ATE133249T1 - Aufdampf-heizvorrichtung - Google Patents

Aufdampf-heizvorrichtung

Info

Publication number
ATE133249T1
ATE133249T1 AT90914089T AT90914089T ATE133249T1 AT E133249 T1 ATE133249 T1 AT E133249T1 AT 90914089 T AT90914089 T AT 90914089T AT 90914089 T AT90914089 T AT 90914089T AT E133249 T1 ATE133249 T1 AT E133249T1
Authority
AT
Austria
Prior art keywords
thin film
heating elements
film heating
heating device
steam heating
Prior art date
Application number
AT90914089T
Other languages
English (en)
Inventor
Loren A Chow
Original Assignee
Loren A Chow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Loren A Chow filed Critical Loren A Chow
Application granted granted Critical
Publication of ATE133249T1 publication Critical patent/ATE133249T1/de

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/08—Details peculiar to crucible or pot furnaces
    • F27B14/10—Crucibles
    • F27B14/12—Covers therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/08—Details peculiar to crucible or pot furnaces
    • F27B14/14—Arrangements of heating devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/08—Details peculiar to crucible or pot furnaces
    • F27B14/10—Crucibles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B2014/002—Smelting process, e.g. sequences to melt a specific material
    • F27B2014/004—Process involving a smelting step, e.g. vaporisation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • F27D99/0001—Heating elements or systems
    • F27D99/0006—Electric heating elements or system
    • F27D2099/0008—Resistor heating

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AT90914089T 1989-09-13 1990-09-07 Aufdampf-heizvorrichtung ATE133249T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/406,785 US5031229A (en) 1989-09-13 1989-09-13 Deposition heaters

Publications (1)

Publication Number Publication Date
ATE133249T1 true ATE133249T1 (de) 1996-02-15

Family

ID=23609448

Family Applications (1)

Application Number Title Priority Date Filing Date
AT90914089T ATE133249T1 (de) 1989-09-13 1990-09-07 Aufdampf-heizvorrichtung

Country Status (7)

Country Link
US (1) US5031229A (de)
EP (1) EP0491811B1 (de)
JP (1) JP3301757B2 (de)
AT (1) ATE133249T1 (de)
CA (1) CA2066573A1 (de)
DE (1) DE69024964T2 (de)
WO (1) WO1991004348A1 (de)

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US6376816B2 (en) * 2000-03-03 2002-04-23 Richard P. Cooper Thin film tubular heater
US7194197B1 (en) 2000-03-16 2007-03-20 Global Solar Energy, Inc. Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer
KR100889758B1 (ko) * 2002-09-03 2009-03-20 삼성모바일디스플레이주식회사 유기박막 형성장치의 가열용기
US20040074898A1 (en) * 2002-10-21 2004-04-22 Mariner John T. Encapsulated graphite heater and process
US20050022743A1 (en) * 2003-07-31 2005-02-03 Semiconductor Energy Laboratory Co., Ltd. Evaporation container and vapor deposition apparatus
US8123862B2 (en) * 2003-08-15 2012-02-28 Semiconductor Energy Laboratory Co., Ltd. Deposition apparatus and manufacturing apparatus
US7339139B2 (en) * 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
JP2005222746A (ja) * 2004-02-04 2005-08-18 Doshisha 薄膜発熱体およびその製造方法
US20050229856A1 (en) * 2004-04-20 2005-10-20 Malik Roger J Means and method for a liquid metal evaporation source with integral level sensor and external reservoir
JP4476019B2 (ja) * 2004-05-20 2010-06-09 東北パイオニア株式会社 成膜源、真空成膜装置、有機ｅｌ素子の製造方法
US7402779B2 (en) * 2004-07-13 2008-07-22 Lucent Technologies Inc. Effusion cell and method for use in molecular beam deposition
KR100980729B1 (ko) * 2006-07-03 2010-09-07 주식회사 야스 증착 공정용 다중 노즐 증발원
US7741584B2 (en) * 2007-01-21 2010-06-22 Momentive Performance Materials Inc. Encapsulated graphite heater and process
DE102007035166B4 (de) * 2007-07-27 2010-07-29 Createc Fischer & Co. Gmbh Hochtemperatur-Verdampferzelle mit parallel geschalteten Heizbereichen, Verfahren zu deren Betrieb und deren Verwendung in Beschichtungsanlagen
CN101849032B (zh) * 2007-11-05 2013-05-01 株式会社爱发科 蒸镀源、有机el元件的制造装置
EP2291855B1 (de) 2008-04-15 2018-06-27 Global Solar Energy, Inc. Vorrichtungen zur herstellung von dünnfilmsolarzellen
US8512806B2 (en) * 2008-08-12 2013-08-20 Momentive Performance Materials Inc. Large volume evaporation source
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
US20100285218A1 (en) * 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
US20100282167A1 (en) * 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
US20110177622A1 (en) * 2009-12-28 2011-07-21 Global Solar Energy, Inc. Apparatus and methods of mixing and depositing thin film photovoltaic compositions
KR101172275B1 (ko) * 2009-12-31 2012-08-08 에스엔유 프리시젼 주식회사 기화 장치 및 이의 제어 방법
DE102014000313A1 (de) * 2014-01-10 2015-07-16 Audi Ag Vorrichtung zum Abgeben eines Duftstoffs und Kraftfahrzeug mit einer derartigen Vorrichtung
CN104078626B (zh) * 2014-07-22 2016-07-06 深圳市华星光电技术有限公司 用于oled材料蒸镀的加热装置
CN105088145B (zh) * 2015-08-19 2017-03-29 京东方科技集团股份有限公司 用于oled蒸发源的坩埚及其制造方法
CN105132865B (zh) * 2015-08-20 2017-12-08 京东方科技集团股份有限公司 蒸发源装置及蒸镀设备
CN106756804A (zh) * 2016-12-20 2017-05-31 武汉华星光电技术有限公司 蒸镀坩埚及其蒸镀方法
WO2018175753A1 (en) * 2017-03-22 2018-09-27 University Of Delaware Centrifugal evaporation sources
WO2019223853A1 (en) * 2018-05-22 2019-11-28 Applied Materials, Inc. Evaporation source, method for operating an evaporation source and deposition system

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Also Published As

Publication number Publication date
DE69024964D1 (de) 1996-02-29
JPH05503317A (ja) 1993-06-03
WO1991004348A1 (en) 1991-04-04
JP3301757B2 (ja) 2002-07-15
DE69024964T2 (de) 1996-09-19
EP0491811B1 (de) 1996-01-17
EP0491811A4 (de) 1994-03-30
US5031229A (en) 1991-07-09
EP0491811A1 (de) 1992-07-01
CA2066573A1 (en) 1991-03-14

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties