ATE486303T1 - Verfahren zur verarbeitung von flachdruckplatten - Google Patents
Verfahren zur verarbeitung von flachdruckplattenInfo
- Publication number
- ATE486303T1 ATE486303T1 AT05103879T AT05103879T ATE486303T1 AT E486303 T1 ATE486303 T1 AT E486303T1 AT 05103879 T AT05103879 T AT 05103879T AT 05103879 T AT05103879 T AT 05103879T AT E486303 T1 ATE486303 T1 AT E486303T1
- Authority
- AT
- Austria
- Prior art keywords
- printing plate
- printing plates
- processing plant
- plate printing
- light
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 239000002243 precursor Substances 0.000 abstract 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 230000031700 light absorption Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229920001451 polypropylene glycol Polymers 0.000 abstract 1
- 238000004062 sedimentation Methods 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05103879A EP1722275B1 (de) | 2005-05-10 | 2005-05-10 | Verfahren zur Verarbeitung von Flachdruckplatten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE486303T1 true ATE486303T1 (de) | 2010-11-15 |
Family
ID=36201383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT05103879T ATE486303T1 (de) | 2005-05-10 | 2005-05-10 | Verfahren zur verarbeitung von flachdruckplatten |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP1722275B1 (de) |
| AT (1) | ATE486303T1 (de) |
| DE (1) | DE602005024371D1 (de) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8445176B2 (en) | 2007-05-25 | 2013-05-21 | Agfa Graphics Nv | Lithographic printing plate precursor |
| EP2028548B1 (de) * | 2007-08-23 | 2010-03-24 | Eastman Kodak Company | Verarbeitung lithographischer Druckplatten mit einer Entwicklerlösung enthaltend ein hydrophiles Polymer |
| JP2012516380A (ja) * | 2009-01-28 | 2012-07-19 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | リソグラフツールの原位置(insitu)清浄化用配合物 |
| EP2735903B1 (de) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negativ arbeitende Lithografiedruckplattenvorläufer mit hochverzweigtem Bindemittelmaterial |
| US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| EP2778782B1 (de) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negativ arbeitende strahlungsempfindliche Elemente |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8628613D0 (en) | 1986-11-29 | 1987-01-07 | Horsell Graphic Ind Ltd | Developing fluid for lithographic plates |
| EP0279630B1 (de) * | 1987-02-16 | 1993-10-13 | Konica Corporation | Entwickler für lichtempfindliche lithographische Druckplatte, gemeinschaftlich verarbeitungsfähig für den Negativ-Typ und den Positiv-Typ und Entwicklerzusammensetzung für lichtempfindliches Material |
| DE69325043T2 (de) | 1992-02-07 | 2000-05-25 | Tadahiro Ohmi, Sendai | Lithographischer Entwickler und lithographisches Verfahren |
| DE69321627T2 (de) | 1992-02-10 | 1999-04-22 | Canon K.K., Tokio/Tokyo | Lithographisches Verfahren |
| CA2133982C (en) | 1992-04-23 | 2008-02-12 | Peter Besmer | Ligand for the c-kit receptor and methods of use thereof |
| US5635328A (en) * | 1993-08-21 | 1997-06-03 | Konica Corporation | Light-sensitive lithographic printing plate utilizing o-quinone diazide light-sensitive layer containing cyclic clathrate compound |
| DE4419166A1 (de) * | 1994-06-01 | 1995-12-07 | Hoechst Ag | Entwickler für Photoresistschichten |
| DE4445820A1 (de) | 1994-12-21 | 1996-06-27 | Hoechst Ag | Verfahren zum Entwickeln bestrahlter, strahlungsempfindlicher Aufzeichnungsmaterialien |
| EP0732628A1 (de) | 1995-03-07 | 1996-09-18 | Minnesota Mining And Manufacturing Company | Wässrig-alkalische Lösung zum Entwickeln von Flachdruckplatten |
| DE19845605A1 (de) | 1998-10-05 | 2000-04-06 | Agfa Gevaert Ag | Konzentrat und daraus hergestellter wäßriger Entwickler für bildmäßig bestrahlte Aufzeichnungsmaterialien |
| JP2002351094A (ja) | 2001-05-22 | 2002-12-04 | Fuji Photo Film Co Ltd | 現像液組成物及び画像形成方法 |
-
2005
- 2005-05-10 AT AT05103879T patent/ATE486303T1/de not_active IP Right Cessation
- 2005-05-10 EP EP05103879A patent/EP1722275B1/de not_active Expired - Lifetime
- 2005-05-10 DE DE602005024371T patent/DE602005024371D1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP1722275B1 (de) | 2010-10-27 |
| EP1722275A1 (de) | 2006-11-15 |
| DE602005024371D1 (de) | 2010-12-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |