DE69117480D1 - Sensor für die Kontrolle des Fabrikationsprozesses einer Halbleitervorrichtung - Google Patents

Sensor für die Kontrolle des Fabrikationsprozesses einer Halbleitervorrichtung

Info

Publication number
DE69117480D1
DE69117480D1 DE69117480T DE69117480T DE69117480D1 DE 69117480 D1 DE69117480 D1 DE 69117480D1 DE 69117480 T DE69117480 T DE 69117480T DE 69117480 T DE69117480 T DE 69117480T DE 69117480 D1 DE69117480 D1 DE 69117480D1
Authority
DE
Germany
Prior art keywords
sensor
controlling
semiconductor device
manufacturing process
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69117480T
Other languages
English (en)
Other versions
DE69117480T2 (de
Inventor
Mehrdad M Moslehi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/638,472 external-priority patent/US5293216A/en
Priority claimed from US07/638,468 external-priority patent/US5270222A/en
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of DE69117480D1 publication Critical patent/DE69117480D1/de
Application granted granted Critical
Publication of DE69117480T2 publication Critical patent/DE69117480T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B24B37/013—Devices or means for detecting lapping completion
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67276—Production flow monitoring, e.g. for increasing throughput
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Automation & Control Theory (AREA)
  • Mechanical Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Physical Vapour Deposition (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
DE1991617480 1990-12-31 1991-12-30 Sensor für die Kontrolle des Fabrikationsprozesses einer Halbleitervorrichtung Expired - Fee Related DE69117480T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/638,472 US5293216A (en) 1990-12-31 1990-12-31 Sensor for semiconductor device manufacturing process control
US07/638,468 US5270222A (en) 1990-12-31 1990-12-31 Method and apparatus for semiconductor device fabrication diagnosis and prognosis

Publications (2)

Publication Number Publication Date
DE69117480D1 true DE69117480D1 (de) 1996-04-04
DE69117480T2 DE69117480T2 (de) 1996-06-13

Family

ID=27093091

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1991617480 Expired - Fee Related DE69117480T2 (de) 1990-12-31 1991-12-30 Sensor für die Kontrolle des Fabrikationsprozesses einer Halbleitervorrichtung

Country Status (3)

Country Link
EP (1) EP0493827B1 (de)
JP (1) JPH06244261A (de)
DE (1) DE69117480T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5452953A (en) * 1993-10-12 1995-09-26 Hughes Aircraft Company Film thickness measurement of structures containing a scattering surface
NL9401933A (nl) * 1994-11-18 1996-07-01 Tno Documentensorteersysteem voor het sorteren van voor hercirculatie geschikte documenten, in het bijzonder bankbiljetten.
JP3393035B2 (ja) 1997-05-06 2003-04-07 東京エレクトロン株式会社 制御装置及び半導体製造装置
WO1999066548A1 (de) * 1998-06-15 1999-12-23 Steag Rtp Systems Gmbh Verfahren zum bestimmen von parameterverteilungen von objekteigenschaften
DE19913922C2 (de) * 1998-06-15 2002-10-24 Steag Rtp Systems Gmbh Verfahren zum Bestimmen von Parameterverteilungen von Substrateigenschaften
US6560503B1 (en) * 1999-10-05 2003-05-06 Advanced Micro Devices, Inc. Method and apparatus for monitoring controller performance using statistical process control
US6640151B1 (en) * 1999-12-22 2003-10-28 Applied Materials, Inc. Multi-tool control system, method and medium
US6342134B1 (en) * 2000-02-11 2002-01-29 Agere Systems Guardian Corp. Method for producing piezoelectric films with rotating magnetron sputtering system
EP1271096A1 (de) * 2001-06-18 2003-01-02 Electronic Systems S.P.A. Verfahren und Vorrichtung zur Messung der Dicke nichtmetallischer Schichten mit Hilfe einer Halbleiter-Infrarotstrahlungsquelle
US6985229B2 (en) * 2002-05-30 2006-01-10 Agere Systems, Inc. Overlay metrology using scatterometry profiling
US20050275850A1 (en) * 2004-05-28 2005-12-15 Timbre Technologies, Inc. Shape roughness measurement in optical metrology
JP4757456B2 (ja) * 2004-07-01 2011-08-24 芝浦メカトロニクス株式会社 真空処理装置
WO2007092950A2 (en) * 2006-02-09 2007-08-16 Kla-Tencor Technologies Corporation Methods and systems for determining a characteristic of a wafer
DE102008049774B4 (de) * 2008-09-30 2017-07-27 Advanced Micro Devices, Inc. Prozessanlage und Verfahren zur prozessinternen Überwachung der Metallkontamination während der Bearbeitung von Mikrostrukturen
DE102013006363A1 (de) 2013-04-12 2014-10-30 Guido Bell Sensorik für die Unterscheidung von Dünnfilm-Solarmodulen
EP3495790A1 (de) * 2017-12-05 2019-06-12 Laser Systems & Solutions of Europe Vorrichtung und verfahren zur messung der oberflächentemperatur eines substrats
US20210062324A1 (en) * 2019-08-30 2021-03-04 Applied Materials, Inc. Electron beam pvd endpoint detection and closed-loop process control systems

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4511800A (en) * 1983-03-28 1985-04-16 Rca Corporation Optical reflectance method for determining the surface roughness of materials in semiconductor processing
US4707132A (en) * 1985-08-05 1987-11-17 Dutton G Wayne Process for sensing defects on a smooth cylindrical interior surface in tubing
SU1567872A1 (ru) * 1988-07-14 1990-05-30 Предприятие П/Я А-1891 Оптический датчик перемещений объекта

Also Published As

Publication number Publication date
JPH06244261A (ja) 1994-09-02
EP0493827A3 (en) 1993-09-29
EP0493827B1 (de) 1996-02-28
EP0493827A2 (de) 1992-07-08
DE69117480T2 (de) 1996-06-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee