DE68917521T2 - Hoch-empfindlicher Positivresist mit hohem Auflösungsvermögen für Elektronenstrahlen. - Google Patents

Hoch-empfindlicher Positivresist mit hohem Auflösungsvermögen für Elektronenstrahlen.

Info

Publication number
DE68917521T2
DE68917521T2 DE68917521T DE68917521T DE68917521T2 DE 68917521 T2 DE68917521 T2 DE 68917521T2 DE 68917521 T DE68917521 T DE 68917521T DE 68917521 T DE68917521 T DE 68917521T DE 68917521 T2 DE68917521 T2 DE 68917521T2
Authority
DE
Germany
Prior art keywords
electron beams
highly sensitive
positive resist
resolving power
high resolving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68917521T
Other languages
English (en)
Other versions
DE68917521D1 (de
Inventor
Akira Tamura
Keishi Tanaka
Takeo Sugiura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP12616488A external-priority patent/JPH0328851A/ja
Priority claimed from JP63267507A external-priority patent/JP2598492B2/ja
Priority claimed from JP8556989A external-priority patent/JP2525891B2/ja
Priority claimed from JP1087703A external-priority patent/JPH0823697B2/ja
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Publication of DE68917521D1 publication Critical patent/DE68917521D1/de
Application granted granted Critical
Publication of DE68917521T2 publication Critical patent/DE68917521T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Electron Beam Exposure (AREA)
DE68917521T 1988-05-24 1989-05-23 Hoch-empfindlicher Positivresist mit hohem Auflösungsvermögen für Elektronenstrahlen. Expired - Fee Related DE68917521T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP12616488A JPH0328851A (ja) 1988-05-24 1988-05-24 電子ビームレジストのパターン形成方法
JP63267507A JP2598492B2 (ja) 1988-10-24 1988-10-24 ポジ型電子線レジストパターンの形成方法
JP8556989A JP2525891B2 (ja) 1989-04-03 1989-04-03 ポジ型電子線レジストの現像方法
JP1087703A JPH0823697B2 (ja) 1989-04-06 1989-04-06 ポジ型電子線レジスト

Publications (2)

Publication Number Publication Date
DE68917521D1 DE68917521D1 (de) 1994-09-22
DE68917521T2 true DE68917521T2 (de) 1994-12-22

Family

ID=27467129

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68917521T Expired - Fee Related DE68917521T2 (de) 1988-05-24 1989-05-23 Hoch-empfindlicher Positivresist mit hohem Auflösungsvermögen für Elektronenstrahlen.

Country Status (3)

Country Link
EP (1) EP0343603B1 (de)
KR (1) KR900018743A (de)
DE (1) DE68917521T2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7867688B2 (en) 2006-05-30 2011-01-11 Eastman Kodak Company Laser ablation resist
US7745101B2 (en) 2006-06-02 2010-06-29 Eastman Kodak Company Nanoparticle patterning process

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU4719279A (en) * 1978-05-22 1979-11-29 Western Electric Co. Inc. Lithographic resist and device processing utilizing same

Also Published As

Publication number Publication date
EP0343603A3 (en) 1990-08-22
EP0343603A2 (de) 1989-11-29
EP0343603B1 (de) 1994-08-17
KR900018743A (ko) 1990-12-22
DE68917521D1 (de) 1994-09-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee