ATE428051T1 - Vakuum-pumpeinrichtung und verfahren zur lebensdaueruberwachung der einrichtung - Google Patents

Vakuum-pumpeinrichtung und verfahren zur lebensdaueruberwachung der einrichtung

Info

Publication number
ATE428051T1
ATE428051T1 AT06116150T AT06116150T ATE428051T1 AT E428051 T1 ATE428051 T1 AT E428051T1 AT 06116150 T AT06116150 T AT 06116150T AT 06116150 T AT06116150 T AT 06116150T AT E428051 T1 ATE428051 T1 AT E428051T1
Authority
AT
Austria
Prior art keywords
vacuum pump
motor
exhaust system
lifetime monitoring
pump device
Prior art date
Application number
AT06116150T
Other languages
English (en)
Inventor
Nicolas Becourt
Original Assignee
Alcatel Lucent
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=36046932&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE428051(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Alcatel Lucent filed Critical Alcatel Lucent
Application granted granted Critical
Publication of ATE428051T1 publication Critical patent/ATE428051T1/de

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B51/00—Testing machines, pumps, or pumping installations
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
    • F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2270/00—Control; Monitoring or safety arrangements
    • F04C2270/03—Torque
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2270/00—Control; Monitoring or safety arrangements
    • F04C2270/80—Diagnostics
AT06116150T 2005-07-04 2006-06-27 Vakuum-pumpeinrichtung und verfahren zur lebensdaueruberwachung der einrichtung ATE428051T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0552027A FR2887938A1 (fr) 2005-07-04 2005-07-04 Ligne de vide et procede de surveillance d'une telle ligne

Publications (1)

Publication Number Publication Date
ATE428051T1 true ATE428051T1 (de) 2009-04-15

Family

ID=36046932

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06116150T ATE428051T1 (de) 2005-07-04 2006-06-27 Vakuum-pumpeinrichtung und verfahren zur lebensdaueruberwachung der einrichtung

Country Status (9)

Country Link
US (1) US7543492B2 (de)
EP (1) EP1754888B1 (de)
JP (1) JP5053269B2 (de)
KR (1) KR101319250B1 (de)
CN (1) CN101213371B (de)
AT (1) ATE428051T1 (de)
DE (1) DE602006006122D1 (de)
FR (1) FR2887938A1 (de)
WO (1) WO2007003862A2 (de)

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KR100885919B1 (ko) * 2007-05-21 2009-02-26 삼성전자주식회사 펌프 폴트 예측 장치 및 펌프 폴트 예측 방법
GB0809976D0 (en) * 2008-06-02 2008-07-09 Edwards Ltd Vacuum pumping systems
FR2947309A1 (fr) 2009-06-26 2010-12-31 Alcatel Lucent Procede de prediction d'une defaillance de la rotation du rotor d'une pompe a vide et dispositif de pompage associe
CN102121470B (zh) * 2010-01-08 2013-06-19 中芯国际集成电路制造(上海)有限公司 监测真空泵失效的装置和方法、真空度感测器
JP5767632B2 (ja) * 2010-05-21 2015-08-19 エドワーズ株式会社 排気ポンプの堆積物検知装置と、該装置を備えた排気ポンプ
US9481050B2 (en) 2013-07-24 2016-11-01 Hypertherm, Inc. Plasma arc cutting system and persona selection process
US10455682B2 (en) 2012-04-04 2019-10-22 Hypertherm, Inc. Optimization and control of material processing using a thermal processing torch
US9782852B2 (en) 2010-07-16 2017-10-10 Hypertherm, Inc. Plasma torch with LCD display with settings adjustment and fault diagnosis
US10486260B2 (en) 2012-04-04 2019-11-26 Hypertherm, Inc. Systems, methods, and devices for transmitting information to thermal processing systems
JP5837351B2 (ja) * 2010-08-05 2015-12-24 株式会社荏原製作所 排気系システム
JP5504107B2 (ja) * 2010-09-06 2014-05-28 エドワーズ株式会社 逆流防止システム及び該逆流防止システムを備えた真空ポンプ
JP5848044B2 (ja) * 2011-06-30 2016-01-27 株式会社ユーシン精機 成形品取出機
KR101319657B1 (ko) * 2011-09-30 2013-10-17 삼성전기주식회사 부품 계수 장치
US11783138B2 (en) 2012-04-04 2023-10-10 Hypertherm, Inc. Configuring signal devices in thermal processing systems
US20150332071A1 (en) 2012-04-04 2015-11-19 Hypertherm, Inc. Configuring Signal Devices in Thermal Processing Systems
US9395715B2 (en) 2012-04-04 2016-07-19 Hypertherm, Inc. Identifying components in a material processing system
US9672460B2 (en) 2012-04-04 2017-06-06 Hypertherm, Inc. Configuring signal devices in thermal processing systems
US9144882B2 (en) * 2012-04-04 2015-09-29 Hypertherm, Inc. Identifying liquid jet cutting system components
US9737954B2 (en) 2012-04-04 2017-08-22 Hypertherm, Inc. Automatically sensing consumable components in thermal processing systems
US10786924B2 (en) 2014-03-07 2020-09-29 Hypertherm, Inc. Waterjet cutting head temperature sensor
WO2015134966A1 (en) 2014-03-07 2015-09-11 Hypertherm, Inc. Liquid pressurization pump and systems with data storage
US20150269603A1 (en) 2014-03-19 2015-09-24 Hypertherm, Inc. Methods for Developing Customer Loyalty Programs and Related Systems and Devices
CN104676177A (zh) * 2015-01-29 2015-06-03 江苏广通管业制造有限公司 一种新型航空真空弯头
FR3067069B1 (fr) 2017-06-06 2019-08-02 Pfeiffer Vacuum Procede de surveillance d'un etat de fonctionnement d'un dispositif de pompage
JP6804029B2 (ja) * 2017-12-21 2020-12-23 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、半導体装置の製造方法及びプログラム
US20220026894A1 (en) * 2018-09-12 2022-01-27 Abb Schweiz Ag Method and system for monitoring condition of a sample handling system of a gas analyser

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EP0921311B1 (de) * 1994-04-28 2002-10-16 Ebara Corporation Kryopumpe
US6178393B1 (en) * 1995-08-23 2001-01-23 William A. Irvin Pump station control system and method
US6260004B1 (en) * 1997-12-31 2001-07-10 Innovation Management Group, Inc. Method and apparatus for diagnosing a pump system
US20050091004A1 (en) * 1998-04-15 2005-04-28 Alexander G. Parlos System and method for condition assessment and end-of-life prediction
JP2000283056A (ja) * 1999-03-26 2000-10-10 Hitachi Ltd 真空ポンプ異常監視システム
JP3723866B2 (ja) * 2001-02-07 2005-12-07 株式会社日立製作所 インターナルポンプの性能監視方法及び装置
JP4138267B2 (ja) * 2001-03-23 2008-08-27 株式会社東芝 半導体製造装置、真空ポンプの寿命予測方法及び真空ポンプの修理タイミング決定方法
JP2003077907A (ja) * 2001-08-31 2003-03-14 Toshiba Corp 生産装置の異常停止回避方法及び異常停止回避システム
JP4149691B2 (ja) * 2001-08-31 2008-09-10 株式会社東芝 半導体製造装置用回転機の寿命予測方法及び半導体製造装置
JP4184638B2 (ja) * 2001-08-31 2008-11-19 株式会社東芝 半導体製造装置の寿命診断方法
GB0217494D0 (en) * 2002-07-29 2002-09-04 Boc Group Plc Conditioning monitoring of pumps and pump systems
JP3967245B2 (ja) * 2002-09-30 2007-08-29 株式会社東芝 回転機の寿命予測方法及び回転機を有する製造装置
JP3923880B2 (ja) * 2002-09-30 2007-06-06 株式会社東芝 回転機の寿命予測システム、回転機の寿命予測方法及び回転機を有する製造装置
US6868760B1 (en) * 2003-02-12 2005-03-22 Pratt-Read Corporation Tool locking mechanism
JP2004150340A (ja) * 2002-10-30 2004-05-27 Mitsubishi Heavy Ind Ltd ターボ分子ポンプおよびその故障予測方法

Also Published As

Publication number Publication date
WO2007003862A3 (fr) 2007-03-08
DE602006006122D1 (de) 2009-05-20
JP2008545088A (ja) 2008-12-11
KR20080031048A (ko) 2008-04-07
CN101213371B (zh) 2011-06-15
KR101319250B1 (ko) 2013-10-18
EP1754888B1 (de) 2009-04-08
FR2887938A1 (fr) 2007-01-05
CN101213371A (zh) 2008-07-02
US7543492B2 (en) 2009-06-09
WO2007003862A2 (fr) 2007-01-11
EP1754888A1 (de) 2007-02-21
US20070012099A1 (en) 2007-01-18
JP5053269B2 (ja) 2012-10-17

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