DE602006006122D1 - Vakuum-Pumpeinrichtung und Verfahren zur Lebensdauerüberwachung der Einrichtung - Google Patents

Vakuum-Pumpeinrichtung und Verfahren zur Lebensdauerüberwachung der Einrichtung

Info

Publication number
DE602006006122D1
DE602006006122D1 DE602006006122T DE602006006122T DE602006006122D1 DE 602006006122 D1 DE602006006122 D1 DE 602006006122D1 DE 602006006122 T DE602006006122 T DE 602006006122T DE 602006006122 T DE602006006122 T DE 602006006122T DE 602006006122 D1 DE602006006122 D1 DE 602006006122D1
Authority
DE
Germany
Prior art keywords
vacuum pumping
motor
exhaust system
lifetime monitoring
parameters relating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006006122T
Other languages
German (de)
English (en)
Inventor
Nicolas Becourt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pfeiffer Vacuum SAS
Original Assignee
Alcatel Lucent SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=36046932&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE602006006122(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Alcatel Lucent SAS filed Critical Alcatel Lucent SAS
Publication of DE602006006122D1 publication Critical patent/DE602006006122D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
    • F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B51/00—Testing machines, pumps, or pumping installations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2270/00—Control; Monitoring or safety arrangements
    • F04C2270/03—Torque
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2270/00—Control; Monitoring or safety arrangements
    • F04C2270/80—Diagnostics

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Control Of Positive-Displacement Pumps (AREA)
  • Drying Of Semiconductors (AREA)
  • Control Of Positive-Displacement Air Blowers (AREA)
DE602006006122T 2005-07-04 2006-06-27 Vakuum-Pumpeinrichtung und Verfahren zur Lebensdauerüberwachung der Einrichtung Active DE602006006122D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0552027A FR2887938A1 (fr) 2005-07-04 2005-07-04 Ligne de vide et procede de surveillance d'une telle ligne

Publications (1)

Publication Number Publication Date
DE602006006122D1 true DE602006006122D1 (de) 2009-05-20

Family

ID=36046932

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006006122T Active DE602006006122D1 (de) 2005-07-04 2006-06-27 Vakuum-Pumpeinrichtung und Verfahren zur Lebensdauerüberwachung der Einrichtung

Country Status (9)

Country Link
US (1) US7543492B2 (https=)
EP (1) EP1754888B1 (https=)
JP (1) JP5053269B2 (https=)
KR (1) KR101319250B1 (https=)
CN (1) CN101213371B (https=)
AT (1) ATE428051T1 (https=)
DE (1) DE602006006122D1 (https=)
FR (1) FR2887938A1 (https=)
WO (1) WO2007003862A2 (https=)

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KR100885919B1 (ko) * 2007-05-21 2009-02-26 삼성전자주식회사 펌프 폴트 예측 장치 및 펌프 폴트 예측 방법
GB0809976D0 (en) * 2008-06-02 2008-07-09 Edwards Ltd Vacuum pumping systems
FR2947309A1 (fr) 2009-06-26 2010-12-31 Alcatel Lucent Procede de prediction d'une defaillance de la rotation du rotor d'une pompe a vide et dispositif de pompage associe
CN102121470B (zh) * 2010-01-08 2013-06-19 中芯国际集成电路制造(上海)有限公司 监测真空泵失效的装置和方法、真空度感测器
JP5767632B2 (ja) * 2010-05-21 2015-08-19 エドワーズ株式会社 排気ポンプの堆積物検知装置と、該装置を備えた排気ポンプ
US9782852B2 (en) 2010-07-16 2017-10-10 Hypertherm, Inc. Plasma torch with LCD display with settings adjustment and fault diagnosis
US10455682B2 (en) 2012-04-04 2019-10-22 Hypertherm, Inc. Optimization and control of material processing using a thermal processing torch
US9481050B2 (en) 2013-07-24 2016-11-01 Hypertherm, Inc. Plasma arc cutting system and persona selection process
US10486260B2 (en) 2012-04-04 2019-11-26 Hypertherm, Inc. Systems, methods, and devices for transmitting information to thermal processing systems
KR101597008B1 (ko) * 2010-08-05 2016-02-23 가부시키가이샤 에바라 세이사꾸쇼 배기 시스템
JP5504107B2 (ja) * 2010-09-06 2014-05-28 エドワーズ株式会社 逆流防止システム及び該逆流防止システムを備えた真空ポンプ
JP5848044B2 (ja) * 2011-06-30 2016-01-27 株式会社ユーシン精機 成形品取出機
KR101319657B1 (ko) * 2011-09-30 2013-10-17 삼성전기주식회사 부품 계수 장치
US20150332071A1 (en) 2012-04-04 2015-11-19 Hypertherm, Inc. Configuring Signal Devices in Thermal Processing Systems
US9672460B2 (en) 2012-04-04 2017-06-06 Hypertherm, Inc. Configuring signal devices in thermal processing systems
US9737954B2 (en) 2012-04-04 2017-08-22 Hypertherm, Inc. Automatically sensing consumable components in thermal processing systems
US11783138B2 (en) 2012-04-04 2023-10-10 Hypertherm, Inc. Configuring signal devices in thermal processing systems
US9395715B2 (en) 2012-04-04 2016-07-19 Hypertherm, Inc. Identifying components in a material processing system
US9144882B2 (en) * 2012-04-04 2015-09-29 Hypertherm, Inc. Identifying liquid jet cutting system components
WO2015134966A1 (en) 2014-03-07 2015-09-11 Hypertherm, Inc. Liquid pressurization pump and systems with data storage
US12521905B2 (en) 2014-03-07 2026-01-13 Hypertherm, Inc. Liquid pressurization pump and systems with data storage
US10786924B2 (en) 2014-03-07 2020-09-29 Hypertherm, Inc. Waterjet cutting head temperature sensor
US20150269603A1 (en) 2014-03-19 2015-09-24 Hypertherm, Inc. Methods for Developing Customer Loyalty Programs and Related Systems and Devices
CN104676177A (zh) * 2015-01-29 2015-06-03 江苏广通管业制造有限公司 一种新型航空真空弯头
FR3067069B1 (fr) 2017-06-06 2019-08-02 Pfeiffer Vacuum Procede de surveillance d'un etat de fonctionnement d'un dispositif de pompage
JP6804029B2 (ja) 2017-12-21 2020-12-23 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、半導体装置の製造方法及びプログラム
CN112955840B (zh) * 2018-09-12 2025-04-25 Abb瑞士股份有限公司 用于监测气体分析仪的样品处置系统的状况的方法和系统
CN111043007B (zh) * 2019-12-30 2024-06-21 东莞市天美新自动化设备有限公司 跟踪步进式多级抽真空系统
JP7374015B2 (ja) * 2020-02-21 2023-11-06 エドワーズ株式会社 真空ポンプ、除害装置、および排気ガス処理システム

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DE69528913T2 (de) * 1994-04-28 2003-09-04 Ebara Corp., Tokio/Tokyo Kryopumpe
US6178393B1 (en) * 1995-08-23 2001-01-23 William A. Irvin Pump station control system and method
US6260004B1 (en) * 1997-12-31 2001-07-10 Innovation Management Group, Inc. Method and apparatus for diagnosing a pump system
US20050091004A1 (en) * 1998-04-15 2005-04-28 Alexander G. Parlos System and method for condition assessment and end-of-life prediction
JP2000283056A (ja) * 1999-03-26 2000-10-10 Hitachi Ltd 真空ポンプ異常監視システム
JP3723866B2 (ja) * 2001-02-07 2005-12-07 株式会社日立製作所 インターナルポンプの性能監視方法及び装置
JP4138267B2 (ja) * 2001-03-23 2008-08-27 株式会社東芝 半導体製造装置、真空ポンプの寿命予測方法及び真空ポンプの修理タイミング決定方法
JP2003077907A (ja) * 2001-08-31 2003-03-14 Toshiba Corp 生産装置の異常停止回避方法及び異常停止回避システム
JP4149691B2 (ja) * 2001-08-31 2008-09-10 株式会社東芝 半導体製造装置用回転機の寿命予測方法及び半導体製造装置
JP4184638B2 (ja) * 2001-08-31 2008-11-19 株式会社東芝 半導体製造装置の寿命診断方法
GB0217494D0 (en) * 2002-07-29 2002-09-04 Boc Group Plc Conditioning monitoring of pumps and pump systems
JP3967245B2 (ja) * 2002-09-30 2007-08-29 株式会社東芝 回転機の寿命予測方法及び回転機を有する製造装置
US6868760B1 (en) * 2003-02-12 2005-03-22 Pratt-Read Corporation Tool locking mechanism
JP3923880B2 (ja) * 2002-09-30 2007-06-06 株式会社東芝 回転機の寿命予測システム、回転機の寿命予測方法及び回転機を有する製造装置
JP2004150340A (ja) * 2002-10-30 2004-05-27 Mitsubishi Heavy Ind Ltd ターボ分子ポンプおよびその故障予測方法

Also Published As

Publication number Publication date
CN101213371B (zh) 2011-06-15
KR101319250B1 (ko) 2013-10-18
ATE428051T1 (de) 2009-04-15
JP2008545088A (ja) 2008-12-11
KR20080031048A (ko) 2008-04-07
US7543492B2 (en) 2009-06-09
WO2007003862A2 (fr) 2007-01-11
CN101213371A (zh) 2008-07-02
EP1754888B1 (fr) 2009-04-08
FR2887938A1 (fr) 2007-01-05
EP1754888A1 (fr) 2007-02-21
US20070012099A1 (en) 2007-01-18
WO2007003862A3 (fr) 2007-03-08
JP5053269B2 (ja) 2012-10-17

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