JPS54112627A - Resist composition - Google Patents
Resist compositionInfo
- Publication number
- JPS54112627A JPS54112627A JP1907878A JP1907878A JPS54112627A JP S54112627 A JPS54112627 A JP S54112627A JP 1907878 A JP1907878 A JP 1907878A JP 1907878 A JP1907878 A JP 1907878A JP S54112627 A JPS54112627 A JP S54112627A
- Authority
- JP
- Japan
- Prior art keywords
- far ultraviolet
- etching
- ultraviolet rays
- resist pattern
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
PURPOSE: To form a resist pattern resistant not only to wet etching but also to dry etching in far ultraviolet lithography, by introducing a C-Br bond in the side chain of methacrylic acid ester.
CONSTITUTION: A polymer of the formula in which R is a brominated alkyl and n is a polymerization degree, or a copolymer of this is dissolved in a proper solvent to form a negative type polymer resist composition having a sensitivity capable of sufficiently photopolymerizing by the far ultraviolet rays in the wavelength range of 1800 to 3000Å. This composition is coated and dried on a substrate, then irradiated by the far ultraviolet rays through a mask, and developed with a solvent, such as toluene. The resist pattern formed has a cross-linking structure containing bromine, a decomposition temp, ad high as 270°C, and resistance to ion plasma, and it can be used for ion etching and plasma etching, and has high sensitivity and high resolution.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1907878A JPS54112627A (en) | 1978-02-23 | 1978-02-23 | Resist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1907878A JPS54112627A (en) | 1978-02-23 | 1978-02-23 | Resist composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS54112627A true JPS54112627A (en) | 1979-09-03 |
Family
ID=11989395
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1907878A Pending JPS54112627A (en) | 1978-02-23 | 1978-02-23 | Resist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54112627A (en) |
-
1978
- 1978-02-23 JP JP1907878A patent/JPS54112627A/en active Pending
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