DE3684228D1 - Geladenes teilchenstrahl-lithographiesystem. - Google Patents
Geladenes teilchenstrahl-lithographiesystem.Info
- Publication number
- DE3684228D1 DE3684228D1 DE8686114612T DE3684228T DE3684228D1 DE 3684228 D1 DE3684228 D1 DE 3684228D1 DE 8686114612 T DE8686114612 T DE 8686114612T DE 3684228 T DE3684228 T DE 3684228T DE 3684228 D1 DE3684228 D1 DE 3684228D1
- Authority
- DE
- Germany
- Prior art keywords
- charged particle
- particle beam
- lithography system
- beam lithography
- charged
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60237498A JPS6298724A (ja) | 1985-10-25 | 1985-10-25 | 電子線描画装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3684228D1 true DE3684228D1 (de) | 1992-04-16 |
Family
ID=17016205
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8686114612T Expired - Lifetime DE3684228D1 (de) | 1985-10-25 | 1986-10-22 | Geladenes teilchenstrahl-lithographiesystem. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4829444A (de) |
EP (1) | EP0220668B1 (de) |
JP (1) | JPS6298724A (de) |
DE (1) | DE3684228D1 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6420619A (en) * | 1987-07-15 | 1989-01-24 | Toshiba Corp | Electron beam aligner |
US5089774A (en) * | 1989-12-26 | 1992-02-18 | Sharp Kabushiki Kaisha | Apparatus and a method for checking a semiconductor |
JP3400601B2 (ja) * | 1995-04-06 | 2003-04-28 | 富士通株式会社 | 荷電粒子ビーム露光方法及び装置 |
JP3728015B2 (ja) | 1996-06-12 | 2005-12-21 | キヤノン株式会社 | 電子ビーム露光システム及びそれを用いたデバイス製造方法 |
US5798524A (en) * | 1996-08-07 | 1998-08-25 | Gatan, Inc. | Automated adjustment of an energy filtering transmission electron microscope |
US6184524B1 (en) | 1996-08-07 | 2001-02-06 | Gatan, Inc. | Automated set up of an energy filtering transmission electron microscope |
JP2867982B2 (ja) * | 1996-11-29 | 1999-03-10 | 日本電気株式会社 | 半導体装置の製造装置 |
JPH11329928A (ja) * | 1998-05-12 | 1999-11-30 | Advantest Corp | 電子ビーム露光装置 |
JP3982913B2 (ja) * | 1998-07-17 | 2007-09-26 | 株式会社アドバンテスト | 荷電粒子ビーム露光装置 |
JP4251784B2 (ja) * | 2001-04-09 | 2009-04-08 | 株式会社アドバンテスト | 電子ビーム露光装置、照射位置算出方法 |
JP2005276869A (ja) * | 2004-03-23 | 2005-10-06 | Jeol Ltd | 荷電粒子ビーム描画装置。 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56124234A (en) * | 1980-03-05 | 1981-09-29 | Hitachi Ltd | Correcting method for electron beam deflection |
US4430571A (en) * | 1981-04-16 | 1984-02-07 | Control Data Corporation | Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system |
JPS57180128A (en) * | 1981-04-30 | 1982-11-06 | Toshiba Corp | Equipment for electron beam exposure |
US4390789A (en) * | 1981-05-21 | 1983-06-28 | Control Data Corporation | Electron beam array lithography system employing multiple parallel array optics channels and method of operation |
US4433384A (en) * | 1981-10-05 | 1984-02-21 | Varian Associates, Inc. | Pattern data handling system for an electron beam exposure system |
US4694178A (en) * | 1985-06-28 | 1987-09-15 | Control Data Corporation | Multiple channel electron beam optical column lithography system and method of operation |
-
1985
- 1985-10-25 JP JP60237498A patent/JPS6298724A/ja active Pending
-
1986
- 1986-10-22 DE DE8686114612T patent/DE3684228D1/de not_active Expired - Lifetime
- 1986-10-22 EP EP86114612A patent/EP0220668B1/de not_active Expired
- 1986-10-24 US US06/922,891 patent/US4829444A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0220668A3 (en) | 1989-01-11 |
JPS6298724A (ja) | 1987-05-08 |
EP0220668A2 (de) | 1987-05-06 |
US4829444A (en) | 1989-05-09 |
EP0220668B1 (de) | 1992-03-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |