DE69024964D1 - Aufdampf-heizvorrichtung - Google Patents

Aufdampf-heizvorrichtung

Info

Publication number
DE69024964D1
DE69024964D1 DE69024964T DE69024964T DE69024964D1 DE 69024964 D1 DE69024964 D1 DE 69024964D1 DE 69024964 T DE69024964 T DE 69024964T DE 69024964 T DE69024964 T DE 69024964T DE 69024964 D1 DE69024964 D1 DE 69024964D1
Authority
DE
Germany
Prior art keywords
thin film
heating elements
film heating
heating device
crucible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69024964T
Other languages
English (en)
Other versions
DE69024964T2 (de
Inventor
Loren A Chow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of DE69024964D1 publication Critical patent/DE69024964D1/de
Application granted granted Critical
Publication of DE69024964T2 publication Critical patent/DE69024964T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/08—Details peculiar to crucible or pot furnaces
    • F27B14/10—Crucibles
    • F27B14/12—Covers therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/08—Details peculiar to crucible or pot furnaces
    • F27B14/14—Arrangements of heating devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/08—Details peculiar to crucible or pot furnaces
    • F27B14/10—Crucibles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B2014/002—Smelting process, e.g. sequences to melt a specific material
    • F27B2014/004—Process involving a smelting step, e.g. vaporisation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • F27D99/0001—Heating elements or systems
    • F27D99/0006—Electric heating elements or system
    • F27D2099/0008—Resistor heating

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE69024964T 1989-09-13 1990-09-07 Aufdampf-heizvorrichtung Expired - Fee Related DE69024964T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/406,785 US5031229A (en) 1989-09-13 1989-09-13 Deposition heaters
PCT/US1990/005074 WO1991004348A1 (en) 1989-09-13 1990-09-07 Deposition heaters

Publications (2)

Publication Number Publication Date
DE69024964D1 true DE69024964D1 (de) 1996-02-29
DE69024964T2 DE69024964T2 (de) 1996-09-19

Family

ID=23609448

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69024964T Expired - Fee Related DE69024964T2 (de) 1989-09-13 1990-09-07 Aufdampf-heizvorrichtung

Country Status (7)

Country Link
US (1) US5031229A (de)
EP (1) EP0491811B1 (de)
JP (1) JP3301757B2 (de)
AT (1) ATE133249T1 (de)
CA (1) CA2066573A1 (de)
DE (1) DE69024964T2 (de)
WO (1) WO1991004348A1 (de)

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ATE374263T1 (de) * 1999-03-29 2007-10-15 Antec Solar Energy Ag Vorrichtung und verfahren zur beschichtung von substraten durch aufdampfen mittels eines pvd- verfahrens
WO2001067819A1 (en) * 2000-03-03 2001-09-13 Cooper Richard P Thin film tubular heater
US7194197B1 (en) * 2000-03-16 2007-03-20 Global Solar Energy, Inc. Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer
KR100889758B1 (ko) 2002-09-03 2009-03-20 삼성모바일디스플레이주식회사 유기박막 형성장치의 가열용기
US20040074898A1 (en) * 2002-10-21 2004-04-22 Mariner John T. Encapsulated graphite heater and process
US20050022743A1 (en) * 2003-07-31 2005-02-03 Semiconductor Energy Laboratory Co., Ltd. Evaporation container and vapor deposition apparatus
US8123862B2 (en) * 2003-08-15 2012-02-28 Semiconductor Energy Laboratory Co., Ltd. Deposition apparatus and manufacturing apparatus
US7339139B2 (en) * 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
JP2005222746A (ja) * 2004-02-04 2005-08-18 Doshisha 薄膜発熱体およびその製造方法
US20050229856A1 (en) * 2004-04-20 2005-10-20 Malik Roger J Means and method for a liquid metal evaporation source with integral level sensor and external reservoir
JP4476019B2 (ja) * 2004-05-20 2010-06-09 東北パイオニア株式会社 成膜源、真空成膜装置、有機ｅｌ素子の製造方法
US7402779B2 (en) * 2004-07-13 2008-07-22 Lucent Technologies Inc. Effusion cell and method for use in molecular beam deposition
KR100980729B1 (ko) * 2006-07-03 2010-09-07 주식회사 야스 증착 공정용 다중 노즐 증발원
US7741584B2 (en) * 2007-01-21 2010-06-22 Momentive Performance Materials Inc. Encapsulated graphite heater and process
DE102007035166B4 (de) * 2007-07-27 2010-07-29 Createc Fischer & Co. Gmbh Hochtemperatur-Verdampferzelle mit parallel geschalteten Heizbereichen, Verfahren zu deren Betrieb und deren Verwendung in Beschichtungsanlagen
DE112008002971T5 (de) * 2007-11-05 2010-09-23 ULVAC, Inc., Chigasaki-shi Bedampfungsquellen und Vorrichtung zum Herstellen eines organischen EL-Elements
US20090255467A1 (en) 2008-04-15 2009-10-15 Global Solar Energy, Inc. Apparatus and methods for manufacturing thin-film solar cells
US8512806B2 (en) * 2008-08-12 2013-08-20 Momentive Performance Materials Inc. Large volume evaporation source
WO2011065998A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
WO2011065999A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
WO2011082179A1 (en) * 2009-12-28 2011-07-07 Global Solar Energy, Inc. Apparatus and methods of mixing and depositing thin film photovoltaic compositions
KR101172275B1 (ko) * 2009-12-31 2012-08-08 에스엔유 프리시젼 주식회사 기화 장치 및 이의 제어 방법
DE102014000313A1 (de) * 2014-01-10 2015-07-16 Audi Ag Vorrichtung zum Abgeben eines Duftstoffs und Kraftfahrzeug mit einer derartigen Vorrichtung
CN104078626B (zh) * 2014-07-22 2016-07-06 深圳市华星光电技术有限公司 用于oled材料蒸镀的加热装置
CN105088145B (zh) * 2015-08-19 2017-03-29 京东方科技集团股份有限公司 用于oled蒸发源的坩埚及其制造方法
CN105132865B (zh) * 2015-08-20 2017-12-08 京东方科技集团股份有限公司 蒸发源装置及蒸镀设备
CN106756804A (zh) * 2016-12-20 2017-05-31 武汉华星光电技术有限公司 蒸镀坩埚及其蒸镀方法
WO2018175753A1 (en) * 2017-03-22 2018-09-27 University Of Delaware Centrifugal evaporation sources
WO2019223853A1 (en) * 2018-05-22 2019-11-28 Applied Materials, Inc. Evaporation source, method for operating an evaporation source and deposition system

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US1402585A (en) * 1921-03-07 1922-01-03 Epstein Hirsch Vaporizer
US1895492A (en) * 1929-10-17 1933-01-31 Hercules Powder Co Ltd Method of and apparatus for concentrating nitric acid
US1892492A (en) * 1932-02-12 1932-12-27 Molner Herman Frame
US3539768A (en) * 1959-03-03 1970-11-10 Paul Eisler Electrical space heating system
US3118042A (en) * 1960-11-16 1964-01-14 Perkin Elmer Corp Electrical heating devices
US3119918A (en) * 1961-01-03 1964-01-28 Simon Juan Casas Electric heater
US3177345A (en) * 1961-06-02 1965-04-06 Glaverbel Lighting and heating device in the form of a panel
US3367795A (en) * 1965-07-09 1968-02-06 Stutzman Guy Robert Method for making a microelectronic circuit
CH467429A (de) * 1967-03-31 1969-01-15 Linde Ag Verfahren und Vorrichtung zum Beheizen eines mit einem Isoliermaterial versehenen Isolierraumes
US3806701A (en) * 1972-11-03 1974-04-23 Rival Manufacturing Co Electric cooking utensil having a removable vessel
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
US4063974A (en) * 1975-11-14 1977-12-20 Hughes Aircraft Company Planar reactive evaporation method for the deposition of compound semiconducting films
JPS53110973A (en) * 1977-03-10 1978-09-28 Futaba Denshi Kogyo Kk Method and apparatus for manufacturing compounds
US4330932A (en) * 1978-07-20 1982-05-25 The United States Of America As Represented By The Secretary Of The Navy Process for preparing isolated junctions in thin-film semiconductors utilizing shadow masked deposition to form graded-side mesas
US4396899A (en) * 1980-04-16 1983-08-02 Kabushiki Kaisha Kirk Platinum thin film resistance element and production method therefor
US4447276A (en) * 1981-06-15 1984-05-08 The Post Office Molecular beam epitaxy electrolytic dopant source
FR2528454A1 (fr) * 1982-06-11 1983-12-16 Criceram Creuset modifie pour la methode de cristallisation par goutte pendante
JPS58225537A (ja) * 1982-06-25 1983-12-27 Hitachi Ltd イオン源装置
US4426569A (en) * 1982-07-13 1984-01-17 The Perkin-Elmer Corporation Temperature sensor assembly
GB2129018B (en) * 1982-08-30 1986-01-29 Ricoh Kk Vacuum evaporation apparatus
US4545339A (en) * 1982-09-30 1985-10-08 Allied Corporation Glow plug having a conductive film heater
CH651592A5 (de) * 1982-10-26 1985-09-30 Balzers Hochvakuum Dampfquelle fuer vakuumbedampfungsanlagen.
US4734563A (en) * 1982-11-24 1988-03-29 Hewlett-Packard Company Inversely processed resistance heater
JPS59156996A (ja) * 1983-02-23 1984-09-06 Koito Mfg Co Ltd 化合物結晶膜の製造方法とその装置
JPS604815A (ja) * 1983-06-23 1985-01-11 Nippon Soken Inc 流量測定装置
US4553022A (en) * 1984-06-04 1985-11-12 The Perkin-Elmer Corporation Effusion cell assembly
US4518846A (en) * 1984-06-11 1985-05-21 International Business Machines Corporation Heater assembly for molecular beam epitaxy furnace
DE3590269T (de) * 1984-06-12 1986-06-05 Kievskij politechničeskij institut imeni 50-letija Velikoj Oktjabrskoj Socialističeskoj Revoljucii, Kiev Verfahren zum Aufbringen von dünnen Schichten durch Vakuumaufdampfen
US4726822A (en) * 1984-10-22 1988-02-23 Honeywell Inc. Fast response thermochromatographic capillary columns
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US4782708A (en) * 1987-08-27 1988-11-08 General Motors Corporation Thermocouple sensors

Also Published As

Publication number Publication date
US5031229A (en) 1991-07-09
EP0491811A1 (de) 1992-07-01
EP0491811B1 (de) 1996-01-17
CA2066573A1 (en) 1991-03-14
DE69024964T2 (de) 1996-09-19
EP0491811A4 (de) 1994-03-30
JPH05503317A (ja) 1993-06-03
JP3301757B2 (ja) 2002-07-15
ATE133249T1 (de) 1996-02-15
WO1991004348A1 (en) 1991-04-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee