DE60226617D1 - Lichtempfindliche harzzusammensetzung und lasergravierbares druckelement - Google Patents

Lichtempfindliche harzzusammensetzung und lasergravierbares druckelement

Info

Publication number
DE60226617D1
DE60226617D1 DE60226617T DE60226617T DE60226617D1 DE 60226617 D1 DE60226617 D1 DE 60226617D1 DE 60226617 T DE60226617 T DE 60226617T DE 60226617 T DE60226617 T DE 60226617T DE 60226617 D1 DE60226617 D1 DE 60226617D1
Authority
DE
Germany
Prior art keywords
weight
parts
resin composition
resin
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60226617T
Other languages
English (en)
Inventor
Masahisa Yokota
Kei Tomeba
Hiroshi Yamada
Yoshifumi Araki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Chemicals Corp
Original Assignee
Asahi Kasei Chemicals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Chemicals Corp filed Critical Asahi Kasei Chemicals Corp
Application granted granted Critical
Publication of DE60226617D1 publication Critical patent/DE60226617D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/02—Engraving; Heads therefor
    • B41C1/04—Engraving; Heads therefor using heads controlled by an electric information signal
    • B41C1/05—Heat-generating engraving heads, e.g. laser beam, electron beam
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/10—Esters; Ether-esters
    • C08K5/101—Esters; Ether-esters of monocarboxylic acids
    • C08K5/103—Esters; Ether-esters of monocarboxylic acids with polyalcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/267—Marking of plastic artifacts, e.g. with laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
DE60226617T 2001-09-05 2002-08-30 Lichtempfindliche harzzusammensetzung und lasergravierbares druckelement Expired - Lifetime DE60226617D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2001268892 2001-09-05
JP2002072002 2002-03-15
JP2002173022 2002-06-13
PCT/JP2002/008811 WO2003022594A1 (en) 2001-09-05 2002-08-30 Photosensitive resin composition for printing plate precursor capable of laser engraving

Publications (1)

Publication Number Publication Date
DE60226617D1 true DE60226617D1 (de) 2008-06-26

Family

ID=27347444

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60226617T Expired - Lifetime DE60226617D1 (de) 2001-09-05 2002-08-30 Lichtempfindliche harzzusammensetzung und lasergravierbares druckelement

Country Status (9)

Country Link
US (1) US7029825B2 (de)
EP (1) EP1424210B1 (de)
JP (1) JP3801592B2 (de)
CN (1) CN1281420C (de)
AT (1) ATE395193T1 (de)
DE (1) DE60226617D1 (de)
DK (1) DK1424210T3 (de)
ES (1) ES2301676T3 (de)
WO (1) WO2003022594A1 (de)

Families Citing this family (74)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7759049B2 (en) * 2002-06-25 2010-07-20 Asahi Kasei Chemicals Corporation Photosensitive resin composition for original printing plate capable of being carved by laser
US20040264139A1 (en) * 2003-06-24 2004-12-30 Nokia Corporation Process for manufacturing a cover
DE10335230A1 (de) * 2003-08-01 2005-02-17 Man Roland Druckmaschinen Ag Verfahren zur Herstellung von RFID Etiketten
EP1710094B1 (de) 2004-01-27 2011-10-05 Asahi Kasei Chemicals Corporation Verfahren zur herstellung eines lasergravierbaren druckträgers
EP1710093B1 (de) 2004-01-27 2013-11-20 Asahi Kasei Chemicals Corporation Lichtempfindliche harzzusammensetzung für lasergravierungsfähigen druckträger
JP4502367B2 (ja) * 2004-02-04 2010-07-14 旭化成イーマテリアルズ株式会社 レーザー彫刻可能な円筒状フレキソ印刷原版の製造方法
JP2005221735A (ja) * 2004-02-05 2005-08-18 Asahi Kasei Chemicals Corp レーザー彫刻可能な円筒状印刷原版の製造方法
JP2005225023A (ja) * 2004-02-12 2005-08-25 Konica Minolta Medical & Graphic Inc 印刷版材料
EP1778498B1 (de) * 2004-03-03 2008-06-18 Kodak IL Ltd. Neues material für durch infrarotlaser ablatierte gravierte flexodruckplatten
ATE458624T1 (de) 2004-03-30 2010-03-15 Asahi Kasei Chemicals Corp Hohlzyindrisches druckelement
WO2005121896A1 (ja) * 2004-06-11 2005-12-22 Asahi Kasei Chemicals Corporation フレキソ印刷版用感光性樹脂
JP2006069120A (ja) * 2004-09-03 2006-03-16 Asahi Kasei Chemicals Corp 電子回路あるいは光学部材の製造方法
ES2314459T3 (es) * 2004-09-13 2009-03-16 Asahi Kasei Chemicals Corporation Procedimiento para la fabricacion de un producto curado de resina fotosensible.
US7265772B2 (en) * 2004-12-16 2007-09-04 Esko Graphics A/S Beam illumination system and method for producing printing plates
JP5294533B2 (ja) * 2005-01-17 2013-09-18 三菱レイヨン株式会社 硬化性組成物、その硬化物を有する物品
US20070281036A1 (en) * 2005-12-19 2007-12-06 University Of Vermont And State Agricultural College System and method of delivering a desired material to a cell
JP2007185917A (ja) * 2006-01-16 2007-07-26 Asahi Kasei Chemicals Corp フレキソ印刷用印刷版の製造方法
US8501390B2 (en) 2006-06-27 2013-08-06 Xiper Innovations, Inc. Laser engravable flexographic printing articles based on millable polyurethanes, and method
JP4837738B2 (ja) 2006-09-06 2011-12-14 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
EP1936438B1 (de) * 2006-12-20 2010-03-10 Agfa Graphics N.V. Flexodruckformvorläufer für Lasergravur
EP2567995B1 (de) * 2006-12-26 2014-02-19 Asahi Kasei E-materials Corporation Harzzusammensetzung für Druckplatte
EP2115055B1 (de) * 2007-01-05 2015-03-18 Board of Trustees of Michigan State University Verbundmaterial mit polymer und mesoporöses silikat
US20110281993A1 (en) * 2007-01-05 2011-11-17 Pinnavaia Thomas J Composites Comprising Polymer and Mesoporous Silicate
US8632956B2 (en) 2007-03-20 2014-01-21 Asahi Kasei E-Materials Corporation Process for producing photosensitive resin plate and relief printing plate having recessed and projected pattern, and plate surface treating liquid used in the process
JP5315234B2 (ja) 2007-04-19 2013-10-16 旭化成イーマテリアルズ株式会社 凹凸形状を有する感光性樹脂版及び凸版印刷版の製造方法、並びに当該製造方法に用いる版面用処理液
US8187794B2 (en) * 2007-04-23 2012-05-29 Eastman Kodak Company Ablatable elements for making flexographic printing plates
WO2009010945A2 (en) * 2007-07-13 2009-01-22 University College Cork - National University Of Ireland, Cork A method for synthesising microparticles
EP2077184A1 (de) 2008-01-07 2009-07-08 Felix Böttcher GmbH & Co. KG Sleeve für den Flexodruck
WO2009034160A1 (de) * 2007-09-12 2009-03-19 Felix Böttcher Gmbh & Co Kg. Sleeve für den flexodruck
JP5134012B2 (ja) * 2007-12-27 2013-01-30 旭化成イーマテリアルズ株式会社 レーザー彫刻印刷原版用熱硬化性樹脂組成物
JP5241252B2 (ja) * 2008-01-29 2013-07-17 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
JP5322575B2 (ja) * 2008-03-28 2013-10-23 富士フイルム株式会社 レーザー彫刻用樹脂組成物、画像形成材料、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版、及びレリーフ印刷版の製造方法
JP2009235296A (ja) * 2008-03-28 2009-10-15 Asahi Kasei E-Materials Corp 低極性プレポリマー及びそれを含む感光性樹脂組成物
JP5305793B2 (ja) * 2008-03-31 2013-10-02 富士フイルム株式会社 レリーフ印刷版及びレリーフ印刷版の製造方法
US8492464B2 (en) * 2008-05-23 2013-07-23 Sabic Innovative Plastics Ip B.V. Flame retardant laser direct structuring materials
US10119021B2 (en) 2008-05-23 2018-11-06 Sabic Global Technologies B.V. Flame retardant laser direct structuring materials
JP5171952B2 (ja) 2008-06-12 2013-03-27 旭化成イーマテリアルズ株式会社 レーザー彫刻用円筒状印刷原版の製造方法及び製造装置
JP4825848B2 (ja) 2008-07-11 2011-11-30 東芝電子管デバイス株式会社 反射膜用組成物、反射膜、およびｘ線検出器
WO2010030013A1 (ja) * 2008-09-12 2010-03-18 旭化成イーマテリアルズ株式会社 樹脂凸版印刷版の製造方法、樹脂凸版印刷版、及び樹脂凸版印刷版の製造装置
US20100075117A1 (en) * 2008-09-24 2010-03-25 Fujifilm Corporation Relief printing plate precursor for laser engraving, method of producing the same, relief printing plate obtainable therefrom, and method of producing relief printing plate
JP2010163594A (ja) * 2008-12-15 2010-07-29 Hitachi Chem Co Ltd 硬化性樹脂組成物、硬化性樹脂フィルム及びそれを用いためっき方法
CN101776846B (zh) * 2009-01-14 2012-07-18 北京光创物成材料科技有限公司 激光造型专用光固化组合物
JP5566713B2 (ja) 2009-02-05 2014-08-06 富士フイルム株式会社 レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
JP5404475B2 (ja) * 2009-03-30 2014-01-29 富士フイルム株式会社 レーザー彫刻用印刷版原版、印刷版、及び印刷版の製造方法
JP2011063013A (ja) * 2009-08-19 2011-03-31 Fujifilm Corp レリーフ印刷版製版用リンス液及びレリーフ印刷版の製版方法
JP5393438B2 (ja) * 2009-12-25 2014-01-22 富士フイルム株式会社 熱架橋性レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版及びその製造方法、並びに、レリーフ印刷版及びその製版方法
JP5628650B2 (ja) * 2009-12-25 2014-11-19 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版の製版方法及びレリーフ印刷版
JP5443968B2 (ja) * 2009-12-25 2014-03-19 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版及びその製造方法、並びに、レリーフ印刷版及びその製版方法
JP5409340B2 (ja) * 2009-12-25 2014-02-05 富士フイルム株式会社 熱架橋性レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版及びその製造方法、並びに、レリーフ印刷版及びその製版方法
JP2011152719A (ja) * 2010-01-27 2011-08-11 Fujifilm Corp レリーフ印刷版の製版方法
JP2011245752A (ja) * 2010-05-27 2011-12-08 Fujifilm Corp レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版及びその製造方法、並びに、レリーフ印刷版及びその製版方法
JP2011245818A (ja) * 2010-05-31 2011-12-08 Fujifilm Corp レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版の製版方法、及び、レリーフ印刷版
EP2589495A4 (de) * 2010-06-29 2014-03-05 Fujifilm Corp Harzzusammensetzung für die lasergravur, reliefdruckoriginalplatte für die lasergravur, verfahren zur herstellung der reliefdruckoriginalplatte für die lasergravur, reliefdruckplatte und verfahren zur herstellung der reliefdruckplatte
CN102314080A (zh) * 2010-06-29 2012-01-11 富士胶片株式会社 激光雕刻用树脂组合物、激光雕刻用凸版印刷版原版、凸版印刷版的制版方法及凸版印刷版
US8603725B2 (en) 2011-07-28 2013-12-10 Eastman Kodak Company Laser-engraveable compositions and flexographic printing precursors
US8613999B2 (en) * 2011-07-28 2013-12-24 Eastman Kodak Company Laser-engraveable compositions and flexographic printing precursors comprising organic porous particles
WO2013015354A1 (ja) * 2011-07-28 2013-01-31 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レーザー彫刻用レリーフ印刷版原版の製造方法、レリーフ印刷版の製版方法、及び、レリーフ印刷版
JP5433668B2 (ja) * 2011-11-28 2014-03-05 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用フレキソ印刷版原版及びその製造方法、並びに、フレキソ印刷版及びその製版方法
CN103135345A (zh) * 2011-11-28 2013-06-05 富士胶片株式会社 激光雕刻用树脂组合物、激光雕刻用柔性印刷版原版及其制法、及柔性印刷版及其制版法
EP2599811A1 (de) * 2011-11-29 2013-06-05 Fujifilm Corporation Harzzusammensetzung für Lasergravierung, Flexodruckplattenvorläufer für Lasergravierung und Verfahren zu dessen Herstellung sowie Flexodruckplatte und Verfahren zu deren Herstellung
US20130186292A1 (en) * 2012-01-19 2013-07-25 Fujifilm Corporation Resin composition for flexographic printing plate, laser-engraving type flexographic printing plate precursor and process for producing same, and flexographic printing plate and process for making same
JP5755667B2 (ja) 2012-01-30 2015-07-29 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻型フレキソ印刷版原版及びその製造方法、並びに、フレキソ印刷版及びその製版方法
CN102617806A (zh) * 2012-03-29 2012-08-01 漯河职业技术学院 一种镭雕abs的制备方法
US20130265104A1 (en) * 2012-04-05 2013-10-10 Mediatek Singapore Pte. Ltd. Method and apparatus for current control in a circuit
JP2013240998A (ja) * 2012-04-27 2013-12-05 Fujifilm Corp レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版の製造方法、レリーフ印刷版原版、レリーフ印刷版の製版方法及びレリーフ印刷版
US9096090B2 (en) * 2012-05-09 2015-08-04 Ryan W. Vest Liquid platemaking with laser engraving
WO2013176040A1 (ja) * 2012-05-21 2013-11-28 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版の製造方法、レリーフ印刷版原版、レリーフ印刷版の製版方法及びレリーフ印刷版
WO2014034767A1 (ja) * 2012-08-31 2014-03-06 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版及びその製造方法、並びに、レリーフ印刷版及びその製版方法
EP2746058B1 (de) 2012-12-18 2016-04-27 Agfa Graphics Nv Verfahren zur Herstellung einer flexographischen Druckvorlage
JP6379404B2 (ja) * 2013-01-28 2018-08-29 日産化学株式会社 パターンを有する基板の製造方法及びフッ酸エッチング用樹脂組成物
JP2015047743A (ja) * 2013-08-30 2015-03-16 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用フレキソ印刷版原版の製造方法、フレキソ印刷版原版、フレキソ印刷版の製版方法及びフレキソ印刷版
JP5918731B2 (ja) * 2013-08-30 2016-05-18 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用フレキソ印刷版原版及びその製造方法、並びに、フレキソ印刷版及びその製版方法
RU2550179C1 (ru) * 2013-11-26 2015-05-10 Общество с ограниченной ответственностью "Флуоресцентные информационные технологии" ООО "Флуринтек" Полимерная композиция, способ изготовления маркировки прямого нанесения с полимерной композицией и маркировка прямого нанесения
RU2715462C1 (ru) * 2019-09-30 2020-02-28 Общество с ограниченной ответственностью «ВКО «Символ» Устройство и способ нанесения маркировки

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3549733A (en) 1968-12-04 1970-12-22 Du Pont Method of producing polymeric printing plates
JPS5664823A (en) 1979-11-01 1981-06-02 Asahi Chem Ind Co Ltd Manufacture of synthetic resin roller having good surface accuracy
DE3367683D1 (en) * 1982-06-21 1987-01-02 Hoechst Ag Photopolymerizable mixture and photopolymerizable copying material produced therewith
DE69021862T2 (de) * 1990-04-04 1996-04-04 Agfa Gevaert Nv Wasserentwickelbare lithographische Diazo-Druckplatte.
US5798202A (en) 1992-05-11 1998-08-25 E. I. Dupont De Nemours And Company Laser engravable single-layer flexographic printing element
US5804353A (en) 1992-05-11 1998-09-08 E. I. Dupont De Nemours And Company Lasers engravable multilayer flexographic printing element
US5259311A (en) 1992-07-15 1993-11-09 Mark/Trece Inc. Laser engraving of photopolymer printing plates
DE19625749C2 (de) 1996-06-27 1998-12-17 Polywest Kunststofftechnik Verfahren zur Herstellung einer nahtlosen Druckform für den rotativen Hochdruck
JPH10193821A (ja) 1996-12-27 1998-07-28 Kureha Elastomer Kk フレキソ印刷用ゴム印材
US6399270B1 (en) * 1998-12-04 2002-06-04 Konica Corporation Support for printing plate and printing plate
JP2000221666A (ja) * 1999-02-01 2000-08-11 Konica Corp 画像形成材料及び画像形成方法
JP3626380B2 (ja) 1998-12-04 2005-03-09 コニカミノルタホールディングス株式会社 印刷版及び画像形成方法
DE19918363A1 (de) 1999-04-22 2000-10-26 Dlw Ag Druckform für Flexodruck auf Basis nachwachsender Rohstoffe
JP2000318315A (ja) 1999-05-14 2000-11-21 Konica Corp レーザーアブレーション型画像形成材料及び画像形成方法
DE19942216C2 (de) 1999-09-03 2003-04-24 Basf Drucksysteme Gmbh Siliconkautschuk und eisenhaltige, anorganische Feststoffe und/oder Ruß enthaltendes Aufzeichnungsmaterial zur Herstellung von Reliefdruckplatten mittels Lasergravur, Verfahren zur Herstellung von Reliefdruckplatten sowie damit hergestellte Reliefdruckplatte
EP1136254B1 (de) 2000-03-23 2003-05-28 BASF Drucksysteme GmbH Verwendung von Pfropfcopolymeren zur Herstellung lasergravierbarer Reliefdruckelementen
JP2002003665A (ja) 2000-06-20 2002-01-09 Jsr Corp レーザー加工用重合体材料並びにこれを用いたフレキソ印刷版及び印章材
US6737216B2 (en) 2000-12-08 2004-05-18 E.I. Du Pont De Nemours And Company Laser engravable flexographic printing element and a method for forming a printing plate from the element
DE10113926A1 (de) * 2001-03-21 2002-09-26 Basf Drucksysteme Gmbh Verfahren zur Herstellung von Flexodruckplatten mittels Lasergravur

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CN1281420C (zh) 2006-10-25
ATE395193T1 (de) 2008-05-15
CN1522203A (zh) 2004-08-18
EP1424210A1 (de) 2004-06-02
JP3801592B2 (ja) 2006-07-26
WO2003022594A1 (en) 2003-03-20
US7029825B2 (en) 2006-04-18
EP1424210A4 (de) 2006-09-27
JPWO2003022594A1 (ja) 2004-12-24
EP1424210B1 (de) 2008-05-14
US20040157162A1 (en) 2004-08-12
ES2301676T3 (es) 2008-07-01

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