DE60042186D1 - Onssystems - Google Patents

Onssystems

Info

Publication number
DE60042186D1
DE60042186D1 DE60042186T DE60042186T DE60042186D1 DE 60042186 D1 DE60042186 D1 DE 60042186D1 DE 60042186 T DE60042186 T DE 60042186T DE 60042186 T DE60042186 T DE 60042186T DE 60042186 D1 DE60042186 D1 DE 60042186D1
Authority
DE
Germany
Prior art keywords
optical
birefringence
projection
optical system
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60042186T
Other languages
English (en)
Inventor
Hiroyuki Hiraiwa
Issey Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of DE60042186D1 publication Critical patent/DE60042186D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Medicines Containing Plant Substances (AREA)
  • Steroid Compounds (AREA)
  • Lenses (AREA)
DE60042186T 1999-01-06 2000-01-06 Onssystems Expired - Lifetime DE60042186D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP141699 1999-01-06
PCT/JP2000/000027 WO2000041226A1 (fr) 1999-01-06 2000-01-06 Systeme optique de projection, procede de fabrication associe et appareil d'exposition par projection utilisant ce systeme

Publications (1)

Publication Number Publication Date
DE60042186D1 true DE60042186D1 (de) 2009-06-25

Family

ID=11500877

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60042186T Expired - Lifetime DE60042186D1 (de) 1999-01-06 2000-01-06 Onssystems

Country Status (9)

Country Link
US (2) US6366404B1 (de)
EP (1) EP1063684B1 (de)
JP (1) JP4207389B2 (de)
KR (1) KR20010088279A (de)
CN (1) CN1293822A (de)
AT (1) ATE431619T1 (de)
AU (1) AU1891200A (de)
DE (1) DE60042186D1 (de)
WO (1) WO2000041226A1 (de)

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60042186D1 (de) * 1999-01-06 2009-06-25 Nikon Corp Onssystems
EP1129998B1 (de) * 1999-07-05 2012-03-21 Nikon Corporation Verfahren zur herstellung von quarzglasteilen
AU6321600A (en) 1999-08-12 2001-03-13 Nikon Corporation Method for preparation of synthetic vitreous silica and apparatus for heat treatment
US6710930B2 (en) 1999-12-01 2004-03-23 Nikon Corporation Illumination optical system and method of making exposure apparatus
DE10028434B4 (de) * 2000-06-14 2005-09-29 Ludwig Felser Stahlbausystem
KR100857931B1 (ko) * 2000-10-10 2008-09-09 가부시키가이샤 니콘 결상성능의 평가방법
DE10123725A1 (de) 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
JP2004526331A (ja) 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
US7239447B2 (en) 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
JP2003050349A (ja) * 2001-05-30 2003-02-21 Nikon Corp 光学系および該光学系を備えた露光装置
US6683710B2 (en) 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
EP1780570A3 (de) * 2001-06-01 2008-01-02 ASML Netherlands B.V. Kompensation der Doppelbrechung in kubisch kristallinen Projektionslinsen und optischen Systemen
TW558749B (en) * 2001-06-20 2003-10-21 Nikon Corp Optical system and the exposure device comprising the same
US20030011893A1 (en) * 2001-06-20 2003-01-16 Nikon Corporation Optical system and exposure apparatus equipped with the optical system
US6831731B2 (en) * 2001-06-28 2004-12-14 Nikon Corporation Projection optical system and an exposure apparatus with the projection optical system
JPWO2003003429A1 (ja) * 2001-06-28 2004-10-21 株式会社ニコン 投影光学系、露光装置および方法
TW584898B (en) * 2001-07-10 2004-04-21 Nikon Corp Optical system and exposure apparatus having the optical system
US6775063B2 (en) 2001-07-10 2004-08-10 Nikon Corporation Optical system and exposure apparatus having the optical system
US6788389B2 (en) * 2001-07-10 2004-09-07 Nikon Corporation Production method of projection optical system
TW571344B (en) * 2001-07-10 2004-01-11 Nikon Corp Manufacturing method for projection optic system
US6844915B2 (en) 2001-08-01 2005-01-18 Nikon Corporation Optical system and exposure apparatus provided with the optical system
JPWO2003023480A1 (ja) * 2001-09-07 2004-12-24 株式会社ニコン 光学系および該光学系を備えた露光装置、並びにデバイスの製造方法
TW554412B (en) * 2001-09-07 2003-09-21 Nikon Corp Optical system, projection optical system, exposure device having the projection optical system, and method for manufacturing micro device using the exposure device
TW559885B (en) * 2001-10-19 2003-11-01 Nikon Corp Projection optical system and exposure device having the projection optical system
US6970232B2 (en) 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US6844972B2 (en) 2001-10-30 2005-01-18 Mcguire, Jr. James P. Reducing aberration in optical systems comprising cubic crystalline optical elements
US7453641B2 (en) 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6995908B2 (en) 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
JP2003161882A (ja) * 2001-11-29 2003-06-06 Nikon Corp 投影光学系、露光装置および露光方法
DE10162796B4 (de) 2001-12-20 2007-10-31 Carl Zeiss Smt Ag Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren
JP2003297729A (ja) * 2002-04-03 2003-10-17 Nikon Corp 投影光学系、露光装置および露光方法
JP2003309059A (ja) * 2002-04-17 2003-10-31 Nikon Corp 投影光学系、その製造方法、露光装置および露光方法
JP4333078B2 (ja) * 2002-04-26 2009-09-16 株式会社ニコン 投影光学系、該投影光学系を備えた露光装置および該投影光学系を用いた露光方法並びにデバイス製造方法
US7154669B2 (en) * 2002-08-05 2006-12-26 Asml Holding N.V. Method and system for correction of intrinsic birefringence in UV microlithography
US7072102B2 (en) * 2002-08-22 2006-07-04 Asml Netherlands B.V. Methods for reducing polarization aberration in optical systems
AU2003298405A1 (en) 2002-09-03 2004-03-29 Carl Zeiss Smt Ag Optimization method for an objective with fluoride crystal lenses and objective with fluoride crystal lenses
TW200412617A (en) * 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
EP3226073A3 (de) * 2003-04-09 2017-10-11 Nikon Corporation Belichtungsverfahren und -vorrichtung sowie verfahren zur herstellung der vorrichtung
DE10317958B4 (de) * 2003-04-17 2005-09-08 Hilti Ag Vorrichtung zum Erzeugen und Projizieren von Lichtmarken
DE10324206A1 (de) * 2003-05-28 2004-12-23 Carl Zeiss Smt Ag Projektionsbelichtungsanlage
AU2003304216A1 (en) * 2003-06-18 2005-01-04 Carl Zeiss Smt Ag Projection lens and method for selection of optical materials in such a lens
TWI457712B (zh) 2003-10-28 2014-10-21 尼康股份有限公司 照明光學裝置、投影曝光裝置、曝光方法以及元件製造方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
US20070019179A1 (en) * 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
KR101099913B1 (ko) 2004-01-16 2011-12-29 칼 짜이스 에스엠티 게엠베하 편광변조 광학소자
US8270077B2 (en) * 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
TWI395068B (zh) * 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
TWI494972B (zh) 2004-02-06 2015-08-01 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
US7303841B2 (en) * 2004-03-26 2007-12-04 Taiwan Semiconductor Manufacturing Company Repair of photolithography masks by sub-wavelength artificial grating technology
JP4776891B2 (ja) * 2004-04-23 2011-09-21 キヤノン株式会社 照明光学系、露光装置、及びデバイス製造方法
US7324280B2 (en) * 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
US20090195876A1 (en) * 2005-01-05 2009-08-06 Carl Zeiss Smt Ag Method for describing a retardation distribution in a microlithographic projection exposure apparatus
TWI453795B (zh) * 2005-01-21 2014-09-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
JP2006279017A (ja) * 2005-03-02 2006-10-12 Canon Inc 露光装置及び方法、計測装置、並びに、デバイス製造方法
WO2009044834A1 (ja) * 2007-10-01 2009-04-09 Nikon Corporation 偏光補償光学系及びこの光学系に用いられる偏光補償光学素子
US20110037962A1 (en) * 2009-08-17 2011-02-17 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
US20110205519A1 (en) * 2010-02-25 2011-08-25 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
JP6024653B2 (ja) 2011-03-02 2016-11-16 株式会社ニコン 合成石英ガラスの熱処理装置、合成石英ガラスの熱処理方法、光学系の製造方法および露光装置の製造方法
CN110568727B (zh) * 2018-06-05 2021-07-02 上海微电子装备（集团）股份有限公司 一种曝光系统、曝光方法和光刻机

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0766108B2 (ja) * 1986-05-01 1995-07-19 オリンパス光学工業株式会社 偏光変化の補償法
US5325230A (en) * 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
US5303001A (en) * 1992-12-21 1994-04-12 Ultratech Stepper, Inc. Illumination system for half-field dyson stepper
US5702495A (en) * 1993-02-10 1997-12-30 Nikon Corporation Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
JP3083957B2 (ja) * 1994-06-16 2000-09-04 株式会社ニコン 光リソグラフィー用蛍石
JP3089955B2 (ja) * 1994-10-06 2000-09-18 株式会社ニコン 光リソグラフィー用光学部材及び投影光学系
US6087283A (en) * 1995-01-06 2000-07-11 Nikon Corporation Silica glass for photolithography
JPH09102454A (ja) * 1995-10-03 1997-04-15 Nikon Corp 投影露光装置
US6031238A (en) * 1996-07-02 2000-02-29 Heraeus Quarzglas Gmbh Projection aligner for integrated circuit fabrication
JP4014716B2 (ja) * 1997-06-24 2007-11-28 オリンパス株式会社 偏光補償光学系を有する光学系
JP3413067B2 (ja) * 1997-07-29 2003-06-03 キヤノン株式会社 投影光学系及びそれを用いた投影露光装置
DE19807120A1 (de) * 1998-02-20 1999-08-26 Zeiss Carl Fa Optisches System mit Polarisationskompensator
DE60042186D1 (de) * 1999-01-06 2009-06-25 Nikon Corp Onssystems

Also Published As

Publication number Publication date
EP1063684A4 (de) 2005-07-27
AU1891200A (en) 2000-07-24
JP4207389B2 (ja) 2009-01-14
US6583931B2 (en) 2003-06-24
ATE431619T1 (de) 2009-05-15
US20020085176A1 (en) 2002-07-04
EP1063684A1 (de) 2000-12-27
WO2000041226A1 (fr) 2000-07-13
CN1293822A (zh) 2001-05-02
US6366404B1 (en) 2002-04-02
KR20010088279A (ko) 2001-09-26
EP1063684B1 (de) 2009-05-13

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