DE69012555T2 - Methode zur Herstellung von mikromechanischen Sensoren für AFM/STM/MFM-Profilometrie und mikromechanischer AFM/STM/MFM-Sensorkopf. - Google Patents

Methode zur Herstellung von mikromechanischen Sensoren für AFM/STM/MFM-Profilometrie und mikromechanischer AFM/STM/MFM-Sensorkopf.

Info

Publication number
DE69012555T2
DE69012555T2 DE69012555T DE69012555T DE69012555T2 DE 69012555 T2 DE69012555 T2 DE 69012555T2 DE 69012555 T DE69012555 T DE 69012555T DE 69012555 T DE69012555 T DE 69012555T DE 69012555 T2 DE69012555 T2 DE 69012555T2
Authority
DE
Germany
Prior art keywords
stm
afm
mfm
micromechanical
profilometry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69012555T
Other languages
English (en)
Other versions
DE69012555D1 (de
Inventor
Thomas Bayer
Johann Dr Greschner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE69012555D1 publication Critical patent/DE69012555D1/de
Application granted granted Critical
Publication of DE69012555T2 publication Critical patent/DE69012555T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
    • G01Q60/38—Probes, their manufacture, or their related instrumentation, e.g. holders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/02—Multiple-type SPM, i.e. involving more than one SPM techniques
    • G01Q60/04—STM [Scanning Tunnelling Microscopy] combined with AFM [Atomic Force Microscopy]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/02—Multiple-type SPM, i.e. involving more than one SPM techniques
    • G01Q60/08—MFM [Magnetic Force Microscopy] combined with AFM [Atomic Force Microscopy
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/10—STM [Scanning Tunnelling Microscopy] or apparatus therefor, e.g. STM probes
    • G01Q60/16—Probes, their manufacture, or their related instrumentation, e.g. holders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/875—Scanning probe structure with tip detail
    • Y10S977/878—Shape/taper

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • ing And Chemical Polishing (AREA)
  • Micromachines (AREA)
  • Drying Of Semiconductors (AREA)
DE69012555T 1990-07-25 1990-07-25 Methode zur Herstellung von mikromechanischen Sensoren für AFM/STM/MFM-Profilometrie und mikromechanischer AFM/STM/MFM-Sensorkopf. Expired - Fee Related DE69012555T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP90114219A EP0468071B1 (de) 1990-07-25 1990-07-25 Methode zur Herstellung von mikromechanischen Sensoren für AFM/STM/MFM-Profilometrie und mikromechanischer AFM/STM/MFM-Sensorkopf

Publications (2)

Publication Number Publication Date
DE69012555D1 DE69012555D1 (de) 1994-10-20
DE69012555T2 true DE69012555T2 (de) 1995-04-06

Family

ID=8204257

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69012555T Expired - Fee Related DE69012555T2 (de) 1990-07-25 1990-07-25 Methode zur Herstellung von mikromechanischen Sensoren für AFM/STM/MFM-Profilometrie und mikromechanischer AFM/STM/MFM-Sensorkopf.

Country Status (4)

Country Link
US (2) US5282924A (de)
EP (1) EP0468071B1 (de)
JP (1) JPH0748349B2 (de)
DE (1) DE69012555T2 (de)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5264696A (en) * 1991-05-20 1993-11-23 Olympus Optical Co., Ltd. Cantilever chip for scanning probe microscope having first and second probes formed with different aspect ratios
DE4332057A1 (de) * 1993-09-21 1995-03-30 Siemens Ag Integrierte mikromechanische Sensorvorrichtung und Verfahren zu deren Herstellung
US5439847A (en) * 1993-11-05 1995-08-08 At&T Corp. Integrated circuit fabrication with a raised feature as mask
US20020053734A1 (en) 1993-11-16 2002-05-09 Formfactor, Inc. Probe card assembly and kit, and methods of making same
US5395741A (en) * 1993-12-22 1995-03-07 At&T Corp. Method of making fiber probe devices using patterned reactive ion etching
US5394500A (en) * 1993-12-22 1995-02-28 At&T Corp. Fiber probe device having multiple diameters
US5480046A (en) * 1993-12-22 1996-01-02 At&T Corp. Fiber probe fabrication having a tip with concave sidewalls
US5844251A (en) * 1994-01-05 1998-12-01 Cornell Research Foundation, Inc. High aspect ratio probes with self-aligned control electrodes
US5804314A (en) * 1994-03-22 1998-09-08 Hewlett-Packard Company Silicon microstructures and process for their fabrication
US5658636A (en) * 1995-01-27 1997-08-19 Carnegie Mellon University Method to prevent adhesion of micromechanical structures
US5628917A (en) * 1995-02-03 1997-05-13 Cornell Research Foundation, Inc. Masking process for fabricating ultra-high aspect ratio, wafer-free micro-opto-electromechanical structures
FR2732467B1 (fr) * 1995-02-10 1999-09-17 Bosch Gmbh Robert Capteur d'acceleration et procede de fabrication d'un tel capteur
US5611942A (en) * 1995-03-02 1997-03-18 Kabushiki Kaisha Toshiba Method for producing tips for atomic force microscopes
EP0868648B1 (de) * 1995-12-11 2003-04-02 Xros, Inc. Integrierter silikonprofilmesser und rastersonde
US5861549A (en) 1996-12-10 1999-01-19 Xros, Inc. Integrated Silicon profilometer and AFM head
US8033838B2 (en) 1996-02-21 2011-10-11 Formfactor, Inc. Microelectronic contact structure
DE19646120C2 (de) * 1996-06-13 2001-07-26 Ibm Mikromechanischer Sensor für die AFM/STM Profilometrie
US6066265A (en) * 1996-06-19 2000-05-23 Kionix, Inc. Micromachined silicon probe for scanning probe microscopy
US5637189A (en) * 1996-06-25 1997-06-10 Xerox Corporation Dry etch process control using electrically biased stop junctions
US5865938A (en) * 1996-06-25 1999-02-02 Xerox Corporation Wafer chuck for inducing an electrical bias across wafer heterojunctions
US5729026A (en) * 1996-08-29 1998-03-17 International Business Machines Corporation Atomic force microscope system with angled cantilever having integral in-plane tip
US6088320A (en) * 1997-02-19 2000-07-11 International Business Machines Corporation Micro-mechanically fabricated read/write head with a strengthening shell on the tip shaft
US5969345A (en) * 1997-04-30 1999-10-19 University Of Utah Research Foundation Micromachined probes for nanometer scale measurements and methods of making such probes
FR2763745B1 (fr) * 1997-05-23 1999-08-27 Sextant Avionique Procede de fabrication d'un micro-capteur en silicium usine
US5936243A (en) * 1997-06-09 1999-08-10 Ian Hardcastle Conductive micro-probe and memory device
US5846884A (en) * 1997-06-20 1998-12-08 Siemens Aktiengesellschaft Methods for metal etching with reduced sidewall build up during integrated circuit manufacturing
US5892223A (en) * 1997-06-30 1999-04-06 Harris Corporation Multilayer microtip probe and method
US6139759A (en) * 1997-07-08 2000-10-31 International Business Machines Corporation Method of manufacturing silicided silicon microtips for scanning probe microscopy
DE19926601B4 (de) * 1998-09-12 2007-03-29 Witec Wissenschaftliche Instrumente Und Technologie Gmbh Apertur in einem Halbleitermaterial sowie Herstellung der Apertur und Verwendung
AU2001285425A1 (en) * 2000-08-09 2002-02-18 California Institute Of Technology Active nems arrays for biochemical analyses
US7375321B2 (en) 2000-08-09 2008-05-20 California Institute Of Technology Dynamics bionems sensors and arrays of bionems sensor immersed in fluids
JP2002079499A (ja) * 2000-09-08 2002-03-19 Terumo Corp 針形状物の作製方法および作製された針
US6599362B2 (en) * 2001-01-03 2003-07-29 Sandia Corporation Cantilever epitaxial process
DE50200467D1 (de) 2002-03-20 2004-06-24 Nanoworld Ag Neuchatel SPM-Sensor und Verfahren zur Herstellung desselben
DE50201770D1 (de) 2002-03-20 2005-01-20 Nanoworld Ag Neuchatel Verfahren zur Herstellung eines SPM-Sensors
JP4403585B2 (ja) 2005-10-06 2010-01-27 並木精密宝石株式会社 探針及びカンチレバー
US8168120B1 (en) 2007-03-06 2012-05-01 The Research Foundation Of State University Of New York Reliable switch that is triggered by the detection of a specific gas or substance
US7823216B2 (en) * 2007-08-02 2010-10-26 Veeco Instruments Inc. Probe device for a metrology instrument and method of fabricating the same
JP5303924B2 (ja) * 2007-12-20 2013-10-02 大日本印刷株式会社 型の製造方法
US9038269B2 (en) * 2013-04-02 2015-05-26 Xerox Corporation Printhead with nanotips for nanoscale printing and manufacturing
CN109073675B (zh) * 2015-12-14 2021-01-15 米纳斯吉拉斯联合大学 用于扫描探针显微术的金属装置及其制造方法
DE102019213043B4 (de) 2019-08-29 2023-01-19 Gottfried Wilhelm Leibniz Universität Hannover Verfahren zur Herstellung von Diamantspitzen und nach dem Verfahren hergestellte Diamantspitze
RU2759415C1 (ru) * 2020-12-20 2021-11-12 СканСенс ГмбХ Кантилевер с кремневой иглой комплексной формы
CN112986622B (zh) * 2021-03-02 2023-03-14 中国科学院半导体研究所 圆片级纳米针尖及其制作方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0194323B1 (de) * 1985-03-07 1989-08-02 International Business Machines Corporation Tunneleffektabtastungsmikroskop
FR2590409B1 (fr) * 1985-11-15 1987-12-11 Commissariat Energie Atomique Procede de fabrication d'un transistor en couches minces a grille auto-alignee par rapport au drain et a la source de celui-ci et transistor obtenu par le procede
JPS6420428A (en) * 1987-07-15 1989-01-24 Fujitsu Ltd Formation of acicular member
JPH01132903A (ja) * 1987-11-18 1989-05-25 Hitachi Ltd 走査型トンネル顕微鏡
US4906840A (en) * 1988-01-27 1990-03-06 The Board Of Trustees Of Leland Stanford Jr., University Integrated scanning tunneling microscope
JP2656536B2 (ja) * 1988-04-13 1997-09-24 株式会社日立製作所 プローブおよびその製造方法
US5066358A (en) * 1988-10-27 1991-11-19 Board Of Trustees Of The Leland Stanford Juninor University Nitride cantilevers with single crystal silicon tips
US4943719A (en) * 1989-01-17 1990-07-24 The Board Of Trustees Of The Leland Stanford University Microminiature cantilever stylus
US4968585A (en) * 1989-06-20 1990-11-06 The Board Of Trustees Of The Leland Stanford Jr. University Microfabricated cantilever stylus with integrated conical tip
US5021364A (en) * 1989-10-31 1991-06-04 The Board Of Trustees Of The Leland Stanford Junior University Microcantilever with integral self-aligned sharp tetrahedral tip
US5026437A (en) * 1990-01-22 1991-06-25 Tencor Instruments Cantilevered microtip manufacturing by ion implantation and etching
US5203731A (en) * 1990-07-18 1993-04-20 International Business Machines Corporation Process and structure of an integrated vacuum microelectronic device
US5141459A (en) * 1990-07-18 1992-08-25 International Business Machines Corporation Structures and processes for fabricating field emission cathodes
US5164595A (en) * 1990-09-10 1992-11-17 North Carolina State University Scanning tunneling microscope tips
US5171992A (en) * 1990-10-31 1992-12-15 International Business Machines Corporation Nanometer scale probe for an atomic force microscope, and method for making same
US5235187A (en) * 1991-05-14 1993-08-10 Cornell Research Foundation Methods of fabricating integrated, aligned tunneling tip pairs
US5302239A (en) * 1992-05-15 1994-04-12 Micron Technology, Inc. Method of making atomically sharp tips useful in scanning probe microscopes
US5321977A (en) * 1992-12-31 1994-06-21 International Business Machines Corporation Integrated tip strain sensor for use in combination with a single axis atomic force microscope

Also Published As

Publication number Publication date
US5282924A (en) 1994-02-01
JPH0748349B2 (ja) 1995-05-24
DE69012555D1 (de) 1994-10-20
JPH04233128A (ja) 1992-08-21
US5455419A (en) 1995-10-03
EP0468071B1 (de) 1994-09-14
EP0468071A1 (de) 1992-01-29

Similar Documents

Publication Publication Date Title
DE69012555T2 (de) Methode zur Herstellung von mikromechanischen Sensoren für AFM/STM/MFM-Profilometrie und mikromechanischer AFM/STM/MFM-Sensorkopf.
DE59900871D1 (de) Mikromechanischer drehratensensor und verfahren zur herstellung
DE69729632D1 (de) Sauerstoffsensormembranen und verfahren zur herstellung derselben
DE68903951T2 (de) Verfahren fuer die herstellung mikromechanischer messfuehler fuer afm/stm-profilometrie und mikromechanischer messfuehlerkopf.
DE68902141D1 (de) Verfahren fuer die herstellung mikromechanischer messfuehler fuer afm/stm-profilometrie und mikromechanischer messfuehlerkopf.
DE59108665D1 (de) Temperaturfühler und verfahren zur herstellung von temperaturfühlerelementen
DE19680590D2 (de) Verfahren zur Herstellung von Beschleunigungssensoren
DE69231990D1 (de) Feld aus integrierten mikromechanischen strahlungssensoren und verfahren zur herstellung.
DE3877751D1 (de) Kunstlunge vom membrantyp und verfahren zur herstellung.
DE69531580D1 (de) Fabrikationsmethode von aufhängungsteilen für mikrogefertigte sensoren
DE69111115T2 (de) Verfahren zur Herstellung poröser Keramikfilter unter Verwendung von Talk- und SiO2-Pulver enthaltendem Cordierit.
DE3874847T2 (de) Biegsamer filtersack und verfahren zur herstellung.
DE3879218D1 (de) Medizinisches instrument und verfahren zur herstellung.
DE69412769D1 (de) Kapazitiver Sensor und Verfahren zur Herstellung
DE69220591T2 (de) Enzymbiosensor und Verfahren zur Herstellung desselben
DE69123619T2 (de) Verfahren zur Herstellung eines Gassensorelements
DE59701673D1 (de) Verfahren zur herstellung von mikromechanischen sensoren
DE69102275D1 (de) Alumina enthaltende säureadsorbentien und verfahren zur herstellung derselben.
DE3869438D1 (de) Aminoplast-kondensate und verfahren zur herstellung davon.
DE3750779D1 (de) Enzym-Sensor und Verfahren zur Herstellung desselben.
DE3853432D1 (de) Verfahren zur Herstellung von Sensoren auf Siliziumgrundlage.
DE69223011D1 (de) Verfahren zur Herstellung von Alkoholen und Ketonen
DE3886562T2 (de) Magnetoresistiver Sensor und Verfahren zu seiner Herstellung.
DE59900865D1 (de) Kapazitive druck- oder kraftsensorstruktur und verfahren zur herstellung derselben
DE59007628D1 (de) Verfahren zur Herstellung von stabilisiertem Chromdioxid und magnetischer Aufzeichnungsträger enthaltend dieses Material.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee