DE60037753D1 - Sputtertarget, vorbereitungsverfahren dafür und filmherstellendes verfahren - Google Patents

Sputtertarget, vorbereitungsverfahren dafür und filmherstellendes verfahren

Info

Publication number
DE60037753D1
DE60037753D1 DE60037753T DE60037753T DE60037753D1 DE 60037753 D1 DE60037753 D1 DE 60037753D1 DE 60037753 T DE60037753 T DE 60037753T DE 60037753 T DE60037753 T DE 60037753T DE 60037753 D1 DE60037753 D1 DE 60037753D1
Authority
DE
Germany
Prior art keywords
film
sputtertarget
preparation
sputtering target
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60037753T
Other languages
English (en)
Other versions
DE60037753T2 (de
Inventor
Akira Mitsui
Hiroshi Ueda
Kouichi Kanda
Susumu Nakagama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Ceramics Co Ltd
Original Assignee
AGC Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AGC Ceramics Co Ltd filed Critical AGC Ceramics Co Ltd
Application granted granted Critical
Publication of DE60037753D1 publication Critical patent/DE60037753D1/de
Publication of DE60037753T2 publication Critical patent/DE60037753T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
    • C04B35/565—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
    • C04B35/573—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide obtained by reaction sintering or recrystallisation
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5093—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with elements other than metals or carbon
    • C04B41/5096—Silicon
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering
DE60037753T 1999-10-13 2000-10-12 Sputtertarget, verfahren für dessen herstellung und verfahren zum bilden eines films Expired - Lifetime DE60037753T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP29148099 1999-10-13
JP29148099 1999-10-13
PCT/JP2000/007088 WO2001027345A1 (fr) 1999-10-13 2000-10-12 Cible de pulverisation et son procede de preparation, et procede de formation de film

Publications (2)

Publication Number Publication Date
DE60037753D1 true DE60037753D1 (de) 2008-02-21
DE60037753T2 DE60037753T2 (de) 2009-01-15

Family

ID=17769434

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60037753T Expired - Lifetime DE60037753T2 (de) 1999-10-13 2000-10-12 Sputtertarget, verfahren für dessen herstellung und verfahren zum bilden eines films

Country Status (6)

Country Link
US (1) US6800182B2 (de)
EP (1) EP1251188B1 (de)
JP (1) JP4733890B2 (de)
AT (1) ATE383456T1 (de)
DE (1) DE60037753T2 (de)
WO (1) WO2001027345A1 (de)

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JP3960933B2 (ja) * 2003-03-18 2007-08-15 日本碍子株式会社 高熱伝導性放熱材及びその製造方法
JP4486838B2 (ja) * 2003-04-25 2010-06-23 旭硝子株式会社 酸化ケイ素膜の製造方法および光学多層膜の製造方法
JP4763962B2 (ja) * 2003-08-18 2011-08-31 株式会社東芝 酸化膜形成用スパッタリングターゲットとそれを用いた酸化膜の製造方法
CN1856591B (zh) * 2003-09-26 2010-12-08 株式会社东芝 溅射靶及使用其的Si氧化膜的制造方法
DE602005003228T2 (de) 2004-07-12 2008-08-28 Cardinal Cg Co., Eden Prairie Wartungsarme beschichtungen
US7537677B2 (en) * 2005-01-19 2009-05-26 Guardian Industries Corp. Method of making low-E coating using ceramic zinc inclusive target, and target used in same
US7597962B2 (en) * 2005-06-07 2009-10-06 Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) Coated article with IR reflecting layer and method of making same
JP4533815B2 (ja) * 2005-07-08 2010-09-01 株式会社東芝 スパッタリングターゲットとそれを用いた光学薄膜の製造方法
JP4692548B2 (ja) 2006-01-20 2011-06-01 住友金属鉱山株式会社 吸収型多層膜ｎｄフィルターおよびその製造方法
CA2648686C (en) 2006-04-11 2016-08-09 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US20070251819A1 (en) * 2006-05-01 2007-11-01 Kardokus Janine K Hollow cathode magnetron sputtering targets and methods of forming hollow cathode magnetron sputtering targets
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US8702919B2 (en) 2007-08-13 2014-04-22 Honeywell International Inc. Target designs and related methods for coupled target assemblies, methods of production and uses thereof
US7820309B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
US8409717B2 (en) 2008-04-21 2013-04-02 Guardian Industries Corp. Coated article with IR reflecting layer and method of making same
JP2011129631A (ja) 2009-12-16 2011-06-30 Showa Shell Sekiyu Kk Ｃｉｓ系薄膜太陽電池の製造方法
CN102181837A (zh) * 2011-04-20 2011-09-14 韶关市欧莱高新材料有限公司 一种Si-SiC靶材
EP3541762B1 (de) 2016-11-17 2022-03-02 Cardinal CG Company Statisch-dissipative beschichtungstechnologie
CN111320478B (zh) * 2020-03-27 2022-02-11 有研资源环境技术研究院(北京)有限公司 一种碳硅陶瓷靶材的制备方法

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US3951587A (en) * 1974-12-06 1976-04-20 Norton Company Silicon carbide diffusion furnace components
JPS5658967A (en) * 1979-10-19 1981-05-22 Matsushita Electric Ind Co Ltd Manufacture of thermal head
DE3170327D1 (en) * 1980-11-06 1985-06-05 Nat Res Dev Annealing process for a thin-film semiconductor device and obtained devices
JPS60221562A (ja) * 1984-04-17 1985-11-06 Matsushita Electric Ind Co Ltd 耐摩耗膜
JPS63113507A (ja) 1986-10-31 1988-05-18 Hitachi Ltd 光導波路およびその製造法
JPH064309B2 (ja) 1988-01-28 1994-01-19 日本板硝子株式会社 熱線反射透明板及びその製造方法
US5047131A (en) 1989-11-08 1991-09-10 The Boc Group, Inc. Method for coating substrates with silicon based compounds
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Also Published As

Publication number Publication date
JP4733890B2 (ja) 2011-07-27
EP1251188B1 (de) 2008-01-09
ATE383456T1 (de) 2008-01-15
EP1251188A4 (de) 2005-05-04
US20020117785A1 (en) 2002-08-29
DE60037753T2 (de) 2009-01-15
WO2001027345A1 (fr) 2001-04-19
EP1251188A1 (de) 2002-10-23
US6800182B2 (en) 2004-10-05

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Legal Events

Date Code Title Description
8381 Inventor (new situation)

Inventor name: MITSUI, AKIRA, YOKOHAMA-SHI, KANAGAWA, JP

Inventor name: UEDA, HIROSHI, TAKASAGO-SHI, HYOGO, JP

Inventor name: KANDA, KOUICHI, TAKASAGO-SHI, HYOGO, JP

Inventor name: NAKAGAMA, SUSUMU, TSU-SHI, MIE, JP

8364 No opposition during term of opposition