ATE375592T1 - Verfahren zur herstellung einer masterplatte für ein optisches aufzeichnungsmedium, verfahren zur herstellung eines musters, einer mutterplatte, einer matrize, eines optischen aufzeichnungsmediums und eines resists - Google Patents

Verfahren zur herstellung einer masterplatte für ein optisches aufzeichnungsmedium, verfahren zur herstellung eines musters, einer mutterplatte, einer matrize, eines optischen aufzeichnungsmediums und eines resists

Info

Publication number
ATE375592T1
ATE375592T1 AT04018203T AT04018203T ATE375592T1 AT E375592 T1 ATE375592 T1 AT E375592T1 AT 04018203 T AT04018203 T AT 04018203T AT 04018203 T AT04018203 T AT 04018203T AT E375592 T1 ATE375592 T1 AT E375592T1
Authority
AT
Austria
Prior art keywords
recording medium
producing
optical recording
resist
resist layer
Prior art date
Application number
AT04018203T
Other languages
English (en)
Inventor
Eiichi Ito
Eiji Ohno
Yuuko Kawaguchi
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Ind Co Ltd filed Critical Matsushita Electric Ind Co Ltd
Application granted granted Critical
Publication of ATE375592T1 publication Critical patent/ATE375592T1/de

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/263—Preparing and using a stamper, e.g. pressing or injection molding substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
AT04018203T 2003-08-26 2004-07-31 Verfahren zur herstellung einer masterplatte für ein optisches aufzeichnungsmedium, verfahren zur herstellung eines musters, einer mutterplatte, einer matrize, eines optischen aufzeichnungsmediums und eines resists ATE375592T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003300853A JP4093938B2 (ja) 2003-08-26 2003-08-26 光情報記録媒体の原盤製造方法、パターン形成方法およびレジスト

Publications (1)

Publication Number Publication Date
ATE375592T1 true ATE375592T1 (de) 2007-10-15

Family

ID=34101164

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04018203T ATE375592T1 (de) 2003-08-26 2004-07-31 Verfahren zur herstellung einer masterplatte für ein optisches aufzeichnungsmedium, verfahren zur herstellung eines musters, einer mutterplatte, einer matrize, eines optischen aufzeichnungsmediums und eines resists

Country Status (8)

Country Link
US (1) US20050048248A1 (de)
EP (1) EP1511026B1 (de)
JP (1) JP4093938B2 (de)
KR (1) KR20050021313A (de)
CN (1) CN100345200C (de)
AT (1) ATE375592T1 (de)
DE (1) DE602004009377T2 (de)
TW (1) TW200511307A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008142895A (ja) * 2006-12-05 2008-06-26 Fujifilm Corp モールド構造体
CN102636965B (zh) * 2012-04-13 2013-12-11 中国科学院光电技术研究所 一种表面等离子体超分辨干法光刻方法
KR102599929B1 (ko) * 2015-08-24 2023-11-09 더 스쿨 코포레이션 칸사이 유니버시티 리소그래피용 재료 및 그 제조방법, 리소그래피용 조성물, 패턴 형성방법, 그리고, 화합물, 수지, 및 이들의 정제방법
CN109073782A (zh) * 2016-04-28 2018-12-21 三菱瓦斯化学株式会社 光学元件形成组合物及其固化物

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3565013D1 (en) * 1984-02-10 1988-10-20 Ciba Geigy Ag Process for the preparation of a protection layer or a relief pattern
JPS6168296A (ja) * 1984-09-13 1986-04-08 Matsushita Electric Ind Co Ltd 光学情報記緑部材
US4603101A (en) * 1985-09-27 1986-07-29 General Electric Company Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials
JPS62234248A (ja) * 1986-04-04 1987-10-14 Ricoh Co Ltd 情報記録原盤の製造方法
US4761464A (en) * 1986-09-23 1988-08-02 Zeigler John M Interrupted polysilanes useful as photoresists
EP0423446B1 (de) * 1989-10-17 1998-03-04 Shipley Company Inc. Fotoresist für nahes U.V.
JP2957213B2 (ja) * 1989-12-21 1999-10-04 パイオニア株式会社 光ディスク製造方法
US5494943A (en) * 1993-06-16 1996-02-27 Minnesota Mining And Manufacturing Company Stabilized cationically-curable compositions
JP4068809B2 (ja) * 2001-02-01 2008-03-26 富士フイルム株式会社 光重合性組成物及び記録材料
JP2003123328A (ja) * 2001-10-16 2003-04-25 Hitachi Ltd スタンパの製造方法
JP4055543B2 (ja) * 2002-02-22 2008-03-05 ソニー株式会社 レジスト材料及び微細加工方法
US7887711B2 (en) * 2002-06-13 2011-02-15 International Business Machines Corporation Method for etching chemically inert metal oxides

Also Published As

Publication number Publication date
CN100345200C (zh) 2007-10-24
EP1511026B1 (de) 2007-10-10
TW200511307A (en) 2005-03-16
EP1511026A2 (de) 2005-03-02
DE602004009377T2 (de) 2008-07-24
US20050048248A1 (en) 2005-03-03
CN1591631A (zh) 2005-03-09
KR20050021313A (ko) 2005-03-07
DE602004009377D1 (de) 2007-11-22
EP1511026A3 (de) 2006-07-12
JP4093938B2 (ja) 2008-06-04
JP2005071488A (ja) 2005-03-17

Similar Documents

Publication Publication Date Title
DE60334825D1 (de) Verfahren zur herstellung eines originals für optische datenträgerbenutzung und verfahren zur herstellung eines optischen datenträgers
ATE420769T1 (de) Verfahren zur herstellung einer microstruktur
DE602005009617D1 (de) Verfahren zur Herstellung lithographischer Druckplatten
ATE413631T1 (de) Verfahren zum kopieren eines modells
ATE533089T1 (de) Verfahren zur herstellung einer fotopolymer- druckplatte
ATE544095T1 (de) Verfahren zur herstellung einer druckplatte
TW200801801A (en) Process for producing patterned film and photosensitive resin composition
DE60130417D1 (de) Flachdruckplatte und Verfahren zur Herstellung
ATE426836T1 (de) Verfahren zur herstellung einer lithografiedruckform
DE69023586T2 (de) Verfahren zur Herstellung eines optischen Aufzeichnungsmediums von hoher Dichte.
DE60335120D1 (de) Zusammensetzung fur antireflexbeschichtungen und verfahren zur bildung einer struktur
ATE375592T1 (de) Verfahren zur herstellung einer masterplatte für ein optisches aufzeichnungsmedium, verfahren zur herstellung eines musters, einer mutterplatte, einer matrize, eines optischen aufzeichnungsmediums und eines resists
JP2010507182A5 (de)
ATE423378T1 (de) Matrize fuer optische platte, verfahren zur herstellung einer optischen platte, und optische platte
ATE517758T1 (de) Verfahren zur herstellung einer lithografiedruckform
ATE486303T1 (de) Verfahren zur verarbeitung von flachdruckplatten
ATE435487T1 (de) Verfahren zur herstellung eines prägestempels für optische informationsmedien, originalplatte eines solchen prägestempels
CN1562731A (zh) 基于旋涂的纳米复制方法
ATE521968T1 (de) Verfahren zur herstellung eines stempels zur herstellung eines optischen datenträgers und herstellungsverfahren für optische datenträger
ATE333367T1 (de) Verfahren zur herstellung einer flachdruckplatte
DE602004020709D1 (de) Verfahren zur Herstellung einer Matrize für optisches Informationsaufzeichnungsmedium
KR20060079638A (ko) Ｐａｇ및 ｔａｇ를 포함하는 화학증폭형 포토레지스트조성물 및 이를 이용한 반도체 소자의 미세 패턴 형성 방법
ATE257618T1 (de) Verfahren zur herstellung eines für ein matrizenherstellungsverfahren geeignetes substrats, sowie ein in diesem verfahren hergestelltes substrat
KR100588616B1 (ko) 전자빔을 이용한 나노 패턴 마스터 제작 방법
ATE408856T1 (de) Verfahren zur erzeugung einer flachdruckplatte

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties