JPS6445193A - Method for forming conductor path - Google Patents

Method for forming conductor path

Info

Publication number
JPS6445193A
JPS6445193A JP20077587A JP20077587A JPS6445193A JP S6445193 A JPS6445193 A JP S6445193A JP 20077587 A JP20077587 A JP 20077587A JP 20077587 A JP20077587 A JP 20077587A JP S6445193 A JPS6445193 A JP S6445193A
Authority
JP
Japan
Prior art keywords
evaporation
base material
transparent substrate
target base
conductor path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20077587A
Other languages
Japanese (ja)
Inventor
Masayuki Saito
Akira Niitsuma
Hiroshi Ohira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP20077587A priority Critical patent/JPS6445193A/en
Publication of JPS6445193A publication Critical patent/JPS6445193A/en
Pending legal-status Critical Current

Links

Landscapes

  • Manufacturing Of Electric Cables (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To make a screen mask unnecessary by selectively applying an energy beam in accordance with a conductor path pattern of a desired shape from the transparent substrate side placed on an evaporation target base material to selectively heat and vaporize the evaporation target base material, thereby depositing it on the transparent substrate. CONSTITUTION:An evaporation target base material 1 is made of Cu, a transparent substrate 2 is placed in contact with one principal surface of the evaporation target base material 1, and from the exposed principal surface side of the transparent sub strate 2, an energy beam 3 by a laser is selectively applied in accordance with a conductor path pattern of a desired shape. Accordingly, a conductor pattern 4 is formed on the principal surface where a surface contact is made between the transparent substrate 2 and the evaporation target base material. That is, because of a very near distance evaporation, the evaporation material is firmly deposited on the surface facing the target of the transparent substrate at a high temperature, thereby obtaining a desired conductor path pattern free of scattering of the material. Since a conductor path can be formed on a desired position on the substrate in this way without using a screen mask, it is not required to create or modify a mask, whereby the number of processes is reduced.
JP20077587A 1987-08-13 1987-08-13 Method for forming conductor path Pending JPS6445193A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20077587A JPS6445193A (en) 1987-08-13 1987-08-13 Method for forming conductor path

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20077587A JPS6445193A (en) 1987-08-13 1987-08-13 Method for forming conductor path

Publications (1)

Publication Number Publication Date
JPS6445193A true JPS6445193A (en) 1989-02-17

Family

ID=16429973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20077587A Pending JPS6445193A (en) 1987-08-13 1987-08-13 Method for forming conductor path

Country Status (1)

Country Link
JP (1) JPS6445193A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0234916A (en) * 1988-03-01 1990-02-05 Texas Instr Inc <Ti> Method of applying pattern by radiation induction
US5119628A (en) * 1990-07-09 1992-06-09 Nissan Motor Co., Ltd. Catalyst degradation diagnosing apparatus for air fuel ratio control system
JPH06104551A (en) * 1992-09-21 1994-04-15 Miyachi Technos Kk Production of printed wiring board and method for ptinting wiring on glass plate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0234916A (en) * 1988-03-01 1990-02-05 Texas Instr Inc <Ti> Method of applying pattern by radiation induction
US5119628A (en) * 1990-07-09 1992-06-09 Nissan Motor Co., Ltd. Catalyst degradation diagnosing apparatus for air fuel ratio control system
JPH06104551A (en) * 1992-09-21 1994-04-15 Miyachi Technos Kk Production of printed wiring board and method for ptinting wiring on glass plate

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