US6921615B2
(en)
*
|
2000-07-16 |
2005-07-26 |
Board Of Regents, The University Of Texas System |
High-resolution overlay alignment methods for imprint lithography
|
US6909473B2
(en)
*
|
2002-01-07 |
2005-06-21 |
Eastman Kodak Company |
Display apparatus and method
|
US7061561B2
(en)
*
|
2002-01-07 |
2006-06-13 |
Moxtek, Inc. |
System for creating a patterned polarization compensator
|
JP2004118153A
(ja)
*
|
2002-09-30 |
2004-04-15 |
Mitsubishi Electric Corp |
投写型表示装置
|
WO2004054784A1
(en)
|
2002-12-13 |
2004-07-01 |
Molecular Imprints, Inc. |
Magnification corrections employing out-of-plane distortions on a substrate
|
US7268891B2
(en)
*
|
2003-01-15 |
2007-09-11 |
Asml Holding N.V. |
Transmission shear grating in checkerboard configuration for EUV wavefront sensor
|
US6867846B2
(en)
*
|
2003-01-15 |
2005-03-15 |
Asml Holding Nv |
Tailored reflecting diffractor for EUV lithographic system aberration measurement
|
US7268946B2
(en)
*
|
2003-02-10 |
2007-09-11 |
Jian Wang |
Universal broadband polarizer, devices incorporating same, and method of making same
|
US6943941B2
(en)
*
|
2003-02-27 |
2005-09-13 |
Asml Netherlands B.V. |
Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
|
US7098442B2
(en)
*
|
2003-03-05 |
2006-08-29 |
Raytheon Company |
Thin micropolarizing filter, and a method for making it
|
KR101547077B1
(ko)
|
2003-04-09 |
2015-08-25 |
가부시키가이샤 니콘 |
노광 방법 및 장치, 그리고 디바이스 제조 방법
|
US7150622B2
(en)
|
2003-07-09 |
2006-12-19 |
Molecular Imprints, Inc. |
Systems for magnification and distortion correction for imprint lithography processes
|
EP1646894B1
(de)
*
|
2003-07-23 |
2007-11-28 |
THOMSON Licensing |
Beleuchtungseinrichtung mit polarisations-recycling in einem doppelprisma
|
US7768018B2
(en)
*
|
2003-10-10 |
2010-08-03 |
Wostec, Inc. |
Polarizer based on a nanowire grid
|
RU2240280C1
(ru)
|
2003-10-10 |
2004-11-20 |
Ворлд Бизнес Ассошиэйтс Лимитед |
Способ формирования упорядоченных волнообразных наноструктур (варианты)
|
TWI573175B
(zh)
|
2003-10-28 |
2017-03-01 |
尼康股份有限公司 |
照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
|
TW201809801A
(zh)
|
2003-11-20 |
2018-03-16 |
日商尼康股份有限公司 |
光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
|
DE102004006148A1
(de)
*
|
2004-02-04 |
2005-09-08 |
Bausenwein, Bernhard, Dr. |
Vorrichtung und Verfahren zur reziproken Polarisation mit komplementär wirkenden kartesischen Polarisationsschichten (Kreuzpolarisator)
|
TWI389174B
(zh)
|
2004-02-06 |
2013-03-11 |
尼康股份有限公司 |
偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
|
US7768624B2
(en)
*
|
2004-06-03 |
2010-08-03 |
Board Of Regents, The University Of Texas System |
Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
|
US20050270516A1
(en)
*
|
2004-06-03 |
2005-12-08 |
Molecular Imprints, Inc. |
System for magnification and distortion correction during nano-scale manufacturing
|
CN101379435A
(zh)
*
|
2004-06-03 |
2009-03-04 |
得克萨斯州大学系统董事会 |
用于改进显微蚀刻的对齐和覆盖的系统和方法
|
DE602004019888D1
(de)
*
|
2004-06-18 |
2009-04-23 |
St Microelectronics Res & Dev |
Polarisationsempfindlicher Festkörperbildsensor
|
US7227145B2
(en)
*
|
2004-07-01 |
2007-06-05 |
Lockheed Martin Corporation |
Polarization and wavelength-selective patch-coupled infrared photodetector
|
US7785526B2
(en)
*
|
2004-07-20 |
2010-08-31 |
Molecular Imprints, Inc. |
Imprint alignment method, system, and template
|
US20060027290A1
(en)
*
|
2004-08-03 |
2006-02-09 |
Nec Corporation |
Microstructure and manufacturing process thereof
|
JP2006058615A
(ja)
*
|
2004-08-20 |
2006-03-02 |
Sumitomo Chemical Co Ltd |
金属細線が埋め込まれた偏光分離素子
|
US7480017B2
(en)
*
|
2004-09-17 |
2009-01-20 |
Radiant Images, Inc. |
Microdisplay
|
US7414784B2
(en)
*
|
2004-09-23 |
2008-08-19 |
Rohm And Haas Denmark Finance A/S |
Low fill factor wire grid polarizer and method of use
|
JP2006126338A
(ja)
*
|
2004-10-27 |
2006-05-18 |
Nippon Sheet Glass Co Ltd |
偏光子およびその製造方法
|
KR20060042481A
(ko)
*
|
2004-11-09 |
2006-05-15 |
엘지전자 주식회사 |
반사형 편광판을 포함하는 액정 디스플레이
|
US7630067B2
(en)
|
2004-11-30 |
2009-12-08 |
Molecular Imprints, Inc. |
Interferometric analysis method for the manufacture of nano-scale devices
|
US7292326B2
(en)
|
2004-11-30 |
2007-11-06 |
Molecular Imprints, Inc. |
Interferometric analysis for the manufacture of nano-scale devices
|
US20070231421A1
(en)
*
|
2006-04-03 |
2007-10-04 |
Molecular Imprints, Inc. |
Enhanced Multi Channel Alignment
|
KR20070091314A
(ko)
*
|
2004-11-30 |
2007-09-10 |
아구라 테크놀로지스, 인코포레이티드 |
대규모 와이어 그리드 편광기들에 대한 응용 및 제조기술들
|
US7351346B2
(en)
*
|
2004-11-30 |
2008-04-01 |
Agoura Technologies, Inc. |
Non-photolithographic method for forming a wire grid polarizer for optical and infrared wavelengths
|
US7570424B2
(en)
*
|
2004-12-06 |
2009-08-04 |
Moxtek, Inc. |
Multilayer wire-grid polarizer
|
US7961393B2
(en)
|
2004-12-06 |
2011-06-14 |
Moxtek, Inc. |
Selectively absorptive wire-grid polarizer
|
US7800823B2
(en)
|
2004-12-06 |
2010-09-21 |
Moxtek, Inc. |
Polarization device to polarize and further control light
|
US20080055719A1
(en)
*
|
2006-08-31 |
2008-03-06 |
Perkins Raymond T |
Inorganic, Dielectric Grid Polarizer
|
US20060127830A1
(en)
*
|
2004-12-15 |
2006-06-15 |
Xuegong Deng |
Structures for polarization and beam control
|
US7619816B2
(en)
*
|
2004-12-15 |
2009-11-17 |
Api Nanofabrication And Research Corp. |
Structures for polarization and beam control
|
JP4247627B2
(ja)
*
|
2005-02-10 |
2009-04-02 |
セイコーエプソン株式会社 |
光学素子の製造方法
|
JP4479535B2
(ja)
*
|
2005-02-21 |
2010-06-09 |
セイコーエプソン株式会社 |
光学素子の製造方法
|
CN101617263A
(zh)
*
|
2005-05-18 |
2009-12-30 |
道格拉斯·S·霍布斯 |
用于偏振和波长滤波的微结构光学装置
|
JP4889239B2
(ja)
*
|
2005-05-18 |
2012-03-07 |
チェイル インダストリーズ インコーポレイテッド |
バックライトユニットおよび液晶表示装置
|
JP4760135B2
(ja)
*
|
2005-05-24 |
2011-08-31 |
ソニー株式会社 |
光学装置及び光学装置の製造方法
|
EP1887390A4
(de)
*
|
2005-05-27 |
2010-09-15 |
Zeon Corp |
Gitterpolarisationsfilm, verfahren zur herstellung eines gitterpolarisationsfilms, optisches laminat, verfahren zur herstellung eines optischen laminats und flüssigkristallanzeige
|
KR20070074787A
(ko)
*
|
2005-06-13 |
2007-07-18 |
삼성전자주식회사 |
계조 전압 발생 장치 및 액정 표시 장치
|
WO2007027792A2
(en)
*
|
2005-08-30 |
2007-03-08 |
Robertson William M |
Optical sensor based on surface electromagnetic wave resonance in photonic band gap materials and method for using same
|
JP2007109689A
(ja)
*
|
2005-10-11 |
2007-04-26 |
Seiko Epson Corp |
発光素子、発光素子の製造方法及び画像表示装置
|
US8228604B2
(en)
*
|
2005-11-14 |
2012-07-24 |
Industrial Technology Research Institute |
Electromagnetic (EM) wave polarizing structure and method for providing polarized electromagnetic (EM) wave
|
TWI279595B
(en)
*
|
2005-11-14 |
2007-04-21 |
Ind Tech Res Inst |
Electromagnetic polarizing structure and polarized electromagnetic device
|
JP2007183524A
(ja)
*
|
2006-01-06 |
2007-07-19 |
Cheil Industries Inc |
偏光光学素子及びそれを用いた液晶表示装置
|
JP5100146B2
(ja)
*
|
2006-02-28 |
2012-12-19 |
キヤノン株式会社 |
光学素子及び光学素子の製造方法
|
TW200801794A
(en)
|
2006-04-03 |
2008-01-01 |
Molecular Imprints Inc |
Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks
|
US20070242352A1
(en)
*
|
2006-04-13 |
2007-10-18 |
Macmaster Steven William |
Wire-grid polarizers, methods of fabrication thereof and their use in transmissive displays
|
FR2900279B1
(fr)
*
|
2006-04-19 |
2008-06-06 |
Commissariat Energie Atomique |
Filtre spectral micro-structure et capteur d'images
|
WO2007137139A2
(en)
*
|
2006-05-17 |
2007-11-29 |
Starzent, Inc. |
Holographic storage system with single switch access
|
US20070285774A1
(en)
*
|
2006-06-12 |
2007-12-13 |
The Boeing Company |
Augmenting brightness performance of a beam-splitter in a stereoscopic display
|
US20070297052A1
(en)
*
|
2006-06-26 |
2007-12-27 |
Bin Wang |
Cube wire-grid polarizing beam splitter
|
US20070296921A1
(en)
*
|
2006-06-26 |
2007-12-27 |
Bin Wang |
Projection display with a cube wire-grid polarizing beam splitter
|
JP4762804B2
(ja)
*
|
2006-06-28 |
2011-08-31 |
チェイル インダストリーズ インコーポレイテッド |
偏光分離素子およびその製造方法
|
JP2008047673A
(ja)
*
|
2006-08-14 |
2008-02-28 |
Canon Inc |
露光装置及びデバイス製造方法
|
WO2008022097A2
(en)
*
|
2006-08-15 |
2008-02-21 |
Api Nanofabrication And Research Corp. |
Methods for forming patterned structures
|
WO2008022099A2
(en)
*
|
2006-08-15 |
2008-02-21 |
Api Nanofabrication And Research Corp. |
Polarizer films and methods of making the same
|
US8755113B2
(en)
*
|
2006-08-31 |
2014-06-17 |
Moxtek, Inc. |
Durable, inorganic, absorptive, ultra-violet, grid polarizer
|
JP5027468B2
(ja)
*
|
2006-09-15 |
2012-09-19 |
日本ミクロコーティング株式会社 |
プローブクリーニング用又はプローブ加工用シート、及びプローブ加工方法
|
TW200815787A
(en)
*
|
2006-09-20 |
2008-04-01 |
Ind Tech Res Inst |
Polarization light source
|
JP4520445B2
(ja)
*
|
2006-10-11 |
2010-08-04 |
旭化成イーマテリアルズ株式会社 |
ワイヤグリッド偏光板
|
JP2008107720A
(ja)
*
|
2006-10-27 |
2008-05-08 |
Enplas Corp |
偏光子およびその製造方法
|
KR101294004B1
(ko)
*
|
2006-11-02 |
2013-08-07 |
삼성디스플레이 주식회사 |
편광판, 이를 갖는 표시패널 및 표시장치
|
KR101281164B1
(ko)
*
|
2006-11-21 |
2013-07-02 |
삼성디스플레이 주식회사 |
와이어 그리드 편광자 및 이의 제조방법
|
US20080129930A1
(en)
*
|
2006-12-01 |
2008-06-05 |
Agoura Technologies |
Reflective polarizer configuration for liquid crystal displays
|
JP2008145573A
(ja)
*
|
2006-12-07 |
2008-06-26 |
Seiko Epson Corp |
偏光素子とその製造方法、液晶装置、及び電子機器
|
JP4795214B2
(ja)
*
|
2006-12-07 |
2011-10-19 |
チェイル インダストリーズ インコーポレイテッド |
ワイヤーグリッド偏光子及びその製造方法
|
JP5205747B2
(ja)
*
|
2006-12-08 |
2013-06-05 |
ソニー株式会社 |
液晶表示装置および投射型表示装置
|
WO2008073439A2
(en)
*
|
2006-12-08 |
2008-06-19 |
The City University Of New York Technology Commercialization Office |
Devices and methods for light control in material composites
|
KR100829756B1
(ko)
*
|
2007-03-02 |
2008-05-16 |
삼성에스디아이 주식회사 |
편광자 및 그를 포함하는 유기 발광 표시 장치
|
EP1965233B1
(de)
|
2007-03-02 |
2015-09-16 |
Samsung Display Co., Ltd. |
Polarisator und Flachbildschirm
|
KR20080092784A
(ko)
|
2007-04-13 |
2008-10-16 |
삼성전자주식회사 |
나노 와이어 그리드 편광자 및 이를 채용한 액정디스플레이 장치
|
US7789515B2
(en)
|
2007-05-17 |
2010-09-07 |
Moxtek, Inc. |
Projection device with a folded optical path and wire-grid polarizer
|
US7618178B2
(en)
|
2007-06-11 |
2009-11-17 |
SKC Haas Display Films Co., Lt.d |
Backlight containing formed birefringence reflective polarizer
|
JP2009031392A
(ja)
*
|
2007-07-25 |
2009-02-12 |
Seiko Epson Corp |
ワイヤーグリッド型偏光素子、その製造方法、液晶装置および投射型表示装置
|
JP2009031537A
(ja)
*
|
2007-07-27 |
2009-02-12 |
Seiko Epson Corp |
光学素子およびその製造方法、液晶装置、ならびに電子機器
|
US8451427B2
(en)
|
2007-09-14 |
2013-05-28 |
Nikon Corporation |
Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
|
EP2046065A1
(de)
*
|
2007-10-04 |
2009-04-08 |
Barco NV |
Aufteilen der Scrolling-Beleuchtung für verschiedene Panels von Lichtmodulatoren
|
JP5267029B2
(ja)
|
2007-10-12 |
2013-08-21 |
株式会社ニコン |
照明光学装置、露光装置及びデバイスの製造方法
|
CN101681125B
(zh)
*
|
2007-10-16 |
2013-08-21 |
株式会社尼康 |
照明光学系统、曝光装置以及元件制造方法
|
CN101681123B
(zh)
|
2007-10-16 |
2013-06-12 |
株式会社尼康 |
照明光学系统、曝光装置以及元件制造方法
|
JP2009105252A
(ja)
*
|
2007-10-24 |
2009-05-14 |
Cheil Industries Inc |
微細パターンの製造方法および光学素子
|
US8379187B2
(en)
*
|
2007-10-24 |
2013-02-19 |
Nikon Corporation |
Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
|
US9116346B2
(en)
*
|
2007-11-06 |
2015-08-25 |
Nikon Corporation |
Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
|
US20090231702A1
(en)
|
2008-03-17 |
2009-09-17 |
Qihong Wu |
Optical films and methods of making the same
|
KR20110002004A
(ko)
*
|
2008-04-08 |
2011-01-06 |
아사히 가라스 가부시키가이샤 |
와이어 그리드형 편광자의 제조 방법
|
JP2010009029A
(ja)
*
|
2008-05-26 |
2010-01-14 |
Canon Inc |
光学素子の製造方法及び光学素子
|
CN105606344B
(zh)
*
|
2008-05-28 |
2019-07-30 |
株式会社尼康 |
照明光学系统、照明方法、曝光装置以及曝光方法
|
WO2010005059A1
(ja)
*
|
2008-07-10 |
2010-01-14 |
旭硝子株式会社 |
ワイヤグリッド型偏光子およびその製造方法
|
US20120075699A1
(en)
*
|
2008-10-29 |
2012-03-29 |
Mark Alan Davis |
Segmented film deposition
|
US20100284073A1
(en)
*
|
2009-03-04 |
2010-11-11 |
General Dynamics Advanced Information Systems |
System and method for mounting a polarizer
|
JP2010210706A
(ja)
*
|
2009-03-06 |
2010-09-24 |
Seiko Epson Corp |
偏光素子
|
KR101610376B1
(ko)
*
|
2009-04-10 |
2016-04-08 |
엘지이노텍 주식회사 |
와이어 그리드 편광자, 이를 포함하는 액정 표시 장치 및 와이어 그리드 편광자의 제조 방법
|
US8248696B2
(en)
*
|
2009-06-25 |
2012-08-21 |
Moxtek, Inc. |
Nano fractal diffuser
|
US8866172B2
(en)
*
|
2009-10-22 |
2014-10-21 |
Nec Corporation |
Light emitting element and image display apparatus using the light emitting element
|
JP5582147B2
(ja)
*
|
2009-10-22 |
2014-09-03 |
日本電気株式会社 |
発光素子および該発光素子を用いた画像表示装置
|
JP5287695B2
(ja)
*
|
2009-12-22 |
2013-09-11 |
株式会社リコー |
光偏向装置、光偏向アレー、画像投影表示装置
|
US8611007B2
(en)
|
2010-09-21 |
2013-12-17 |
Moxtek, Inc. |
Fine pitch wire grid polarizer
|
US8913321B2
(en)
|
2010-09-21 |
2014-12-16 |
Moxtek, Inc. |
Fine pitch grid polarizer
|
KR101319444B1
(ko)
*
|
2010-10-20 |
2013-10-17 |
엘지이노텍 주식회사 |
액정표시장치
|
KR101197776B1
(ko)
*
|
2010-12-27 |
2012-11-06 |
엘지이노텍 주식회사 |
와이어그리드편광자의 제조방법
|
US20150077851A1
(en)
|
2010-12-30 |
2015-03-19 |
Moxtek, Inc. |
Multi-layer absorptive wire grid polarizer
|
JP2012238632A
(ja)
*
|
2011-05-10 |
2012-12-06 |
Sony Corp |
固体撮像装置、固体撮像装置の製造方法、及び、電子機器
|
US8873144B2
(en)
|
2011-05-17 |
2014-10-28 |
Moxtek, Inc. |
Wire grid polarizer with multiple functionality sections
|
US8913320B2
(en)
|
2011-05-17 |
2014-12-16 |
Moxtek, Inc. |
Wire grid polarizer with bordered sections
|
WO2013006077A1
(en)
|
2011-07-06 |
2013-01-10 |
Wostec, Inc. |
Solar cell with nanostructured layer and methods of making and using
|
DE102011079030B4
(de)
|
2011-07-12 |
2014-10-02 |
Friedrich-Schiller-Universität Jena |
Polarisator und Verfahren zur Herstellung eines Polarisators
|
KR20140054183A
(ko)
|
2011-08-05 |
2014-05-08 |
워스텍, 인코포레이티드 |
나노구조 층을 갖는 발광 다이오드 및 그의 제조 및 사용 방법
|
US9057704B2
(en)
|
2011-12-12 |
2015-06-16 |
Wostec, Inc. |
SERS-sensor with nanostructured surface and methods of making and using
|
WO2013109157A1
(en)
|
2012-01-18 |
2013-07-25 |
Wostec, Inc. |
Arrangements with pyramidal features having at least one nanostructured surface and methods of making and using
|
JP5938241B2
(ja)
*
|
2012-03-15 |
2016-06-22 |
日立マクセル株式会社 |
光学素子およびその製造方法
|
US8922890B2
(en)
|
2012-03-21 |
2014-12-30 |
Moxtek, Inc. |
Polarizer edge rib modification
|
WO2013141740A1
(en)
|
2012-03-23 |
2013-09-26 |
Wostec, Inc. |
Sers-sensor with nanostructured layer and methods of making and using
|
US9599869B2
(en)
*
|
2013-01-23 |
2017-03-21 |
Samsung Display Co., Ltd. |
Display apparatus
|
WO2014142700A1
(en)
|
2013-03-13 |
2014-09-18 |
Wostec Inc. |
Polarizer based on a nanowire grid
|
KR102117600B1
(ko)
*
|
2013-05-28 |
2020-06-02 |
삼성디스플레이 주식회사 |
편광판 및 이를 포함하는 액정 표시 장치
|
KR102056902B1
(ko)
|
2013-05-29 |
2019-12-18 |
삼성전자주식회사 |
와이어 그리드 편광판 및 이를 구비하는 액정 표시패널 및 액정 표시장치
|
KR102064210B1
(ko)
*
|
2013-07-04 |
2020-01-10 |
삼성디스플레이 주식회사 |
편광 소자, 이를 포함하는 편광광 조사 장치 및 이의 제조 방법
|
WO2015015722A1
(ja)
|
2013-07-29 |
2015-02-05 |
パナソニックIpマネジメント株式会社 |
光学フィルタおよびそれを用いた偏光撮像装置
|
KR102089661B1
(ko)
|
2013-08-27 |
2020-03-17 |
삼성전자주식회사 |
와이어 그리드 편광판 및 이를 구비하는 액정 표시패널 및 액정 표시장치
|
WO2015033645A1
(ja)
*
|
2013-09-06 |
2015-03-12 |
株式会社アスカネット |
平行配置された光反射部を備えた光制御パネルの製造方法
|
KR102079163B1
(ko)
|
2013-10-02 |
2020-02-20 |
삼성디스플레이 주식회사 |
와이어 그리드 편광자, 이를 포함하는 표시 장치 및 이의 제조방법
|
US9354374B2
(en)
|
2013-10-24 |
2016-05-31 |
Moxtek, Inc. |
Polarizer with wire pair over rib
|
EP2937665B1
(de)
*
|
2014-04-23 |
2021-06-16 |
Hexagon Technology Center GmbH |
Distanzmessmodul mit einer variablen optischen Abschwächeinheit aus einer LC-Zelle
|
CN103985924A
(zh)
*
|
2014-05-22 |
2014-08-13 |
东南大学 |
一种反射式极化分离器
|
IL232866B
(en)
|
2014-05-29 |
2020-08-31 |
Elta Systems Ltd |
Polarization rotator
|
WO2015199948A1
(en)
*
|
2014-06-25 |
2015-12-30 |
Moxtek, Inc. |
Wire grid polarizer with dual absorptive regions
|
WO2015199573A1
(en)
|
2014-06-26 |
2015-12-30 |
Wostec, Inc. |
Wavelike hard nanomask on a topographic feature and methods of making and using
|
GB2528682A
(en)
*
|
2014-07-28 |
2016-02-03 |
Isis Innovation |
Plasmonic filter
|
US10234613B2
(en)
|
2015-02-06 |
2019-03-19 |
Moxtek, Inc. |
High contrast inverse polarizer
|
JP2016164618A
(ja)
*
|
2015-03-06 |
2016-09-08 |
大日本印刷株式会社 |
転写フィルム、転写フィルムの巻取体、光学フィルム、光学フィルムの巻取体、画像表示装置、転写フィルムの製造方法、光学フィルムの製造方法
|
US20170059758A1
(en)
|
2015-08-24 |
2017-03-02 |
Moxtek, Inc. |
Small-Pitch Wire Grid Polarizer
|
DE102015115348A1
(de)
*
|
2015-09-11 |
2017-03-16 |
Hella Kgaa Hueck & Co. |
Beleuchtungseinrichtung für ein Kraftfahrzeug
|
KR20170079671A
(ko)
*
|
2015-12-30 |
2017-07-10 |
코오롱인더스트리 주식회사 |
와이어 그리드 편광판 및 이를 포함한 액정표시장치
|
US10444410B2
(en)
|
2016-08-16 |
2019-10-15 |
Moxtek, Inc. |
Overcoat wire grid polarizer having conformal coat layer with oxidation barrier and moisture barrier
|
US10069211B2
(en)
*
|
2016-09-16 |
2018-09-04 |
The United States Of America As Represented By The Secretary Of The Navy |
Broadband circularly polarized patch antenna and method
|
US10672427B2
(en)
|
2016-11-18 |
2020-06-02 |
Wostec, Inc. |
Optical memory devices using a silicon wire grid polarizer and methods of making and using
|
US10139536B2
(en)
*
|
2016-11-22 |
2018-11-27 |
Moxtek, Inc. |
Embedded wire grid polarizer with high reflectivity on both sides
|
WO2018156042A1
(en)
|
2017-02-27 |
2018-08-30 |
Wostec, Inc. |
Nanowire grid polarizer on a curved surface and methods of making and using
|
CN107870385A
(zh)
*
|
2017-12-22 |
2018-04-03 |
苏州大学 |
一种线栅偏振器的制造方法及制造系统
|
US10852464B2
(en)
|
2018-03-01 |
2020-12-01 |
Moxtek, Inc. |
High-contrast polarizer
|
US11079528B2
(en)
|
2018-04-12 |
2021-08-03 |
Moxtek, Inc. |
Polarizer nanoimprint lithography
|
US10964507B2
(en)
|
2018-05-10 |
2021-03-30 |
Moxtek, Inc. |
X-ray source voltage shield
|
JP7333168B2
(ja)
|
2018-11-19 |
2023-08-24 |
デクセリアルズ株式会社 |
偏光素子、偏光素子の製造方法及び光学機器
|
KR20200074662A
(ko)
*
|
2018-12-17 |
2020-06-25 |
삼성전자주식회사 |
금속-유전체 복합 구조를 구비하는 위상 변환 소자
|
PH12020050192A1
(en)
|
2019-07-17 |
2021-05-17 |
Moxtek Inc |
Reflective wire grid polarizer with transparent cap
|
CN110364823A
(zh)
*
|
2019-07-18 |
2019-10-22 |
中国科学院光电技术研究所 |
一种基于金属悬链线光栅的高效率可调谐圆偏振分束器
|
CN114365030B
(zh)
*
|
2019-09-13 |
2024-08-16 |
3M创新有限公司 |
光学系统
|
US11728122B2
(en)
|
2020-10-23 |
2023-08-15 |
Moxtek, Inc. |
X-ray tube backscatter suppression
|
CN112350071A
(zh)
*
|
2020-11-02 |
2021-02-09 |
中国工程物理研究院电子工程研究所 |
一种反射式太赫兹偏振转换器
|
CN113534306B
(zh)
*
|
2021-07-14 |
2022-04-19 |
浙江大学 |
一种高消光比宽带线偏振片
|
US20240164073A1
(en)
*
|
2021-08-05 |
2024-05-16 |
Nitto Denko Corporation |
Electromagnetic shield
|
CN115201953B
(zh)
*
|
2022-08-22 |
2023-01-20 |
之江实验室 |
一种双工作波段高衍射效率复合反射光栅
|