KR960015754A - 하전입자선 전사용 마스크 - Google Patents
하전입자선 전사용 마스크 Download PDFInfo
- Publication number
- KR960015754A KR960015754A KR1019950036733A KR19950036733A KR960015754A KR 960015754 A KR960015754 A KR 960015754A KR 1019950036733 A KR1019950036733 A KR 1019950036733A KR 19950036733 A KR19950036733 A KR 19950036733A KR 960015754 A KR960015754 A KR 960015754A
- Authority
- KR
- South Korea
- Prior art keywords
- charged particle
- particle beam
- transfer mask
- beam transfer
- mask
- Prior art date
Links
- 239000002245 particle Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/043—Beam blanking
- H01J2237/0435—Multi-aperture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31793—Problems associated with lithography
- H01J2237/31794—Problems associated with lithography affecting masks
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26228094A JPH08124833A (ja) | 1994-10-26 | 1994-10-26 | 荷電粒子線転写用マスク |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960015754A true KR960015754A (ko) | 1996-05-22 |
Family
ID=17373603
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950036733A KR960015754A (ko) | 1994-10-26 | 1995-10-24 | 하전입자선 전사용 마스크 |
Country Status (3)
Country | Link |
---|---|
US (1) | US5789119A (ko) |
JP (1) | JPH08124833A (ko) |
KR (1) | KR960015754A (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5985493A (en) * | 1998-04-08 | 1999-11-16 | Lucent Technologies Inc. | Membrane mask for projection lithography |
TW486732B (en) | 1999-02-24 | 2002-05-11 | Nippon Electric Co | An electron-beam exposure system, a mask for electron-beam exposure and a method for electron-beam exposure |
JP3360666B2 (ja) * | 1999-11-12 | 2002-12-24 | 日本電気株式会社 | 描画パターン検証方法 |
JP2001144008A (ja) * | 1999-11-17 | 2001-05-25 | Nec Corp | 電子線露光方法、並びにこれに用いるマスク及び電子線露光装置 |
IL234655B (en) * | 2014-09-15 | 2018-10-31 | Zeiss Carl Sms Ltd | Apparatus and method for imparting direction-selective light attenuation |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5079112A (en) * | 1989-08-07 | 1992-01-07 | At&T Bell Laboratories | Device manufacture involving lithographic processing |
US5258246A (en) * | 1989-08-07 | 1993-11-02 | At&T Bell Laboratories | Device manufacture involving lithographic processing |
JPH03174716A (ja) * | 1989-08-07 | 1991-07-29 | Hitachi Ltd | 電子ビーム描画装置および描画方式 |
US5130213A (en) * | 1989-08-07 | 1992-07-14 | At&T Bell Laboratories | Device manufacture involving lithographic processing |
US5260151A (en) * | 1991-12-30 | 1993-11-09 | At&T Bell Laboratories | Device manufacture involving step-and-scan delineation |
US5279925A (en) * | 1992-12-16 | 1994-01-18 | At&T Bell Laboratories | Projection electron lithographic procedure |
-
1994
- 1994-10-26 JP JP26228094A patent/JPH08124833A/ja active Pending
-
1995
- 1995-10-24 KR KR1019950036733A patent/KR960015754A/ko not_active Application Discontinuation
-
1997
- 1997-05-20 US US08/859,038 patent/US5789119A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH08124833A (ja) | 1996-05-17 |
US5789119A (en) | 1998-08-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |