FI943498A0 - Menetelmä substraatin valmistamiseksi, jonka pinnalla on ikkunanmuotoisia ja kehysmuotoisia kalvoja - Google Patents

Menetelmä substraatin valmistamiseksi, jonka pinnalla on ikkunanmuotoisia ja kehysmuotoisia kalvoja

Info

Publication number
FI943498A0
FI943498A0 FI943498A FI943498A FI943498A0 FI 943498 A0 FI943498 A0 FI 943498A0 FI 943498 A FI943498 A FI 943498A FI 943498 A FI943498 A FI 943498A FI 943498 A0 FI943498 A0 FI 943498A0
Authority
FI
Finland
Prior art keywords
shaped
window
substrate
making
frame
Prior art date
Application number
FI943498A
Other languages
English (en)
Swedish (sv)
Other versions
FI943498A (fi
Inventor
Tsutomu Watanabe
Yasuhiko Teshima
Miki Matsumura
Susumu Miyazaki
Yoshikatsu Okada
Original Assignee
Shinto Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP18379593A external-priority patent/JPH0735919A/ja
Priority claimed from JP5183794A external-priority patent/JPH0735918A/ja
Priority claimed from JP18475493A external-priority patent/JPH0743515A/ja
Priority claimed from JP18475593A external-priority patent/JPH0743516A/ja
Application filed by Shinto Paint Co Ltd filed Critical Shinto Paint Co Ltd
Publication of FI943498A0 publication Critical patent/FI943498A0/fi
Publication of FI943498A publication Critical patent/FI943498A/fi

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/308Chemical or electrical treatment, e.g. electrolytic etching using masks
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FI943498A 1993-07-26 1994-07-25 Menetelmä substraatin valmistamiseksi, jonka pinnalla on ikkunanmuotoisia ja kehysmuotoisia kalvoja FI943498A (fi)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP18379593A JPH0735919A (ja) 1993-07-26 1993-07-26 機能性塗膜等を形成する方法
JP5183794A JPH0735918A (ja) 1993-07-26 1993-07-26 基板上に窓部の塗膜と枠部の機能性塗膜を形成する方法
JP18475493A JPH0743515A (ja) 1993-07-27 1993-07-27 窓部の塗膜と枠部の塗膜を形成する方法
JP18475593A JPH0743516A (ja) 1993-07-27 1993-07-27 枠部の機能性塗膜等を形成する方法

Publications (2)

Publication Number Publication Date
FI943498A0 true FI943498A0 (fi) 1994-07-25
FI943498A FI943498A (fi) 1995-01-27

Family

ID=27475127

Family Applications (1)

Application Number Title Priority Date Filing Date
FI943498A FI943498A (fi) 1993-07-26 1994-07-25 Menetelmä substraatin valmistamiseksi, jonka pinnalla on ikkunanmuotoisia ja kehysmuotoisia kalvoja

Country Status (6)

Country Link
US (1) US5578403A (fi)
EP (1) EP0636931B1 (fi)
KR (1) KR950004439A (fi)
DE (1) DE69403576T2 (fi)
FI (1) FI943498A (fi)
TW (1) TW297105B (fi)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW426806B (en) * 1994-05-18 2001-03-21 Toshiba Corp Fabricating method of liquid crystal display apparatus
JPH08179302A (ja) * 1994-12-22 1996-07-12 Seiko Instr Inc 多色液晶表示装置の製造方法
US5725976A (en) * 1996-01-30 1998-03-10 Sumitomo Chemical Company, Limited Method for manufacture of a color filter
JP2000017490A (ja) * 1998-06-29 2000-01-18 Sony Corp ポリイミド複合電着膜の形成方法
US8017531B2 (en) * 2001-09-18 2011-09-13 Elkcorp Composite material
US7067236B2 (en) * 2002-07-19 2006-06-27 Canon Kabushiki Kaisha Method of manufacturing member pattern, method of manufacturing wiring structure, method of manufacturing electron source, and method of manufacturing image display device
US20120121822A1 (en) * 2010-11-12 2012-05-17 Kai-Ti Yang Manufacture method for thin film frame layer of display panel

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4311773A (en) * 1979-02-28 1982-01-19 Hitachi, Ltd. Method of producing color filters
JPS6033506A (ja) * 1983-08-04 1985-02-20 Seiko Instr & Electronics Ltd カラ−固体撮像素子の製造方法
JPS62160421A (ja) * 1986-01-08 1987-07-16 Shinto Paint Co Ltd 微細な導電性回路の間に機能性塗膜を形成する方法
JPH07117662B2 (ja) * 1986-04-21 1995-12-18 神東塗料株式会社 微細な透明導電性回路パタ−ン上およびその間隙に機能性薄膜を形成する方法
JP2669826B2 (ja) * 1987-07-17 1997-10-29 日本ペイント株式会社 着色表示装置の製造方法
US4767723A (en) * 1987-10-30 1988-08-30 International Business Machines Corporation Process for making self-aligning thin film transistors
JPH0792574B2 (ja) * 1988-12-21 1995-10-09 インターナショナル・ビジネス・マシーンズ・コーポレーション 液晶表示装置およびその製造方法
JPH03287103A (ja) * 1990-04-02 1991-12-17 Seiko Epson Corp カラーフィルターの形成法

Also Published As

Publication number Publication date
DE69403576D1 (de) 1997-07-10
KR950004439A (ko) 1995-02-18
TW297105B (fi) 1997-02-01
DE69403576T2 (de) 1997-09-18
US5578403A (en) 1996-11-26
EP0636931B1 (en) 1997-06-04
FI943498A (fi) 1995-01-27
EP0636931A1 (en) 1995-02-01

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Legal Events

Date Code Title Description
GB Transfer or assigment of application

Owner name: SUMITOMO CHEMICAL COMPANY, LIMITED