DE602006000203D1 - Lichtempfindliche Lithografiedruckform - Google Patents

Lichtempfindliche Lithografiedruckform

Info

Publication number
DE602006000203D1
DE602006000203D1 DE602006000203T DE602006000203T DE602006000203D1 DE 602006000203 D1 DE602006000203 D1 DE 602006000203D1 DE 602006000203 T DE602006000203 T DE 602006000203T DE 602006000203 T DE602006000203 T DE 602006000203T DE 602006000203 D1 DE602006000203 D1 DE 602006000203D1
Authority
DE
Germany
Prior art keywords
printing plate
lithographic printing
photosensitive lithographic
formula
sensitizing dye
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006000203T
Other languages
English (en)
Other versions
DE602006000203T2 (de
Inventor
Keisuke Arimura
Takahiro Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of DE602006000203D1 publication Critical patent/DE602006000203D1/de
Application granted granted Critical
Publication of DE602006000203T2 publication Critical patent/DE602006000203T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DE602006000203T 2005-03-25 2006-03-24 Lichtempfindliche Lithografiedruckform Active DE602006000203T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005089424 2005-03-25
JP2005089424A JP4368323B2 (ja) 2005-03-25 2005-03-25 感光性平版印刷版

Publications (2)

Publication Number Publication Date
DE602006000203D1 true DE602006000203D1 (de) 2007-12-20
DE602006000203T2 DE602006000203T2 (de) 2008-08-28

Family

ID=36778275

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006000203T Active DE602006000203T2 (de) 2005-03-25 2006-03-24 Lichtempfindliche Lithografiedruckform

Country Status (5)

Country Link
US (1) US20060216640A1 (de)
EP (1) EP1708025B1 (de)
JP (1) JP4368323B2 (de)
AT (1) ATE377778T1 (de)
DE (1) DE602006000203T2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4524235B2 (ja) * 2005-03-29 2010-08-11 富士フイルム株式会社 平版印刷版原版
US8354216B2 (en) 2008-07-15 2013-01-15 Eastman Kodak Company Negative-working imaging elements and methods of use

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* Cited by examiner, † Cited by third party
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JP3023570B2 (ja) 1991-07-16 2000-03-21 冨士薬品工業株式会社 感光性平版印刷版支持体
WO1994018005A1 (en) 1993-02-09 1994-08-18 Agfa-Gevaert Naamloze Vennootschap Heat mode recording material and method for making a lithographic printing plate therewith
JP3223222B2 (ja) 1993-12-03 2001-10-29 富士写真フイルム株式会社 感光性印刷版
JP3327496B2 (ja) 1994-05-23 2002-09-24 富士写真フイルム株式会社 ポジ型感光性平版印刷版
JPH08202025A (ja) 1995-01-25 1996-08-09 Fuji Photo Film Co Ltd 平版印刷材料
JP3589360B2 (ja) 1995-03-22 2004-11-17 富士写真フイルム株式会社 感光性印刷版
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JP3475377B2 (ja) 1995-07-14 2003-12-08 コニカミノルタホールディングス株式会社 平版印刷版用感光材料
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JPH11109641A (ja) 1997-09-29 1999-04-23 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
JP3736707B2 (ja) 1997-04-23 2006-01-18 富士写真フイルム株式会社 ポジ型感光性平版印刷版
JP3890425B2 (ja) 1997-05-16 2007-03-07 富士フイルム株式会社 ポジ型感光性平版印刷版
JPH1124277A (ja) 1997-07-09 1999-01-29 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
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JPH11167203A (ja) * 1997-12-01 1999-06-22 Nichigoo Mooton Kk 感光性樹脂組成物及びそれを用いた感光性エレメント
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JP3969898B2 (ja) 1999-06-11 2007-09-05 富士フイルム株式会社 平版印刷版用原版
JP4139540B2 (ja) 2000-01-24 2008-08-27 富士フイルム株式会社 平版印刷版用原版
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JP2003270775A (ja) 2002-03-13 2003-09-25 Fuji Photo Film Co Ltd 平版印刷版用原版及び平版印刷版の製版方法
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JP4570857B2 (ja) * 2003-03-31 2010-10-27 富士フイルム株式会社 感光性組成物及び平版印刷版原版
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JP4530633B2 (ja) 2003-09-19 2010-08-25 生化学工業株式会社 シグナル伝達物質産生抑制剤
JP4452572B2 (ja) * 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
JP4418725B2 (ja) * 2004-09-24 2010-02-24 富士フイルム株式会社 平版印刷版原版
JP4469741B2 (ja) * 2005-03-03 2010-05-26 富士フイルム株式会社 平版印刷版原版
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Also Published As

Publication number Publication date
EP1708025B1 (de) 2007-11-07
EP1708025A1 (de) 2006-10-04
DE602006000203T2 (de) 2008-08-28
ATE377778T1 (de) 2007-11-15
JP2006267914A (ja) 2006-10-05
US20060216640A1 (en) 2006-09-28
JP4368323B2 (ja) 2009-11-18

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Legal Events

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