KR960015754A - 하전입자선 전사용 마스크 - Google Patents

하전입자선 전사용 마스크 Download PDF

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Publication number
KR960015754A
KR960015754A KR1019950036733A KR19950036733A KR960015754A KR 960015754 A KR960015754 A KR 960015754A KR 1019950036733 A KR1019950036733 A KR 1019950036733A KR 19950036733 A KR19950036733 A KR 19950036733A KR 960015754 A KR960015754 A KR 960015754A
Authority
KR
South Korea
Prior art keywords
charged particle
particle beam
transfer mask
beam transfer
mask
Prior art date
Application number
KR1019950036733A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of KR960015754A publication Critical patent/KR960015754A/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/043—Beam blanking
    • H01J2237/0435—Multi-aperture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31793—Problems associated with lithography
    • H01J2237/31794—Problems associated with lithography affecting masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019950036733A 1994-10-26 1995-10-24 하전입자선 전사용 마스크 KR960015754A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26228094A JPH08124833A (ja) 1994-10-26 1994-10-26 荷電粒子線転写用マスク

Publications (1)

Publication Number Publication Date
KR960015754A true KR960015754A (ko) 1996-05-22

Family

ID=17373603

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950036733A KR960015754A (ko) 1994-10-26 1995-10-24 하전입자선 전사용 마스크

Country Status (3)

Country Link
US (1) US5789119A (ko)
JP (1) JPH08124833A (ko)
KR (1) KR960015754A (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5985493A (en) * 1998-04-08 1999-11-16 Lucent Technologies Inc. Membrane mask for projection lithography
TW486732B (en) 1999-02-24 2002-05-11 Nippon Electric Co An electron-beam exposure system, a mask for electron-beam exposure and a method for electron-beam exposure
JP3360666B2 (ja) * 1999-11-12 2002-12-24 日本電気株式会社 描画パターン検証方法
JP2001144008A (ja) * 1999-11-17 2001-05-25 Nec Corp 電子線露光方法、並びにこれに用いるマスク及び電子線露光装置
IL234655B (en) * 2014-09-15 2018-10-31 Zeiss Carl Sms Ltd Apparatus and method for imparting direction-selective light attenuation

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5079112A (en) * 1989-08-07 1992-01-07 At&T Bell Laboratories Device manufacture involving lithographic processing
US5258246A (en) * 1989-08-07 1993-11-02 At&T Bell Laboratories Device manufacture involving lithographic processing
JPH03174716A (ja) * 1989-08-07 1991-07-29 Hitachi Ltd 電子ビーム描画装置および描画方式
US5130213A (en) * 1989-08-07 1992-07-14 At&T Bell Laboratories Device manufacture involving lithographic processing
US5260151A (en) * 1991-12-30 1993-11-09 At&T Bell Laboratories Device manufacture involving step-and-scan delineation
US5279925A (en) * 1992-12-16 1994-01-18 At&T Bell Laboratories Projection electron lithographic procedure

Also Published As

Publication number Publication date
JPH08124833A (ja) 1996-05-17
US5789119A (en) 1998-08-04

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Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid