DE602004009377D1 - Verfahren zur Herstellung einer Masterplatte für ein optisches Aufzeichnungsmedium, Verfahren zur Herstellung eines Musters, einer Mutterplatte, einer Matrize, eines optischen Aufzeichnungsmediums und eines Resists - Google Patents

Verfahren zur Herstellung einer Masterplatte für ein optisches Aufzeichnungsmedium, Verfahren zur Herstellung eines Musters, einer Mutterplatte, einer Matrize, eines optischen Aufzeichnungsmediums und eines Resists

Info

Publication number
DE602004009377D1
DE602004009377D1 DE602004009377T DE602004009377T DE602004009377D1 DE 602004009377 D1 DE602004009377 D1 DE 602004009377D1 DE 602004009377 T DE602004009377 T DE 602004009377T DE 602004009377 T DE602004009377 T DE 602004009377T DE 602004009377 D1 DE602004009377 D1 DE 602004009377D1
Authority
DE
Germany
Prior art keywords
manufacturing
recording medium
optical recording
resist
disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004009377T
Other languages
English (en)
Other versions
DE602004009377T2 (de
Inventor
Eiichi Ito
Eiji Ohno
Yuuko Kawaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE602004009377D1 publication Critical patent/DE602004009377D1/de
Application granted granted Critical
Publication of DE602004009377T2 publication Critical patent/DE602004009377T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/263—Preparing and using a stamper, e.g. pressing or injection molding substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE602004009377T 2003-08-26 2004-07-31 Verfahren zur Herstellung einer Masterplatte für ein optisches Aufzeichnungsmedium, Verfahren zur Herstellung eines Musters, einer Mutterplatte, einer Matrize, eines optischen Aufzeichnungsmediums und eines Resists Active DE602004009377T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003300853A JP4093938B2 (ja) 2003-08-26 2003-08-26 光情報記録媒体の原盤製造方法、パターン形成方法およびレジスト
JP2003300853 2003-08-26

Publications (2)

Publication Number Publication Date
DE602004009377D1 true DE602004009377D1 (de) 2007-11-22
DE602004009377T2 DE602004009377T2 (de) 2008-07-24

Family

ID=34101164

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004009377T Active DE602004009377T2 (de) 2003-08-26 2004-07-31 Verfahren zur Herstellung einer Masterplatte für ein optisches Aufzeichnungsmedium, Verfahren zur Herstellung eines Musters, einer Mutterplatte, einer Matrize, eines optischen Aufzeichnungsmediums und eines Resists

Country Status (8)

Country Link
US (1) US20050048248A1 (de)
EP (1) EP1511026B1 (de)
JP (1) JP4093938B2 (de)
KR (1) KR20050021313A (de)
CN (1) CN100345200C (de)
AT (1) ATE375592T1 (de)
DE (1) DE602004009377T2 (de)
TW (1) TW200511307A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008142895A (ja) * 2006-12-05 2008-06-26 Fujifilm Corp モールド構造体
CN102636965B (zh) * 2012-04-13 2013-12-11 中国科学院光电技术研究所 一种表面等离子体超分辨干法光刻方法
JP6883291B2 (ja) * 2015-08-24 2021-06-09 学校法人 関西大学 リソグラフィー用材料及びその製造方法、リソグラフィー用組成物、パターン形成方法、並びに、化合物、樹脂、及びこれらの精製方法
JP7102338B2 (ja) * 2016-04-28 2022-07-19 三菱瓦斯化学株式会社 光学部品形成組成物及びその硬化物

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0153904B1 (de) * 1984-02-10 1988-09-14 Ciba-Geigy Ag Verfahren zur Herstellung einer Schutzschicht oder einer Reliefabbildung
JPS6168296A (ja) * 1984-09-13 1986-04-08 Matsushita Electric Ind Co Ltd 光学情報記緑部材
US4603101A (en) * 1985-09-27 1986-07-29 General Electric Company Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials
JPS62234248A (ja) * 1986-04-04 1987-10-14 Ricoh Co Ltd 情報記録原盤の製造方法
US4761464A (en) * 1986-09-23 1988-08-02 Zeigler John M Interrupted polysilanes useful as photoresists
EP0423446B1 (de) * 1989-10-17 1998-03-04 Shipley Company Inc. Fotoresist für nahes U.V.
JP2957213B2 (ja) * 1989-12-21 1999-10-04 パイオニア株式会社 光ディスク製造方法
US5494943A (en) * 1993-06-16 1996-02-27 Minnesota Mining And Manufacturing Company Stabilized cationically-curable compositions
JP4068809B2 (ja) * 2001-02-01 2008-03-26 富士フイルム株式会社 光重合性組成物及び記録材料
JP2003123328A (ja) * 2001-10-16 2003-04-25 Hitachi Ltd スタンパの製造方法
JP4055543B2 (ja) * 2002-02-22 2008-03-05 ソニー株式会社 レジスト材料及び微細加工方法
US7887711B2 (en) * 2002-06-13 2011-02-15 International Business Machines Corporation Method for etching chemically inert metal oxides

Also Published As

Publication number Publication date
CN100345200C (zh) 2007-10-24
DE602004009377T2 (de) 2008-07-24
EP1511026A3 (de) 2006-07-12
EP1511026A2 (de) 2005-03-02
US20050048248A1 (en) 2005-03-03
JP2005071488A (ja) 2005-03-17
KR20050021313A (ko) 2005-03-07
JP4093938B2 (ja) 2008-06-04
TW200511307A (en) 2005-03-16
CN1591631A (zh) 2005-03-09
EP1511026B1 (de) 2007-10-10
ATE375592T1 (de) 2007-10-15

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Legal Events

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8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP