FI943498A - Menetelmä substraatin valmistamiseksi, jonka pinnalla on ikkunanmuotoisia ja kehysmuotoisia kalvoja - Google Patents

Menetelmä substraatin valmistamiseksi, jonka pinnalla on ikkunanmuotoisia ja kehysmuotoisia kalvoja Download PDF

Info

Publication number
FI943498A
FI943498A FI943498A FI943498A FI943498A FI 943498 A FI943498 A FI 943498A FI 943498 A FI943498 A FI 943498A FI 943498 A FI943498 A FI 943498A FI 943498 A FI943498 A FI 943498A
Authority
FI
Finland
Prior art keywords
shaped
window
substrate
making
frame
Prior art date
Application number
FI943498A
Other languages
English (en)
Swedish (sv)
Other versions
FI943498A0 (fi
Inventor
Tsutomu Watanabe
Yasuhiko Teshima
Miki Matsumura
Susumu Miyazaki
Yoshikatsu Okada
Original Assignee
Shinto Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP18379593A external-priority patent/JPH0735919A/ja
Priority claimed from JP5183794A external-priority patent/JPH0735918A/ja
Priority claimed from JP18475593A external-priority patent/JPH0743516A/ja
Priority claimed from JP18475493A external-priority patent/JPH0743515A/ja
Application filed by Shinto Paint Co Ltd filed Critical Shinto Paint Co Ltd
Publication of FI943498A0 publication Critical patent/FI943498A0/fi
Publication of FI943498A publication Critical patent/FI943498A/fi

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FI943498A 1993-07-26 1994-07-25 Menetelmä substraatin valmistamiseksi, jonka pinnalla on ikkunanmuotoisia ja kehysmuotoisia kalvoja FI943498A (fi)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP18379593A JPH0735919A (ja) 1993-07-26 1993-07-26 機能性塗膜等を形成する方法
JP5183794A JPH0735918A (ja) 1993-07-26 1993-07-26 基板上に窓部の塗膜と枠部の機能性塗膜を形成する方法
JP18475593A JPH0743516A (ja) 1993-07-27 1993-07-27 枠部の機能性塗膜等を形成する方法
JP18475493A JPH0743515A (ja) 1993-07-27 1993-07-27 窓部の塗膜と枠部の塗膜を形成する方法

Publications (2)

Publication Number Publication Date
FI943498A0 FI943498A0 (fi) 1994-07-25
FI943498A true FI943498A (fi) 1995-01-27

Family

ID=27475127

Family Applications (1)

Application Number Title Priority Date Filing Date
FI943498A FI943498A (fi) 1993-07-26 1994-07-25 Menetelmä substraatin valmistamiseksi, jonka pinnalla on ikkunanmuotoisia ja kehysmuotoisia kalvoja

Country Status (6)

Country Link
US (1) US5578403A (fi)
EP (1) EP0636931B1 (fi)
KR (1) KR950004439A (fi)
DE (1) DE69403576T2 (fi)
FI (1) FI943498A (fi)
TW (1) TW297105B (fi)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW426806B (en) * 1994-05-18 2001-03-21 Toshiba Corp Fabricating method of liquid crystal display apparatus
JPH08179302A (ja) * 1994-12-22 1996-07-12 Seiko Instr Inc 多色液晶表示装置の製造方法
US5725976A (en) * 1996-01-30 1998-03-10 Sumitomo Chemical Company, Limited Method for manufacture of a color filter
JP2000017490A (ja) * 1998-06-29 2000-01-18 Sony Corp ポリイミド複合電着膜の形成方法
US8017531B2 (en) * 2001-09-18 2011-09-13 Elkcorp Composite material
US7067236B2 (en) * 2002-07-19 2006-06-27 Canon Kabushiki Kaisha Method of manufacturing member pattern, method of manufacturing wiring structure, method of manufacturing electron source, and method of manufacturing image display device
US20120121822A1 (en) * 2010-11-12 2012-05-17 Kai-Ti Yang Manufacture method for thin film frame layer of display panel

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4311773A (en) * 1979-02-28 1982-01-19 Hitachi, Ltd. Method of producing color filters
JPS6033506A (ja) * 1983-08-04 1985-02-20 Seiko Instr & Electronics Ltd カラ−固体撮像素子の製造方法
JPS62160421A (ja) * 1986-01-08 1987-07-16 Shinto Paint Co Ltd 微細な導電性回路の間に機能性塗膜を形成する方法
JPH07117662B2 (ja) * 1986-04-21 1995-12-18 神東塗料株式会社 微細な透明導電性回路パタ−ン上およびその間隙に機能性薄膜を形成する方法
JP2669826B2 (ja) * 1987-07-17 1997-10-29 日本ペイント株式会社 着色表示装置の製造方法
US4767723A (en) * 1987-10-30 1988-08-30 International Business Machines Corporation Process for making self-aligning thin film transistors
JPH0792574B2 (ja) * 1988-12-21 1995-10-09 インターナショナル・ビジネス・マシーンズ・コーポレーション 液晶表示装置およびその製造方法
JPH03287103A (ja) * 1990-04-02 1991-12-17 Seiko Epson Corp カラーフィルターの形成法

Also Published As

Publication number Publication date
DE69403576T2 (de) 1997-09-18
EP0636931A1 (en) 1995-02-01
EP0636931B1 (en) 1997-06-04
TW297105B (fi) 1997-02-01
FI943498A0 (fi) 1994-07-25
US5578403A (en) 1996-11-26
DE69403576D1 (de) 1997-07-10
KR950004439A (ko) 1995-02-18

Similar Documents

Publication Publication Date Title
EP0658525A3 (en) Multi-layer, water-repellent film and process for its production on a glass substrate.
DE69320451D1 (de) Mit Kohlenstoff überzogene inorganische Substrate
EP0492545A3 (en) Transparent substrate with monomolecular film thereon and method of manufacturing the same
NO951871D0 (no) Fremgangsmåte for dannelse av et sölvbelegg på et vitröst substrat
DK93895A (da) Belagt substrat og fremgangsmåde til fremstilling af samme
MX9101837A (es) Composicion de fluidos de correccion y metodo para producir un revestimiento correctivo en la superficie de un substrato
SG49343A1 (en) Semiconductor and a method for manufacturing an oxide film on the surface of a semiconductor substrate
DE59403364D1 (de) Metallbeschichtetes Substrat
EP0609861A3 (en) Ceramic substrate and manufacturing process.
AU4245589A (en) A thermosetting covering sheet and a method of forming hard coating on the surface of substrates using the same
EP0660178A3 (en) Photographic element containing a transparent magnetic layer and its method.
GB2248634B (en) A method of forming a platinum film on a heat-resistant substrate
DE69111487D1 (de) Beschichtete Substrate.
BR8407050A (pt) Processo e aparelho para revestimento de um substrato
BR9205524A (pt) Substrato revestido de plastico processo de obtencao do mesmo e processo de fabricacao da folha de madeira compensada revestida de plastico
FI944317A0 (fi) Menetelmä ikkunan muotoisia päällystekalvoja ja kehyksen muotisen päällystekalvon pinnallaan sisältävän substraatin valmistamiseksi
EP0477990A3 (en) A method of enhancing the properties of a thin film on a substrate
FI881357A (fi) Lasituote ja menetelmä titaania sisältävän päällysteen valmistamiseksi lasialustalle
IT8467448A1 (it) Procedimento e apparecchiatura per formare un rivestimento su un substrato vetroso caldo.
FI943498A0 (fi) Menetelmä substraatin valmistamiseksi, jonka pinnalla on ikkunanmuotoisia ja kehysmuotoisia kalvoja
KR900008664A (ko) 캐리어기판 및 그 제조방법
DE69402713D1 (de) Monolotisches substrat aus gewellter, dünner metallfolie
GB2275691B (en) Coated glass substrate and method of manufacturing same
FI943497A0 (fi) Menetelmä ikkunan ja kehyksen muotoisia päällystekalvoja pinnallaan sisältävän substraatin valmistamiseksi
DE69218723D1 (de) Metallisierte Filmstruktur und Verfahren

Legal Events

Date Code Title Description
GB Transfer or assigment of application

Owner name: SUMITOMO CHEMICAL COMPANY, LIMITED