DE69025561D1 - Speicherzelle mit schwebendem Gatter und ihre Anwendung für einen Halbleiterspeicher - Google Patents

Speicherzelle mit schwebendem Gatter und ihre Anwendung für einen Halbleiterspeicher

Info

Publication number
DE69025561D1
DE69025561D1 DE69025561T DE69025561T DE69025561D1 DE 69025561 D1 DE69025561 D1 DE 69025561D1 DE 69025561 T DE69025561 T DE 69025561T DE 69025561 T DE69025561 T DE 69025561T DE 69025561 D1 DE69025561 D1 DE 69025561D1
Authority
DE
Germany
Prior art keywords
application
floating gate
memory cell
semiconductor memory
gate memory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69025561T
Other languages
English (en)
Inventor
Yoshihiro Takemae
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of DE69025561D1 publication Critical patent/DE69025561D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/70—Masking faults in memories by using spares or by reconfiguring
    • G11C29/78—Masking faults in memories by using spares or by reconfiguring using programmable devices
    • G11C29/785—Masking faults in memories by using spares or by reconfiguring using programmable devices with redundancy programming schemes
    • G11C29/789—Masking faults in memories by using spares or by reconfiguring using programmable devices with redundancy programming schemes using non-volatile cells or latches
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0441—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing multiple floating gate devices, e.g. separate read-and-write FAMOS transistors with connected floating gates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0441—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing multiple floating gate devices, e.g. separate read-and-write FAMOS transistors with connected floating gates
    • G11C16/045—Floating gate memory cells with both P and N channel memory transistors, usually sharing a common floating gate
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/70—Masking faults in memories by using spares or by reconfiguring
    • G11C29/78—Masking faults in memories by using spares or by reconfiguring using programmable devices
    • G11C29/83—Masking faults in memories by using spares or by reconfiguring using programmable devices with reduced power consumption
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2216/00—Indexing scheme relating to G11C16/00 and subgroups, for features not directly covered by these groups
    • G11C2216/02—Structural aspects of erasable programmable read-only memories
    • G11C2216/10—Floating gate memory cells with a single polysilicon layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Memories (AREA)
  • Read Only Memory (AREA)
  • Non-Volatile Memory (AREA)
  • Dram (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
DE69025561T 1989-12-07 1990-12-05 Speicherzelle mit schwebendem Gatter und ihre Anwendung für einen Halbleiterspeicher Expired - Lifetime DE69025561D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1318378A JPH03179780A (ja) 1989-12-07 1989-12-07 半導体装置

Publications (1)

Publication Number Publication Date
DE69025561D1 true DE69025561D1 (de) 1996-04-04

Family

ID=18098480

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69025561T Expired - Lifetime DE69025561D1 (de) 1989-12-07 1990-12-05 Speicherzelle mit schwebendem Gatter und ihre Anwendung für einen Halbleiterspeicher

Country Status (5)

Country Link
US (1) US5404328A (de)
EP (1) EP0431911B1 (de)
JP (1) JPH03179780A (de)
KR (1) KR950014091B1 (de)
DE (1) DE69025561D1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5596524A (en) * 1995-04-21 1997-01-21 Advanced Micro Devices, Inc. CMOS memory cell with gate oxide of both NMOS and PMOS transistors as tunneling window for program and erase
WO1996033496A1 (en) * 1995-04-21 1996-10-24 Advanced Micro Devices, Inc. Reference for cmos memory cell having pmos and nmos transistors with a common floating gate
US5754471A (en) * 1995-06-06 1998-05-19 Advanced Micro Devices, Inc. Low power CMOS array for a PLD with program and erase using controlled avalanche injection
US5581501A (en) * 1995-08-17 1996-12-03 Altera Corporation Nonvolatile SRAM cells and cell arrays
US5587945A (en) * 1995-11-06 1996-12-24 Advanced Micro Devices, Inc. CMOS EEPROM cell with tunneling window in the read path
US6005806A (en) * 1996-03-14 1999-12-21 Altera Corporation Nonvolatile configuration cells and cell arrays
US5646901A (en) * 1996-03-26 1997-07-08 Advanced Micro Devices, Inc. CMOS memory cell with tunneling during program and erase through the NMOS and PMOS transistors and a pass gate separating the NMOS and PMOS transistors
US5838606A (en) * 1997-04-28 1998-11-17 Mitsubishi Semiconductor America, Inc. Three-transistor static storage cell
JP4191355B2 (ja) * 2000-02-10 2008-12-03 株式会社ルネサステクノロジ 半導体集積回路装置
FR2838554B1 (fr) * 2002-04-15 2004-07-09 St Microelectronics Sa Dispositif semiconducteur de memoire, non volatile, programmable et effacable electriquement, a une seule couche de materiau de grille, et plan memoire correspondant
WO2004006264A2 (en) * 2002-07-08 2004-01-15 Koninklijke Philips Electronics N.V. Erasable and programmable non-volatile cell
JP2005353984A (ja) 2004-06-14 2005-12-22 Seiko Epson Corp 不揮発性記憶装置
US8159877B2 (en) * 2010-03-25 2012-04-17 National Semiconductor Corporation Method of directly reading output voltage to determine data stored in a non-volatile memory cell
WO2016092416A1 (en) * 2014-12-11 2016-06-16 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, memory device, and electronic device

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4132904A (en) * 1977-07-28 1979-01-02 Hughes Aircraft Company Volatile/non-volatile logic latch circuit
CH625075A5 (de) * 1978-02-22 1981-08-31 Centre Electron Horloger
EP0103043B1 (de) * 1982-09-15 1987-03-18 Deutsche ITT Industries GmbH CMOS-Speicherzelle mit potentialmässig schwebendem Speichergate
JPH0746515B2 (ja) * 1984-12-28 1995-05-17 日本電気株式会社 デコ−ダ回路
JPH0783062B2 (ja) * 1985-06-18 1995-09-06 株式会社東芝 マスタ−スライス型半導体装置
JPS62154786A (ja) * 1985-12-27 1987-07-09 Toshiba Corp 不揮発性半導体メモリ
US4831592A (en) * 1986-07-09 1989-05-16 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory device
US5059835A (en) * 1987-06-04 1991-10-22 Ncr Corporation Cmos circuit with programmable input threshold
US4885719A (en) * 1987-08-19 1989-12-05 Ict International Cmos Technology, Inc. Improved logic cell array using CMOS E2 PROM cells
US4874967A (en) * 1987-12-15 1989-10-17 Xicor, Inc. Low power voltage clamp circuit
US5016217A (en) * 1988-05-17 1991-05-14 Ict International Cmos Technology, Inc. Logic cell array using CMOS EPROM cells having reduced chip surface area

Also Published As

Publication number Publication date
KR950014091B1 (ko) 1995-11-21
EP0431911A3 (en) 1992-06-03
US5404328A (en) 1995-04-04
EP0431911B1 (de) 1996-02-28
KR910013284A (ko) 1991-08-08
EP0431911A2 (de) 1991-06-12
JPH03179780A (ja) 1991-08-05

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Legal Events

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