DE69031765D1 - Elektronen-Reflektions-Holographie-Gerät - Google Patents

Elektronen-Reflektions-Holographie-Gerät

Info

Publication number
DE69031765D1
DE69031765D1 DE69031765T DE69031765T DE69031765D1 DE 69031765 D1 DE69031765 D1 DE 69031765D1 DE 69031765 T DE69031765 T DE 69031765T DE 69031765 T DE69031765 T DE 69031765T DE 69031765 D1 DE69031765 D1 DE 69031765D1
Authority
DE
Germany
Prior art keywords
electron reflection
holography device
reflection holography
electron
reflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69031765T
Other languages
English (en)
Other versions
DE69031765T2 (de
Inventor
Nobuyuki Osakabe
Akira Tonomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE69031765D1 publication Critical patent/DE69031765D1/de
Application granted granted Critical
Publication of DE69031765T2 publication Critical patent/DE69031765T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H01J2237/1514—Prisms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Holo Graphy (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69031765T 1989-01-13 1990-01-12 Elektronen-Reflektions-Holographie-Gerät Expired - Fee Related DE69031765T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1004999A JP2776862B2 (ja) 1989-01-13 1989-01-13 反射電子線ホログラフイー装置

Publications (2)

Publication Number Publication Date
DE69031765D1 true DE69031765D1 (de) 1998-01-15
DE69031765T2 DE69031765T2 (de) 1998-07-02

Family

ID=11599286

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69031765T Expired - Fee Related DE69031765T2 (de) 1989-01-13 1990-01-12 Elektronen-Reflektions-Holographie-Gerät

Country Status (4)

Country Link
US (1) US4998788A (de)
EP (1) EP0378237B1 (de)
JP (1) JP2776862B2 (de)
DE (1) DE69031765T2 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5192867A (en) * 1989-01-13 1993-03-09 Hitachi, Ltd. Electron optical measurement apparatus
JP3039563B2 (ja) * 1990-11-29 2000-05-08 株式会社日立製作所 走査電子顕微鏡及び走査電子顕微方法
US5095207A (en) * 1991-01-07 1992-03-10 University Of Wisconsin - Milwaukee Method of three-dimensional atomic imaging
US5432347A (en) * 1992-11-12 1995-07-11 U.S. Philips Corporation Method for image reconstruction in a high-resolution electron microscope, and electron microscope suitable for use of such a method
JP2605592B2 (ja) * 1993-07-29 1997-04-30 日本電気株式会社 電子線ホログラフィによるナノサイズドットパターン形成方法および描画装置
DE4331468A1 (de) * 1993-09-16 1995-03-30 Eduard Heindl Fourier-Mikrostrukturierung
JP3276816B2 (ja) * 1995-09-12 2002-04-22 日本電子株式会社 電子線バイプリズム
US5612535A (en) * 1996-06-07 1997-03-18 Wang; Youqi Spin-split scanning electron microscope
JP2002117800A (ja) 2000-10-05 2002-04-19 Jeol Ltd 電子線バイプリズム装置を備えた電子顕微鏡
JP3942363B2 (ja) * 2001-02-09 2007-07-11 日本電子株式会社 透過電子顕微鏡の位相板用レンズシステム、および透過電子顕微鏡
US7015469B2 (en) 2003-01-09 2006-03-21 Jeol Usa, Inc. Electron holography method
JP4512180B2 (ja) * 2004-01-09 2010-07-28 独立行政法人理化学研究所 干渉装置
JP4512183B2 (ja) * 2004-03-31 2010-07-28 独立行政法人理化学研究所 電子線干渉装置
JP4523448B2 (ja) * 2005-02-23 2010-08-11 独立行政法人理化学研究所 荷電粒子線装置および干渉装置
EP2206021B1 (de) * 2007-10-30 2015-01-28 New York University Verfolgung und kennzeichnung von partikeln über holographische videomikroskopie
JP5156429B2 (ja) * 2008-02-15 2013-03-06 株式会社日立製作所 電子線装置
WO2010026867A1 (ja) * 2008-09-02 2010-03-11 株式会社日立製作所 電子線装置
CN102365543A (zh) 2009-01-16 2012-02-29 纽约大学 用全息视频显微术的自动实时粒子表征和三维速度计量
US20120241612A1 (en) * 2009-12-11 2012-09-27 Hitachi Ltd Electron Beam Biprism Device and Electron Beam Device
JP5380366B2 (ja) * 2010-05-28 2014-01-08 株式会社日立ハイテクノロジーズ 透過型干渉顕微鏡
US8735815B2 (en) 2012-06-22 2014-05-27 Edax, Inc. Method and apparatus for electron pattern imaging
EP3105638B1 (de) 2014-02-12 2020-07-22 New York University Schnelle merkmalsidentifizierung für holografische verfolgung und charakterisierung von kolloidalen partikeln
ES2913524T3 (es) 2014-11-12 2022-06-02 Univ New York Huellas coloidales para materiales blandos usando caracterización holográfica total
JP6929560B2 (ja) * 2015-09-18 2021-09-01 ニュー・ヨーク・ユニヴァーシティー 精密スラリ内の大きい不純物粒子のホログラフィック検出及び特徴付け
JP7130242B2 (ja) 2016-02-08 2022-09-05 ニュー・ヨーク・ユニヴァーシティー タンパク質凝集体のホログラフィ特徴付け
US10670677B2 (en) 2016-04-22 2020-06-02 New York University Multi-slice acceleration for magnetic resonance fingerprinting
US10424458B2 (en) 2017-08-21 2019-09-24 Government Of The United States Of America, As Represented By The Secretary Of Commerce Electron reflectometer and process for performing shape metrology
US11543338B2 (en) 2019-10-25 2023-01-03 New York University Holographic characterization of irregular particles
US11948302B2 (en) 2020-03-09 2024-04-02 New York University Automated holographic video microscopy assay
JP7418366B2 (ja) * 2021-01-29 2024-01-19 株式会社日立製作所 電子線干渉計
EP4411783A1 (de) * 2023-01-31 2024-08-07 ASML Netherlands B.V. Holographie auf basis niederenergetischer elektronenmikroskopie

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2492738A (en) * 1947-12-17 1949-12-27 Gen Electric Method of obtaining enlarged images
JPS58155636A (ja) * 1982-03-12 1983-09-16 Hitachi Ltd ホログラフイ電子顕微鏡
JPS60117637A (ja) * 1983-11-30 1985-06-25 Toshiba Corp 集積回路テスタ
JPS62140485A (ja) * 1985-12-16 1987-06-24 Hitachi Ltd 半導体構造体およびその製造方法

Also Published As

Publication number Publication date
JP2776862B2 (ja) 1998-07-16
EP0378237B1 (de) 1997-12-03
EP0378237A2 (de) 1990-07-18
JPH02186547A (ja) 1990-07-20
US4998788A (en) 1991-03-12
DE69031765T2 (de) 1998-07-02
EP0378237A3 (de) 1991-03-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee