DE60316669D1 - Mit säure abbaubare harzzusammensetzungen mit ketenaldehyd-copolymer - Google Patents
Mit säure abbaubare harzzusammensetzungen mit ketenaldehyd-copolymerInfo
- Publication number
- DE60316669D1 DE60316669D1 DE60316669T DE60316669T DE60316669D1 DE 60316669 D1 DE60316669 D1 DE 60316669D1 DE 60316669 T DE60316669 T DE 60316669T DE 60316669 T DE60316669 T DE 60316669T DE 60316669 D1 DE60316669 D1 DE 60316669D1
- Authority
- DE
- Germany
- Prior art keywords
- acid
- polymer
- hydrocarbon
- dehyde
- compositions containing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/005—Polyesters prepared from ketenes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/06—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from hydroxycarboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0033—Additives activating the degradation of the macromolecular compound
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0041—Optical brightening agents, organic pigments
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/13—Phenols; Phenolates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002038044 | 2002-02-15 | ||
JP2002038044 | 2002-02-15 | ||
JP2002055276 | 2002-03-01 | ||
JP2002055276 | 2002-03-01 | ||
PCT/JP2003/001536 WO2003069412A1 (fr) | 2002-02-15 | 2003-02-14 | Compositions de resine degradables sous l'effet d'acide et a base de copolymere cetene-aldehyde |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60316669D1 true DE60316669D1 (de) | 2007-11-15 |
DE60316669T2 DE60316669T2 (de) | 2008-07-17 |
Family
ID=27736509
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60332060T Expired - Lifetime DE60332060D1 (de) | 2002-02-15 | 2003-02-14 | Harz mit Ketenaldehyd-Copolymer |
DE60316669T Expired - Lifetime DE60316669T2 (de) | 2002-02-15 | 2003-02-14 | Mit säure abbaubare harzzusammensetzungen mit ketenaldehyd-copolymer |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60332060T Expired - Lifetime DE60332060D1 (de) | 2002-02-15 | 2003-02-14 | Harz mit Ketenaldehyd-Copolymer |
Country Status (8)
Country | Link |
---|---|
US (1) | US7105272B2 (de) |
EP (2) | EP1482361B1 (de) |
JP (1) | JP3935881B2 (de) |
KR (1) | KR100679446B1 (de) |
CN (2) | CN101186678B (de) |
AT (2) | ATE374960T1 (de) |
DE (2) | DE60332060D1 (de) |
WO (1) | WO2003069412A1 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4553687B2 (ja) * | 2004-05-25 | 2010-09-29 | 日本曹達株式会社 | ケテン、アルデヒド共重合体及びそれを含有する樹脂組成物 |
KR100906598B1 (ko) * | 2004-12-03 | 2009-07-09 | 도오꾜오까고오교 가부시끼가이샤 | 포지티브형 레지스트 조성물 및 레지스트 패턴 형성 방법 |
US7927778B2 (en) * | 2004-12-29 | 2011-04-19 | Tokyo Ohka Kogyo Co., Ltd. | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
US7951522B2 (en) * | 2004-12-29 | 2011-05-31 | Tokyo Ohka Kogyo Co., Ltd. | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
JP2006206648A (ja) * | 2005-01-25 | 2006-08-10 | Nippon Soda Co Ltd | 樹脂組成物 |
JP4768993B2 (ja) * | 2005-01-25 | 2011-09-07 | 日本曹達株式会社 | ケテン、アルデヒド共重合体からなる熱分解性ブロックコポリマー |
JP4919603B2 (ja) * | 2005-01-25 | 2012-04-18 | 日本曹達株式会社 | ケテン、アルデヒド共重合体を含有する熱分解性樹脂 |
JP2006206651A (ja) * | 2005-01-25 | 2006-08-10 | Nippon Soda Co Ltd | ケテン、アルデヒド共重合体を含有する分解性樹脂組成物 |
JP5138157B2 (ja) * | 2005-05-17 | 2013-02-06 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
JP4732038B2 (ja) | 2005-07-05 | 2011-07-27 | 東京応化工業株式会社 | 化合物、ポジ型レジスト組成物およびレジストパターン形成方法 |
KR100789494B1 (ko) * | 2006-05-29 | 2007-12-28 | 유춘임 | 압축공기의 유·수(油·水)분리 장치 |
US8088566B2 (en) | 2007-03-26 | 2012-01-03 | Fujifilm Corporation | Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent |
GB0811856D0 (en) | 2008-06-27 | 2008-07-30 | Ucl Business Plc | Magnetic microbubbles, methods of preparing them and their uses |
KR101781517B1 (ko) | 2010-09-30 | 2017-09-26 | 삼성디스플레이 주식회사 | 블록 공중합체 및 이를 이용한 패턴 형성 방법 |
JP5933339B2 (ja) * | 2012-05-23 | 2016-06-08 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
JP6648452B2 (ja) * | 2015-09-14 | 2020-02-14 | Jsr株式会社 | 感放射線性樹脂組成物及びレジストパターン形成方法 |
WO2021131845A1 (ja) * | 2019-12-27 | 2021-07-01 | Jsr株式会社 | 感放射線性樹脂組成物及びパターン形成方法 |
CN111804287B (zh) * | 2020-07-20 | 2022-04-08 | 兰州大学 | 一种芴酮型螯合树脂及其制备方法和应用 |
CN113307959A (zh) * | 2021-06-02 | 2021-08-27 | 徐州工程学院 | 一种海水可降解丁二酸丁二醇共聚酯及制备方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3854364T2 (de) | 1987-05-28 | 1996-04-25 | Nippon Paint Co Ltd | Positiv arbeitende lichtempfindliche Harzzusammensetzung. |
GB8912388D0 (en) * | 1989-05-30 | 1989-07-12 | Ici Plc | 3-hydroxybutyrate polymer composition |
DE4102170A1 (de) | 1991-01-25 | 1992-08-06 | Danubia Petrochem Deutschland | Mischung aus vorwiegend einem polyhydroxyalkanoat und einer verbindung, die mindestens zwei reaktive gruppen wie saeure- und/oder alkoholgruppen enthaelt und ein durch schmelzen der mischung hergestelltes polymerisat |
KR100189468B1 (ko) * | 1991-04-09 | 1999-06-01 | 양갑석 | 폴리-베타-하이드록시알카노에이트(pha)공중합체및그제조방법,이를생산하는미생물과pha공중합체의고분자블렌드 |
JP2816777B2 (ja) * | 1991-08-03 | 1998-10-27 | 鐘淵化学工業株式会社 | 共重合体及びその製造方法 |
EP0545859A1 (de) * | 1991-11-26 | 1993-06-09 | Ciba-Geigy Ag | Strahlungsempfindliche Zusammensetzungen |
JP3243334B2 (ja) * | 1993-06-10 | 2002-01-07 | テルモ株式会社 | ヒドロキシアルカノエート重合体組成物 |
DE4344125A1 (de) * | 1993-12-23 | 1995-06-29 | Basf Lacke & Farben | Strahlenhärtbare Schutzlackierung, insbesondere für metallisierte Oberflächen |
DE4444669A1 (de) * | 1994-12-15 | 1996-06-20 | Hoechst Ag | Strahlungsempfindliches Gemisch |
TW363986B (en) * | 1997-05-12 | 1999-07-11 | Ind Tech Res Inst | A process for producing polyparahydroxy styrene derivatives |
FR2781485B1 (fr) * | 1998-07-21 | 2003-08-08 | Denis Barritault | Polymeres biocompatibles leur procede de preparation et les compositions les contenant |
US6303266B1 (en) * | 1998-09-24 | 2001-10-16 | Kabushiki Kaisha Toshiba | Resin useful for resist, resist composition and pattern forming process using the same |
JP3520967B2 (ja) * | 1998-09-29 | 2004-04-19 | ダイセル化学工業株式会社 | ポリエステル及びソルビン酸の製造法 |
JP4031593B2 (ja) * | 1999-04-13 | 2008-01-09 | 太陽インキ製造株式会社 | ポジ型感光性樹脂組成物 |
JP3738823B2 (ja) | 2000-08-18 | 2006-01-25 | 信越化学工業株式会社 | 高分子化合物、化学増幅レジスト材料及びパターン形成方法 |
US6946233B2 (en) * | 2001-07-24 | 2005-09-20 | Shin-Etsu Chemical Co., Ltd. | Polymer, resist material and patterning method |
-
2003
- 2003-02-14 DE DE60332060T patent/DE60332060D1/de not_active Expired - Lifetime
- 2003-02-14 EP EP03705148A patent/EP1482361B1/de not_active Expired - Lifetime
- 2003-02-14 JP JP2003568474A patent/JP3935881B2/ja not_active Expired - Fee Related
- 2003-02-14 AT AT03705148T patent/ATE374960T1/de not_active IP Right Cessation
- 2003-02-14 EP EP06015990A patent/EP1720063B1/de not_active Expired - Lifetime
- 2003-02-14 CN CN2007101666630A patent/CN101186678B/zh not_active Expired - Fee Related
- 2003-02-14 CN CNB038037793A patent/CN100405220C/zh not_active Expired - Fee Related
- 2003-02-14 US US10/504,496 patent/US7105272B2/en not_active Expired - Fee Related
- 2003-02-14 KR KR1020047012333A patent/KR100679446B1/ko not_active IP Right Cessation
- 2003-02-14 WO PCT/JP2003/001536 patent/WO2003069412A1/ja active IP Right Grant
- 2003-02-14 AT AT06015990T patent/ATE463762T1/de not_active IP Right Cessation
- 2003-02-14 DE DE60316669T patent/DE60316669T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR100679446B1 (ko) | 2007-02-06 |
ATE374960T1 (de) | 2007-10-15 |
CN101186678A (zh) | 2008-05-28 |
EP1482361A4 (de) | 2005-08-31 |
EP1720063B1 (de) | 2010-04-07 |
CN101186678B (zh) | 2012-05-23 |
EP1482361B1 (de) | 2007-10-03 |
US7105272B2 (en) | 2006-09-12 |
KR20040088069A (ko) | 2004-10-15 |
JP3935881B2 (ja) | 2007-06-27 |
WO2003069412A1 (fr) | 2003-08-21 |
CN100405220C (zh) | 2008-07-23 |
JPWO2003069412A1 (ja) | 2005-06-09 |
ATE463762T1 (de) | 2010-04-15 |
EP1720063A1 (de) | 2006-11-08 |
EP1482361A1 (de) | 2004-12-01 |
DE60316669T2 (de) | 2008-07-17 |
US20050130057A1 (en) | 2005-06-16 |
DE60332060D1 (de) | 2010-05-20 |
CN1630835A (zh) | 2005-06-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |