DE68918771T2 - Elektrisch löschbare und elektrisch programmierbare Nurlesespeicherzelle mit einem selbstjustierten Tunneleffekt-Fenster. - Google Patents
Elektrisch löschbare und elektrisch programmierbare Nurlesespeicherzelle mit einem selbstjustierten Tunneleffekt-Fenster.Info
- Publication number
- DE68918771T2 DE68918771T2 DE68918771T DE68918771T DE68918771T2 DE 68918771 T2 DE68918771 T2 DE 68918771T2 DE 68918771 T DE68918771 T DE 68918771T DE 68918771 T DE68918771 T DE 68918771T DE 68918771 T2 DE68918771 T2 DE 68918771T2
- Authority
- DE
- Germany
- Prior art keywords
- self
- memory cell
- programmable read
- electrically
- tunnel effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/788—Field effect transistors with field effect produced by an insulated gate with floating gate
- H01L29/7881—Programmable transistors with only two possible levels of programmation
- H01L29/7883—Programmable transistors with only two possible levels of programmation charging by tunnelling of carriers, e.g. Fowler-Nordheim tunnelling
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C8/00—Arrangements for selecting an address in a digital store
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US21952988A | 1988-07-15 | 1988-07-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68918771D1 DE68918771D1 (de) | 1994-11-17 |
DE68918771T2 true DE68918771T2 (de) | 1995-02-16 |
Family
ID=22819640
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68918771T Expired - Fee Related DE68918771T2 (de) | 1988-07-15 | 1989-07-04 | Elektrisch löschbare und elektrisch programmierbare Nurlesespeicherzelle mit einem selbstjustierten Tunneleffekt-Fenster. |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0350771B1 (de) |
JP (1) | JP2810708B2 (de) |
KR (1) | KR0139806B1 (de) |
DE (1) | DE68918771T2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1252214B (it) * | 1991-12-13 | 1995-06-05 | Sgs Thomson Microelectronics | Procedimento per la definizione di porzioni di ossido sottile particolarmente per celle di memoria a sola lettura programmabili e cancellabile elettricamente. |
JP5415135B2 (ja) * | 2009-04-16 | 2014-02-12 | 株式会社東芝 | 不揮発性半導体記憶装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4466174A (en) * | 1981-12-28 | 1984-08-21 | Texas Instruments Incorporated | Method for fabricating MESFET device using a double LOCOS process |
JPS59112657A (ja) * | 1982-09-30 | 1984-06-29 | フエアチアイルド・カメラ・アンド・インストルメント・コ−ポレ−シヨン | 書込可能なリ−ドオンリ−メモリ |
DE3481667D1 (de) * | 1983-08-29 | 1990-04-19 | Seeq Technology Inc | Mos-speicherzelle mit schwimmendem gate und verfahren zu ihrer verfertigung. |
FR2620847A1 (fr) * | 1987-09-18 | 1989-03-24 | Thomson Semiconducteurs | Procede d'auto-alignement des grilles flottantes de transistors a grille flottante d'une memoire non volatile et memoire obtenue selon ce procede |
-
1989
- 1989-07-04 DE DE68918771T patent/DE68918771T2/de not_active Expired - Fee Related
- 1989-07-04 EP EP89112200A patent/EP0350771B1/de not_active Expired - Lifetime
- 1989-07-15 KR KR1019890010151A patent/KR0139806B1/ko not_active IP Right Cessation
- 1989-07-15 JP JP1183540A patent/JP2810708B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0350771A2 (de) | 1990-01-17 |
EP0350771B1 (de) | 1994-10-12 |
KR0139806B1 (ko) | 1998-07-15 |
EP0350771A3 (de) | 1992-09-02 |
DE68918771D1 (de) | 1994-11-17 |
KR900002313A (ko) | 1990-02-28 |
JPH02161778A (ja) | 1990-06-21 |
JP2810708B2 (ja) | 1998-10-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |