DE60317253D1 - Lasermarkierung auf lichtempfindlichem Material und lichtempfindliches Material beinhaltend besagte Markierung - Google Patents

Lasermarkierung auf lichtempfindlichem Material und lichtempfindliches Material beinhaltend besagte Markierung

Info

Publication number
DE60317253D1
DE60317253D1 DE60317253T DE60317253T DE60317253D1 DE 60317253 D1 DE60317253 D1 DE 60317253D1 DE 60317253 T DE60317253 T DE 60317253T DE 60317253 T DE60317253 T DE 60317253T DE 60317253 D1 DE60317253 D1 DE 60317253D1
Authority
DE
Germany
Prior art keywords
photosensitive material
layer
laser beam
emulsion layer
undersurface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60317253T
Other languages
English (en)
Other versions
DE60317253T2 (de
Inventor
Keisuke Endo
Hiroyuki Nishida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2002111938A external-priority patent/JP4137495B2/ja
Priority claimed from JP2002209155A external-priority patent/JP4186180B2/ja
Priority claimed from JP2002250202A external-priority patent/JP2004086094A/ja
Priority claimed from JP2002257534A external-priority patent/JP4005454B2/ja
Priority claimed from JP2002259750A external-priority patent/JP4111783B2/ja
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of DE60317253D1 publication Critical patent/DE60317253D1/de
Publication of DE60317253T2 publication Critical patent/DE60317253T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/60—Processes for obtaining vesicular images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/28—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using thermochromic compounds or layers containing liquid crystals, microcapsules, bleachable dyes or heat- decomposable compounds, e.g. gas- liberating
    • B41M5/288—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using thermochromic compounds or layers containing liquid crystals, microcapsules, bleachable dyes or heat- decomposable compounds, e.g. gas- liberating using gas liberating compounds, e.g. to obtain vesicular or blow-up images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C11/00—Auxiliary processes in photography
    • G03C11/02—Marking or applying text
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Laser Beam Processing (AREA)
  • Laser Beam Printer (AREA)
DE60317253T 2002-04-15 2003-04-14 Lasermarkierung auf lichtempfindlichem Material und lichtempfindliches Material beinhaltend besagte Markierung Expired - Lifetime DE60317253T2 (de)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
JP2002111938 2002-04-15
JP2002111938A JP4137495B2 (ja) 2002-04-15 2002-04-15 レーザーマーキング方法及び感光材料
JP2002209155 2002-07-18
JP2002209155A JP4186180B2 (ja) 2002-07-18 2002-07-18 感光材料の加工方法
JP2002250202 2002-08-29
JP2002250202A JP2004086094A (ja) 2002-08-29 2002-08-29 レーザーマーキング方法
JP2002257534 2002-09-03
JP2002257534A JP4005454B2 (ja) 2002-09-03 2002-09-03 レーザーマーキング方法
JP2002259750 2002-09-05
JP2002259750A JP4111783B2 (ja) 2002-09-05 2002-09-05 レーザーマーキング方法

Publications (2)

Publication Number Publication Date
DE60317253D1 true DE60317253D1 (de) 2007-12-20
DE60317253T2 DE60317253T2 (de) 2008-08-28

Family

ID=28679124

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60317253T Expired - Lifetime DE60317253T2 (de) 2002-04-15 2003-04-14 Lasermarkierung auf lichtempfindlichem Material und lichtempfindliches Material beinhaltend besagte Markierung

Country Status (5)

Country Link
US (1) US6908728B2 (de)
EP (2) EP1726989A3 (de)
CN (1) CN100365502C (de)
AT (1) ATE377776T1 (de)
DE (1) DE60317253T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE380358T1 (de) 2002-10-28 2007-12-15 Fujifilm Corp Lasermarkierungsverfahren
DE10250408A1 (de) * 2002-10-29 2004-05-19 Few Chemicals Gmbh Chemiepark Bitterfeld Wolfen Areal A Beschichtungszusammensetzung, insbesondere für Glasoberflächen, und Verfahren zu deren Herstellung und Verwendung
CN100379566C (zh) 2003-04-28 2008-04-09 富士胶片株式会社 用于激光打标的装置和方法
EP1655683B1 (de) * 2003-08-11 2011-10-19 Arai Corporation Verfahren und vorrichtung zur bildung eines zweidimensionalen codes
US7084894B2 (en) 2003-09-12 2006-08-01 Hewlett-Packard Development Company, L.P. Optical disc drive focusing apparatus
CN1890729B (zh) * 2003-09-12 2012-10-10 惠普开发有限公司 增强光学密度
US20060237407A1 (en) * 2005-04-25 2006-10-26 Nguyen Anh V Medical devices having laser brazed joints
US8628898B2 (en) * 2006-12-26 2014-01-14 Ricoh Company, Ltd. Image processing method, and image processor
US7529636B1 (en) 2008-05-19 2009-05-05 International Business Machines Corporation Enabling safe use of high power laser for laser marking in a free space environment
US8552336B2 (en) * 2008-12-23 2013-10-08 Triune Ip Llc Micro matrix data marking
JP5510214B2 (ja) 2009-10-19 2014-06-04 株式会社リコー 描画制御装置、レーザ照射装置、描画制御方法、描画制御プログラム、及びこれを記録した記録媒体
EP2463182B1 (de) * 2010-12-13 2012-11-28 C.R.F. Società Consortile per Azioni Selbstadaptivverfahren zur Montage von Seitentüren an Fahrzeugkarosserien
JP2014140023A (ja) * 2012-12-21 2014-07-31 Ngk Spark Plug Co Ltd 基板の製造方法
CN102998912A (zh) * 2012-12-21 2013-03-27 珠海天威飞马打印耗材有限公司 显影设备及显影方法
DE102013200136A1 (de) * 2013-01-08 2014-07-10 Siemens Aktiengesellschaft Personenidentifizierungseinheit für Röntgenbildaufnahmen und zugehöriges Verfahren

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4278756A (en) * 1979-07-06 1981-07-14 Drexler Technology Corporation Reflective data storage medium made by silver diffusion transfer
JPS595097A (ja) * 1982-07-02 1984-01-11 Nec Corp 光記録方式
JPS5919253A (ja) * 1982-07-23 1984-01-31 Sony Corp 情報記録媒体
US4847183A (en) * 1987-09-09 1989-07-11 Hewlett-Packard Company High contrast optical marking method for polished surfaces
JP3191201B2 (ja) 1996-06-26 2001-07-23 コニカ株式会社 感光材料へのマーキング方法
JP3860879B2 (ja) 1997-05-09 2006-12-20 大日本印刷株式会社 レーザ加工状態検出方法及びレーザ加工システム

Also Published As

Publication number Publication date
DE60317253T2 (de) 2008-08-28
CN1474226A (zh) 2004-02-11
EP1355191A1 (de) 2003-10-22
EP1726989A3 (de) 2007-04-18
US6908728B2 (en) 2005-06-21
CN100365502C (zh) 2008-01-30
US20030224256A1 (en) 2003-12-04
EP1355191B1 (de) 2007-11-07
EP1726989A2 (de) 2006-11-29
ATE377776T1 (de) 2007-11-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition