DE60114678D1 - Fluorhaltiges Quarzglas und Verfahren zu seiner Herstellung - Google Patents

Fluorhaltiges Quarzglas und Verfahren zu seiner Herstellung

Info

Publication number
DE60114678D1
DE60114678D1 DE60114678T DE60114678T DE60114678D1 DE 60114678 D1 DE60114678 D1 DE 60114678D1 DE 60114678 T DE60114678 T DE 60114678T DE 60114678 T DE60114678 T DE 60114678T DE 60114678 D1 DE60114678 D1 DE 60114678D1
Authority
DE
Germany
Prior art keywords
fluorine
preparation
quartz glass
containing quartz
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60114678T
Other languages
English (en)
Other versions
DE60114678T2 (de
Inventor
Shigeru Maida
Motoyuki Yamada
Hisatoshi Otsuka
Kazuo Shirota
Koji Matsuo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of DE60114678D1 publication Critical patent/DE60114678D1/de
Application granted granted Critical
Publication of DE60114678T2 publication Critical patent/DE60114678T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/46—Gas-phase processes using silicon halides as starting materials fluorine containing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Compositions (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Melting And Manufacturing (AREA)
DE60114678T 2000-02-23 2001-02-23 Fluorhaltiges Quarzglas und Verfahren zu seiner Herstellung Expired - Lifetime DE60114678T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000045657 2000-02-23
JP2000045657 2000-02-23

Publications (2)

Publication Number Publication Date
DE60114678D1 true DE60114678D1 (de) 2005-12-15
DE60114678T2 DE60114678T2 (de) 2006-07-20

Family

ID=18568203

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60114678T Expired - Lifetime DE60114678T2 (de) 2000-02-23 2001-02-23 Fluorhaltiges Quarzglas und Verfahren zu seiner Herstellung

Country Status (3)

Country Link
US (1) US6990836B2 (de)
EP (1) EP1127857B8 (de)
DE (1) DE60114678T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3865039B2 (ja) 2000-08-18 2007-01-10 信越化学工業株式会社 合成石英ガラスの製造方法および合成石英ガラス並びに合成石英ガラス基板
US20040118155A1 (en) * 2002-12-20 2004-06-24 Brown John T Method of making ultra-dry, Cl-free and F-doped high purity fused silica
JP5202141B2 (ja) * 2008-07-07 2013-06-05 信越化学工業株式会社 チタニアドープ石英ガラス部材及びその製造方法
US9067814B2 (en) 2009-01-19 2015-06-30 Shin-Etsu Chemical Co., Ltd. Method of producing synthetic quartz glass for excimer laser
US9892943B2 (en) * 2013-07-12 2018-02-13 Shenzhen China Star Optoelectronics Technology Co., Ltd Method for laminating glass panels and vacuum lamination device using same
EP2977359B1 (de) * 2014-07-21 2016-10-19 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung von mit fluor dotiertem quarzglas
NL2019876B1 (en) 2017-10-20 2019-04-29 Corning Inc Optical fiber preforms with halogen doping
CN113354263B (zh) * 2021-07-03 2022-08-26 神光光学集团有限公司 一种生产合成石英玻璃的方法及设备

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2432478B1 (de) * 1978-07-31 1982-03-12 Quartz & Silice
US4345928A (en) * 1979-10-09 1982-08-24 Nippon Telegraph & Telephone Public Corporation Fabrication method of single-mode optical fiber preforms
JPS59232934A (ja) * 1983-06-17 1984-12-27 Sumitomo Electric Ind Ltd 光フアイバ母材の製造方法
JPS6086044A (ja) * 1983-10-19 1985-05-15 Sumitomo Electric Ind Ltd 光伝送用ガラス母材の製造方法
JPS6086039A (ja) * 1983-10-19 1985-05-15 Sumitomo Electric Ind Ltd 弗素含有シリカガラスの製造方法
US5221309A (en) * 1984-05-15 1993-06-22 Sumitomo Electric Industries, Ltd. Method for producing glass preform for optical fiber
JPS61247633A (ja) * 1985-04-25 1986-11-04 Sumitomo Electric Ind Ltd 光フアイバ−用ガラス母材の製造方法
JPS62297239A (ja) * 1986-06-17 1987-12-24 Sumitomo Electric Ind Ltd ガラス微粒子堆積体の製造方法
JPH0474728A (ja) * 1990-07-12 1992-03-10 Sumitomo Electric Ind Ltd 石英系光導波路の製造方法および装置
JP3206916B2 (ja) * 1990-11-28 2001-09-10 住友電気工業株式会社 欠陥濃度低減方法、紫外線透過用光学ガラスの製造方法及び紫外線透過用光学ガラス
US5326729A (en) 1992-02-07 1994-07-05 Asahi Glass Company Ltd. Transparent quartz glass and process for its production
CA2125508C (en) * 1993-06-16 2004-06-08 Shinji Ishikawa Process for producing glass preform for optical fiber
JP3579919B2 (ja) * 1994-06-06 2004-10-20 住友金属工業株式会社 光ファイバ用母材の製造方法
KR100298167B1 (ko) 1994-07-07 2001-10-24 오노 시게오 진공자외선파장대광선용실리카유리의제조방법,및그에의해제조된실리카유리및광학부재
DE19527451C2 (de) * 1995-07-27 1998-06-04 Heraeus Quarzglas Verfahren zur Herstellung eines Quarzglasrohlings und dafür geeigneter Brenner
US5879649A (en) * 1995-12-19 1999-03-09 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
JPH1067521A (ja) 1996-08-22 1998-03-10 Nikon Corp フッ素含有石英ガラス、その製造方法、及び投影露光装置
JPH11116248A (ja) * 1997-10-13 1999-04-27 Nikon Corp 合成石英ガラス部材
US6269663B1 (en) * 1998-03-05 2001-08-07 Alcatel Method of purifying silica and depositing on an optical fiber preform
US6376401B1 (en) * 1998-09-07 2002-04-23 Tosoh Corporation Ultraviolet ray-transparent optical glass material and method of producing same
US6499317B1 (en) 1998-10-28 2002-12-31 Asahi Glass Company, Limited Synthetic quartz glass and method for production thereof
US6265115B1 (en) * 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
JP2000264671A (ja) 1999-03-12 2000-09-26 Shin Etsu Chem Co Ltd 合成石英ガラス部材
JP3069562B1 (ja) 1999-10-19 2000-07-24 信越石英株式会社 エキシマレ―ザ及びエキシマランプ用のシリカガラス光学材料及びその製造方法
JP3228732B2 (ja) 1999-11-24 2001-11-12 信越石英株式会社 真空紫外線リソグラフィーに用いられる投影レンズ用シリカガラス光学材料の製造方法
US6541168B2 (en) * 2000-04-28 2003-04-01 Corning Incorporated Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
US6467313B1 (en) * 2000-06-09 2002-10-22 Corning Incorporated Method for controlling dopant profiles
JP3865039B2 (ja) * 2000-08-18 2007-01-10 信越化学工業株式会社 合成石英ガラスの製造方法および合成石英ガラス並びに合成石英ガラス基板

Also Published As

Publication number Publication date
EP1127857A2 (de) 2001-08-29
US6990836B2 (en) 2006-01-31
DE60114678T2 (de) 2006-07-20
EP1127857A3 (de) 2001-10-31
EP1127857B8 (de) 2006-05-03
US20010017042A1 (en) 2001-08-30
EP1127857B1 (de) 2005-11-09

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Legal Events

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8364 No opposition during term of opposition