DE68925323T2 - Belichtungssteuerung in einem Röntgenbelichtungsapparat - Google Patents

Belichtungssteuerung in einem Röntgenbelichtungsapparat

Info

Publication number
DE68925323T2
DE68925323T2 DE1989625323 DE68925323T DE68925323T2 DE 68925323 T2 DE68925323 T2 DE 68925323T2 DE 1989625323 DE1989625323 DE 1989625323 DE 68925323 T DE68925323 T DE 68925323T DE 68925323 T2 DE68925323 T2 DE 68925323T2
Authority
DE
Germany
Prior art keywords
exposure
ray
control
exposure apparatus
exposure control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1989625323
Other languages
English (en)
Other versions
DE68925323D1 (de
Inventor
Ryuichi Ebinuma
Nobutoshi Mizusawa
Masayuki Suzuki
Shinichiro Uno
Tetsuzo Mori
Hiroshi Kurosawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/244,410 external-priority patent/US4930720A/en
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE68925323D1 publication Critical patent/DE68925323D1/de
Publication of DE68925323T2 publication Critical patent/DE68925323T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
    • G21K1/043—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers changing time structure of beams by mechanical means, e.g. choppers, spinning filter wheels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE1989625323 1988-09-14 1989-07-17 Belichtungssteuerung in einem Röntgenbelichtungsapparat Expired - Fee Related DE68925323T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/244,410 US4930720A (en) 1987-09-15 1988-09-14 Cassette loading device for VCR

Publications (2)

Publication Number Publication Date
DE68925323D1 DE68925323D1 (de) 1996-02-15
DE68925323T2 true DE68925323T2 (de) 1996-05-30

Family

ID=22922639

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1989625323 Expired - Fee Related DE68925323T2 (de) 1988-09-14 1989-07-17 Belichtungssteuerung in einem Röntgenbelichtungsapparat

Country Status (2)

Country Link
EP (1) EP0359370B1 (de)
DE (1) DE68925323T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69030348T2 (de) * 1989-10-03 1997-09-04 Canon Kk Belichtungsvorrichtung
DE69126719T2 (de) * 1990-03-09 1997-11-06 Canon Kk Belichtungsvorrichtung
JP3025545B2 (ja) * 1991-03-18 2000-03-27 キヤノン株式会社 Ｘ線リソグラフィ用マスクおよびｘ線リソグラフィ露光装置
DE4424274C1 (de) * 1994-07-09 1996-01-11 Jenoptik Technologie Gmbh Einrichtung zur Manipulation eines Synchrotronstrahlenbündels

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037616B2 (ja) * 1980-01-24 1985-08-27 理学電機株式会社 Ｘ線リゾグラフイ装置
DE3270459D1 (en) * 1981-12-31 1986-05-15 Ibm A method and apparatus for providing a uniform illumination of an area
EP0357425B1 (de) * 1988-09-02 1996-11-06 Canon Kabushiki Kaisha Belichtungseinrichtung

Also Published As

Publication number Publication date
DE68925323D1 (de) 1996-02-15
EP0359370A2 (de) 1990-03-21
EP0359370A3 (en) 1990-11-14
EP0359370B1 (de) 1996-01-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee