ATE408856T1 - Verfahren zur erzeugung einer flachdruckplatte - Google Patents
Verfahren zur erzeugung einer flachdruckplatteInfo
- Publication number
- ATE408856T1 ATE408856T1 AT01130267T AT01130267T ATE408856T1 AT E408856 T1 ATE408856 T1 AT E408856T1 AT 01130267 T AT01130267 T AT 01130267T AT 01130267 T AT01130267 T AT 01130267T AT E408856 T1 ATE408856 T1 AT E408856T1
- Authority
- AT
- Austria
- Prior art keywords
- plate
- printing plate
- lithographic printing
- producing
- plant
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G03F7/0217—Polyurethanes; Epoxy resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000394046A JP2002196505A (ja) | 2000-12-26 | 2000-12-26 | 平版印刷版の作成方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE408856T1 true ATE408856T1 (de) | 2008-10-15 |
Family
ID=18859736
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT01130267T ATE408856T1 (de) | 2000-12-26 | 2001-12-20 | Verfahren zur erzeugung einer flachdruckplatte |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1220041B1 (de) |
JP (1) | JP2002196505A (de) |
AT (1) | ATE408856T1 (de) |
DE (1) | DE60135823D1 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5586333B2 (ja) * | 2009-06-09 | 2014-09-10 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5854341A (ja) * | 1981-09-28 | 1983-03-31 | Fuji Photo Film Co Ltd | 現像方法および現像液 |
JPH0693116B2 (ja) * | 1986-01-21 | 1994-11-16 | 富士写真フイルム株式会社 | 感光性組成物 |
JP2542903B2 (ja) * | 1988-04-22 | 1996-10-09 | 富士写真フイルム株式会社 | 現像液組成物 |
-
2000
- 2000-12-26 JP JP2000394046A patent/JP2002196505A/ja active Pending
-
2001
- 2001-12-20 DE DE60135823T patent/DE60135823D1/de not_active Expired - Lifetime
- 2001-12-20 AT AT01130267T patent/ATE408856T1/de not_active IP Right Cessation
- 2001-12-20 EP EP01130267A patent/EP1220041B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1220041B1 (de) | 2008-09-17 |
JP2002196505A (ja) | 2002-07-12 |
DE60135823D1 (de) | 2008-10-30 |
EP1220041A3 (de) | 2003-01-22 |
EP1220041A2 (de) | 2002-07-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR0126234B1 (ko) | 미세 레지스트 패턴의 형성방법 | |
ATE544095T1 (de) | Verfahren zur herstellung einer druckplatte | |
US5110709A (en) | Light-sensitive positive working composition containing a pisolfone compound | |
ATE281932T1 (de) | Verfahren zur herstellung einer positiv arbeitenden lithographischen druckplatte | |
ATE407799T1 (de) | Verfahren zur herstellung lithographischer druckplatten | |
EP0720057A4 (de) | Lithographische druckform sowie verfahren zur herstellung einer druckplatte | |
ATE388821T1 (de) | Verfahren zur herstellung einer lithographischen druckplatte | |
ATE374114T1 (de) | Vorsensibilisierte platte zur herstellung einer lithographischen druckplatte und herstellungsverfahren einer lithographischen druckplatte damit | |
ATE486303T1 (de) | Verfahren zur verarbeitung von flachdruckplatten | |
TW200707104A (en) | Negative resist composition and resist pattern formation method | |
JPS5680046A (en) | Lithographic plate requiring no dampening water and its manufacture | |
ATE408856T1 (de) | Verfahren zur erzeugung einer flachdruckplatte | |
ATE378172T1 (de) | Verfahren zur herstellung einer lithographischen druckplatte | |
ES8308094A1 (es) | Un procedimiento para fabricar una plancha de impresion litografica revestida de un material fotosensible derivado de una resina diazoica. | |
EP1280006A3 (de) | Verfahren zur Herstellung einer Flachdruckplatte | |
ATE527581T1 (de) | Verfahren zur herstellung einer lithografiedruckform | |
EP1403716A3 (de) | Verfahren zum Entwickeln einer lithographischen Druckplatte | |
TW200504832A (en) | Developer for photosensitive composition and process for producing patterned resist film using thereof | |
KR960001894A (ko) | 레지스트 패턴의 형성방법과 그 방법에 쓰이는 산성 수용성 재료 조성물 | |
TW200518185A (en) | Measuring the effect of flare on line width | |
ATE275738T1 (de) | Verfahren zur erzeugung einer lithographischen druckplatte | |
KR960002243B1 (ko) | 광조사로 레지스트 마스크 패턴을 형성하는 방법 | |
ATE414935T1 (de) | Verfahren zur herstellung negativer, lithographischer druckplattenvorläufer | |
KR920005712B1 (ko) | 감광성 조성물 | |
TW200715068A (en) | Lithographic method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties | ||
REN | Ceased due to non-payment of the annual fee |