DE69030348D1 - Belichtungsvorrichtung - Google Patents

Belichtungsvorrichtung

Info

Publication number
DE69030348D1
DE69030348D1 DE69030348T DE69030348T DE69030348D1 DE 69030348 D1 DE69030348 D1 DE 69030348D1 DE 69030348 T DE69030348 T DE 69030348T DE 69030348 T DE69030348 T DE 69030348T DE 69030348 D1 DE69030348 D1 DE 69030348D1
Authority
DE
Germany
Prior art keywords
exposure device
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69030348T
Other languages
English (en)
Other versions
DE69030348T2 (de
Inventor
Yutaka Watanabe
Ryuichi Ebinuma
Nobutoshi Mizusawa
Shunichi Uzawa
Takao Kariya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1257075A external-priority patent/JP2700416B2/ja
Priority claimed from JP1257076A external-priority patent/JP2743199B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69030348D1 publication Critical patent/DE69030348D1/de
Publication of DE69030348T2 publication Critical patent/DE69030348T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE1990630348 1989-10-03 1990-10-03 Belichtungsvorrichtung Expired - Fee Related DE69030348T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1257075A JP2700416B2 (ja) 1989-10-03 1989-10-03 露光装置
JP1257076A JP2743199B2 (ja) 1989-10-03 1989-10-03 露光装置

Publications (2)

Publication Number Publication Date
DE69030348D1 true DE69030348D1 (de) 1997-05-07
DE69030348T2 DE69030348T2 (de) 1997-09-04

Family

ID=26543044

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1990630348 Expired - Fee Related DE69030348T2 (de) 1989-10-03 1990-10-03 Belichtungsvorrichtung

Country Status (2)

Country Link
EP (1) EP0421746B1 (de)
DE (1) DE69030348T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69126719T2 (de) * 1990-03-09 1997-11-06 Canon Kk Belichtungsvorrichtung
EP0540178B1 (de) * 1991-09-30 1998-05-06 Canon Kabushiki Kaisha Röntgenbelichtungsvorrichtung und Verfahren
JP3540174B2 (ja) * 1998-10-12 2004-07-07 ウシオ電機株式会社 斜めから光を照射するプロキシミティ露光方法
EP1174769B1 (de) * 2000-07-10 2006-12-13 ASML Netherlands B.V. Lithographischer Projektionsapparat und lithographisches Verfahren zur Herstellung einer Vorrichtung
JP2003059801A (ja) * 2001-08-14 2003-02-28 Canon Inc 露光装置及び露光方法
AU2003277893A1 (en) 2002-09-30 2004-04-23 Asml Netherlands B.V. Illumination system for a wavelength = 193 nm, comprising sensors for determining the illumination
DE102007047446A1 (de) * 2007-10-04 2009-04-09 Carl Zeiss Smt Ag Optisches Element mit wenigstens einem elektrisch leitenden Bereich und Beleuchtungssystem mit einem solchen Element

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633633A (en) * 1979-08-27 1981-04-04 Fuji Photo Optical Co Ltd Composite camera
JPS6037616B2 (ja) * 1980-01-24 1985-08-27 理学電機株式会社 Ｘ線リゾグラフイ装置
DE3270459D1 (en) * 1981-12-31 1986-05-15 Ibm A method and apparatus for providing a uniform illumination of an area
JPS5928337A (ja) * 1982-08-09 1984-02-15 Hitachi Ltd プロジエクシヨンアライナ
JPS607722A (ja) * 1983-06-27 1985-01-16 Fujitsu Ltd エツクス線露光装置
JPS62204527A (ja) * 1986-03-05 1987-09-09 Hitachi Ltd マスク露光装置
JP2744245B2 (ja) * 1988-03-25 1998-04-28 キヤノン株式会社 露光装置と露光方法
DE68925323T2 (de) * 1988-09-14 1996-05-30 Canon Kk Belichtungssteuerung in einem Röntgenbelichtungsapparat

Also Published As

Publication number Publication date
EP0421746B1 (de) 1997-04-02
DE69030348T2 (de) 1997-09-04
EP0421746A2 (de) 1991-04-10
EP0421746A3 (en) 1992-01-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee