DE69231990D1 - Feld aus integrierten mikromechanischen strahlungssensoren und verfahren zur herstellung. - Google Patents

Feld aus integrierten mikromechanischen strahlungssensoren und verfahren zur herstellung.

Info

Publication number
DE69231990D1
DE69231990D1 DE69231990T DE69231990T DE69231990D1 DE 69231990 D1 DE69231990 D1 DE 69231990D1 DE 69231990 T DE69231990 T DE 69231990T DE 69231990 T DE69231990 T DE 69231990T DE 69231990 D1 DE69231990 D1 DE 69231990D1
Authority
DE
Germany
Prior art keywords
production
field
radiation sensors
integrated micromechanical
micromechanical radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69231990T
Other languages
English (en)
Other versions
DE69231990T2 (de
Inventor
E Higashi
G Johnson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell Inc
Original Assignee
Honeywell Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell Inc filed Critical Honeywell Inc
Application granted granted Critical
Publication of DE69231990D1 publication Critical patent/DE69231990D1/de
Publication of DE69231990T2 publication Critical patent/DE69231990T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N15/00—Thermoelectric devices without a junction of dissimilar materials; Thermomagnetic devices, e.g. using the Nernst-Ettingshausen effect
    • H10N15/10—Thermoelectric devices using thermal change of the dielectric constant, e.g. working above and below the Curie point
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N19/00—Integrated devices, or assemblies of multiple devices, comprising at least one thermoelectric or thermomagnetic element covered by groups H10N10/00 - H10N15/00
DE69231990T 1983-07-06 1992-06-11 Feld aus integrierten mikromechanischen strahlungssensoren und verfahren zur herstellung. Expired - Lifetime DE69231990T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/511,369 US5220188A (en) 1983-07-06 1983-07-06 Integrated micromechanical sensor element
PCT/US1992/005005 WO1993026051A1 (en) 1983-07-06 1992-06-11 Array of integrated micromechanical sensor elements, which are adapted to respond to radiation, and method of making same

Publications (2)

Publication Number Publication Date
DE69231990D1 true DE69231990D1 (de) 2001-09-13
DE69231990T2 DE69231990T2 (de) 2004-08-05

Family

ID=24034601

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69231990T Expired - Lifetime DE69231990T2 (de) 1983-07-06 1992-06-11 Feld aus integrierten mikromechanischen strahlungssensoren und verfahren zur herstellung.

Country Status (6)

Country Link
US (1) US5220188A (de)
EP (1) EP0645055B1 (de)
JP (1) JP3682296B2 (de)
CA (1) CA2133082C (de)
DE (1) DE69231990T2 (de)
WO (1) WO1993026051A1 (de)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06317475A (ja) * 1991-07-19 1994-11-15 Terumo Corp 赤外線センサおよびその製造方法
DE4418207C1 (de) * 1994-05-25 1995-06-22 Siemens Ag Thermischer Sensor/Aktuator in Halbleitermaterial
US5659195A (en) * 1995-06-08 1997-08-19 The Regents Of The University Of California CMOS integrated microsensor with a precision measurement circuit
US5691921A (en) * 1996-01-05 1997-11-25 Xerox Corporation Thermal sensors arrays useful for motion tracking by thermal gradient detection
JP3301334B2 (ja) * 1997-01-31 2002-07-15 三菱電機株式会社 センサ素子及びその製造方法
US7176111B2 (en) * 1997-03-28 2007-02-13 Interuniversitair Microelektronica Centrum (Imec) Method for depositing polycrystalline SiGe suitable for micromachining and devices obtained thereof
EP0867701A1 (de) * 1997-03-28 1998-09-30 Interuniversitair Microelektronica Centrum Vzw Herstellungsverfahren eines infrarotempfindlichen Strahlungsdetektors, insbesondere eines infrarotempfindlichen Bolometers
JP3529596B2 (ja) * 1997-08-06 2004-05-24 株式会社東芝 赤外線固体撮像装置及びその製造方法
US6107210A (en) * 1998-08-19 2000-08-22 The United States Of America As Represented By The Secretary Of Commerce Maskless method for fabricating a low-loss microwave power sensor device
US6046485A (en) * 1999-04-01 2000-04-04 Honeywell International Inc. Large area low mass IR pixel having tailored cross section
US6144285A (en) * 1999-09-13 2000-11-07 Honeywell International Inc. Thermal sensor and method of making same
US6521477B1 (en) 2000-02-02 2003-02-18 Raytheon Company Vacuum package fabrication of integrated circuit components
US6479320B1 (en) 2000-02-02 2002-11-12 Raytheon Company Vacuum package fabrication of microelectromechanical system devices with integrated circuit components
US6690014B1 (en) 2000-04-25 2004-02-10 Raytheon Company Microbolometer and method for forming
EP1328964A4 (de) 2000-10-13 2006-09-13 Litton Systems Inc Infrarotstrahlungsdetektoren aus monolithischem bleisalz
US7365326B2 (en) * 2000-12-26 2008-04-29 Honeywell International Inc. Camera having distortion correction
US6541772B2 (en) 2000-12-26 2003-04-01 Honeywell International Inc. Microbolometer operating system
US6559447B2 (en) 2000-12-26 2003-05-06 Honeywell International Inc. Lightweight infrared camera
US6777681B1 (en) 2001-04-25 2004-08-17 Raytheon Company Infrared detector with amorphous silicon detector elements, and a method of making it
US20040084308A1 (en) * 2002-11-01 2004-05-06 Cole Barrett E. Gas sensor
US6958478B2 (en) 2003-05-19 2005-10-25 Indigo Systems Corporation Microbolometer detector with high fill factor and transducers having enhanced thermal isolation
US7170059B2 (en) * 2003-10-03 2007-01-30 Wood Roland A Planar thermal array
US7459686B2 (en) * 2006-01-26 2008-12-02 L-3 Communications Corporation Systems and methods for integrating focal plane arrays
US7655909B2 (en) * 2006-01-26 2010-02-02 L-3 Communications Corporation Infrared detector elements and methods of forming same
US7462831B2 (en) * 2006-01-26 2008-12-09 L-3 Communications Corporation Systems and methods for bonding
US7501626B2 (en) 2006-06-02 2009-03-10 Honeywell International Inc. Micromechanical thermal sensor
US7718965B1 (en) 2006-08-03 2010-05-18 L-3 Communications Corporation Microbolometer infrared detector elements and methods for forming same
US8153980B1 (en) 2006-11-30 2012-04-10 L-3 Communications Corp. Color correction for radiation detectors
US7750301B1 (en) 2007-10-02 2010-07-06 Flir Systems, Inc. Microbolometer optical cavity tuning and calibration systems and methods
US20090114822A1 (en) * 2007-11-06 2009-05-07 Honeywell International Inc. Terahertz dispersive spectrometer system
US8981296B2 (en) 2007-11-06 2015-03-17 Honeywell International Inc. Terahertz dispersive spectrometer system
US7898498B2 (en) * 2008-03-20 2011-03-01 Honeywell International Inc. Transducer for high-frequency antenna coupling and related apparatus and method
JP5645240B2 (ja) 2009-03-31 2014-12-24 パナソニックＩｐマネジメント株式会社 赤外線アレイセンサ
JP2010237118A (ja) * 2009-03-31 2010-10-21 Panasonic Electric Works Co Ltd 赤外線アレイセンサ
CN102197290A (zh) * 2008-09-25 2011-09-21 松下电工株式会社 红外线传感器
CN102197291A (zh) * 2008-09-25 2011-09-21 松下电工株式会社 红外线传感器
US8451176B2 (en) * 2009-06-11 2013-05-28 Honeywell International Inc. Method for achieving intrinsic safety compliance in wireless devices using isolated overlapping grounds and related apparatus
US8729474B1 (en) 2009-10-09 2014-05-20 Flir Systems, Inc. Microbolometer contact systems and methods
US9658111B2 (en) 2009-10-09 2017-05-23 Flir Systems, Inc. Microbolometer contact systems and methods
US8765514B1 (en) 2010-11-12 2014-07-01 L-3 Communications Corp. Transitioned film growth for conductive semiconductor materials

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4317126A (en) * 1980-04-14 1982-02-23 Motorola, Inc. Silicon pressure sensor
US4472239A (en) * 1981-10-09 1984-09-18 Honeywell, Inc. Method of making semiconductor device
DE3240180A1 (de) * 1982-10-29 1984-05-03 Siemens AG, 1000 Berlin und 8000 München Halbleiter-strahlungsdetektor, insbesondere fuer infrarotstrahlung
WO1991016607A1 (en) * 1990-04-26 1991-10-31 Commonwealth Of Australia, The Secretary Department Of Defence Semiconductor film bolometer thermal infrared detector

Also Published As

Publication number Publication date
JP3682296B2 (ja) 2005-08-10
US5220188A (en) 1993-06-15
EP0645055B1 (de) 2001-08-08
CA2133082C (en) 2003-06-10
DE69231990T2 (de) 2004-08-05
WO1993026051A1 (en) 1993-12-23
JPH07507868A (ja) 1995-08-31
CA2133082A1 (en) 1993-12-23
EP0645055A1 (de) 1995-03-29

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication related to discontinuation of the patent is to be deleted
8364 No opposition during term of opposition
R071 Expiry of right

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