dimensional imaging using an electron microscope
DE102007054074A1 (de) * 2007-11-13 2009-05-14 Carl Zeiss Nts Gmbh System zum Bearbeiten eines Objekts
US10991545B2 (en) 2008-06-30 2021-04-27 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
US10566169B1 (en) 2008-06-30 2020-02-18 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
US20110168888A1 (en) * 2010-01-11 2011-07-14 Lawrence Livermore National Security, Llc Weak-lens coupling of high current electron sources to electron microscope columns
US9180288B2 (en) 2011-09-01 2015-11-10 Zoll Medical Corporation Medical equipment electrodes
US8742361B2 (en) * 2012-06-07 2014-06-03 Fei Company Focused charged particle column for operation at different beam energies at a target
US9984847B2 (en) 2013-03-15 2018-05-29 Mars Tohken Solution Co., Ltd. Open-type X-ray tube comprising field emission type electron gun and X-ray inspection apparatus using the same
JP6218403B2 (ja) * 2013-03-15 2017-10-25 株式会社マーストーケンソリューション 電界放射型電子銃を備えたｘ線管及びそれを用いたｘ線検査装置
JP6340165B2 (ja) * 2013-04-25 2018-06-06 株式会社日立ハイテクノロジーズ 電子銃、荷電粒子銃およびそれらを用いた荷電粒子線装置
WO2016166874A1 (ja) * 2015-04-16 2016-10-20 三菱電機株式会社 スクロール圧縮機
US9905391B2 (en) * 2015-04-29 2018-02-27 Kla-Tencor Corporation System and method for imaging a sample with an electron beam with a filtered energy spread
JP2019212766A (ja) * 2018-06-05 2019-12-12 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
JP7051655B2 (ja) * 2018-09-27 2022-04-11 株式会社日立ハイテク 荷電粒子線装置
EP4022669A4 (de) * 2019-08-30 2023-10-11 Scienta Omicron AB Elektrostatische linse zur steuerung eines elektronenstrahls
US11177114B1 (en) * 2020-09-15 2021-11-16 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electrode arrangement, contact assembly for an electrode arrangement, charged particle beam device, and method of reducing an electrical field strength in an electrode arrangement
CN112516797B (zh) * 2020-12-01 2022-09-16 中国科学院近代物理研究所 一种用于同位素分离系统的静电聚焦和加速系统及方法
US20240021404A1 (en) * 2020-12-10 2024-01-18 Asml Netherlands B.V. Charged-particle beam apparatus with beam-tilt and methods thereof

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3452241A (en) * 1966-09-06 1969-06-24 Rca Corp Electron gun suitable for electron microscope
JPS5289453A (en) * 1976-01-21 1977-07-27 Hitachi Ltd Electric field radiation device
US4389571A (en) * 1981-04-01 1983-06-21 The United States Of America As Represented By The United States Department Of Energy Multiple sextupole system for the correction of third and higher order aberration
DE3231036A1 (de) * 1982-08-20 1984-02-23 Max Planck Gesellschaft Kombinierte elektrostatische objektiv- und emissionslinse
US4556798A (en) * 1983-07-12 1985-12-03 Hughes Aircraft Company Focused ion beam column
GB8401471D0 (en) * 1984-01-19 1984-02-22 Cleaver J R A Ion and electron beam electrostatic lens systems
JPS60243960A (ja) * 1984-05-18 1985-12-03 Hitachi Ltd イオンマイクロビ−ム装置
US4663525A (en) * 1985-07-08 1987-05-05 Nanometrics Incorporated Method for electron gun alignment in electron microscopes
DE3786588D1 (de) * 1986-04-24 1993-08-26 Integrated Circuit Testing Elektrostatisch-magnetische-linse fuer korpuskularstrahlgeraete.
US4725736A (en) * 1986-08-11 1988-02-16 Electron Beam Memories Electrostatic electron gun with integrated electron beam deflection and/or stigmating system
JPS6367743A (ja) * 1986-09-09 1988-03-26 Hitachi Electronics Eng Co Ltd 移動ステ−ジ機構
EP0274622B1 (de) * 1986-12-12 1990-11-07 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Detektoranordnung mit einem Detektorobjektiv für Korpuskularstrahlgeräte
DE3888712D1 (de) * 1987-02-02 1994-05-05 Integrated Circuit Testing Detektorobjectiv für Rastermikroskope.
JPS63252347A (ja) * 1987-04-09 1988-10-19 Anelva Corp 静電レンズ
US4926054A (en) * 1988-03-17 1990-05-15 Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Objective lens for focusing charged particles in an electron microscope
US4963748A (en) * 1988-06-06 1990-10-16 Arizona Technology Development Corporation (Atdc) Composite multipurpose multipole electrostatic optical structure and a synthesis method for minimizing aberrations
DE3938660A1 (de) * 1989-11-21 1991-05-23 Integrated Circuit Testing Korpuskularstrahlgeraet

Also Published As

Publication number Publication date
EP0452969A3 (en) 1992-04-01
EP0452969A2 (de) 1991-10-23
JPH044548A (ja) 1992-01-09
DE69133063D1 (de) 2002-08-14
EP0452969B1 (de) 2002-07-10
US5187371A (en) 1993-02-16
JPH071681B2 (ja) 1995-01-11

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8339 Ceased/non-payment of the annual fee