DE60108874D1 - Resistzusammensetzung - Google Patents
ResistzusammensetzungInfo
- Publication number
- DE60108874D1 DE60108874D1 DE60108874T DE60108874T DE60108874D1 DE 60108874 D1 DE60108874 D1 DE 60108874D1 DE 60108874 T DE60108874 T DE 60108874T DE 60108874 T DE60108874 T DE 60108874T DE 60108874 D1 DE60108874 D1 DE 60108874D1
- Authority
- DE
- Germany
- Prior art keywords
- resist composition
- monomer
- acid
- monomer units
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
- C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/108—Polyolefin or halogen containing
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000176603 | 2000-06-13 | ||
JP2000176603 | 2000-06-13 | ||
PCT/JP2001/005033 WO2001096963A1 (fr) | 2000-06-13 | 2001-06-13 | Composition de resist |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60108874D1 true DE60108874D1 (de) | 2005-03-17 |
DE60108874T2 DE60108874T2 (de) | 2005-12-29 |
Family
ID=18678313
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60108874T Expired - Fee Related DE60108874T2 (de) | 2000-06-13 | 2001-06-13 | Resistzusammensetzung |
Country Status (7)
Country | Link |
---|---|
US (1) | US6733952B2 (de) |
EP (1) | EP1298491B1 (de) |
KR (1) | KR20030076226A (de) |
AT (1) | ATE289082T1 (de) |
AU (1) | AU2001264271A1 (de) |
DE (1) | DE60108874T2 (de) |
WO (1) | WO2001096963A1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6833230B2 (en) * | 2000-01-19 | 2004-12-21 | Samsung Electronics Co., Ltd. | Photosensitive polymers containing adamantylalkyl vinyl ether, and resist compositions including the same |
TW200404818A (en) * | 2002-08-21 | 2004-04-01 | Asahi Glass Co Ltd | Fluorine compounds, fluoropolymers, and process for production thereof |
JPWO2004042475A1 (ja) * | 2002-11-07 | 2006-03-09 | 旭硝子株式会社 | レジスト組成物 |
KR20050084631A (ko) * | 2002-11-07 | 2005-08-26 | 아사히 가라스 가부시키가이샤 | 함불소 폴리머 |
AU2003284574A1 (en) * | 2003-03-28 | 2004-10-25 | Asahi Glass Company, Limited | Fluoro compound and fluoropolymer |
CN1802603A (zh) | 2003-07-17 | 2006-07-12 | 霍尼韦尔国际公司 | 用于高级微电子应用的平面化薄膜及其生产装置和方法 |
JP2005097531A (ja) * | 2003-08-21 | 2005-04-14 | Asahi Glass Co Ltd | 含フッ素共重合体とその製造方法およびそれを含むレジスト組成物 |
FR2859110B1 (fr) | 2003-09-03 | 2006-04-07 | Salomon Sa | Systeme de ski de fond avec surface laterale d'appui direct |
JPWO2005042453A1 (ja) * | 2003-10-31 | 2007-11-29 | 旭硝子株式会社 | 含フッ素化合物、含フッ素ポリマーとその製造方法 |
WO2005108446A1 (ja) * | 2004-05-07 | 2005-11-17 | Asahi Glass Company, Limited | 含フッ素共重合体とその製造方法およびそれを含むレジスト組成物 |
WO2006011427A1 (ja) | 2004-07-30 | 2006-02-02 | Asahi Glass Company, Limited | 含フッ素化合物、含フッ素ポリマー、レジスト組成物、およびレジスト保護膜組成物 |
US20060249332A1 (en) * | 2005-05-06 | 2006-11-09 | General Electric Company | Oil supply and scavenge system |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US211417A (en) * | 1879-01-14 | Improvement in apparatus for cooling air | ||
JP3915870B2 (ja) * | 1999-08-25 | 2007-05-16 | 信越化学工業株式会社 | 高分子化合物、化学増幅レジスト材料及びパターン形成方法 |
JP3672780B2 (ja) * | 1999-11-29 | 2005-07-20 | セントラル硝子株式会社 | ポジ型レジスト組成物およびパターン形成方法 |
US6951705B2 (en) * | 2000-05-05 | 2005-10-04 | E. I. Du Pont De Nemours And Company | Polymers for photoresist compositions for microlithography |
-
2001
- 2001-06-13 AT AT01938643T patent/ATE289082T1/de not_active IP Right Cessation
- 2001-06-13 AU AU2001264271A patent/AU2001264271A1/en not_active Abandoned
- 2001-06-13 WO PCT/JP2001/005033 patent/WO2001096963A1/ja active IP Right Grant
- 2001-06-13 EP EP01938643A patent/EP1298491B1/de not_active Expired - Lifetime
- 2001-06-13 DE DE60108874T patent/DE60108874T2/de not_active Expired - Fee Related
- 2001-06-13 KR KR1020027016495A patent/KR20030076226A/ko not_active Application Discontinuation
-
2002
- 2002-12-12 US US10/316,877 patent/US6733952B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20030130409A1 (en) | 2003-07-10 |
ATE289082T1 (de) | 2005-02-15 |
WO2001096963A1 (fr) | 2001-12-20 |
EP1298491B1 (de) | 2005-02-09 |
KR20030076226A (ko) | 2003-09-26 |
AU2001264271A1 (en) | 2001-12-24 |
US6733952B2 (en) | 2004-05-11 |
EP1298491A4 (de) | 2004-06-16 |
EP1298491A1 (de) | 2003-04-02 |
DE60108874T2 (de) | 2005-12-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |