DE60036050D1 - Verfahren zur Herstellung einer akustischen Oberflächenwellenanordnung - Google Patents
Verfahren zur Herstellung einer akustischen OberflächenwellenanordnungInfo
- Publication number
- DE60036050D1 DE60036050D1 DE60036050T DE60036050T DE60036050D1 DE 60036050 D1 DE60036050 D1 DE 60036050D1 DE 60036050 T DE60036050 T DE 60036050T DE 60036050 T DE60036050 T DE 60036050T DE 60036050 D1 DE60036050 D1 DE 60036050D1
- Authority
- DE
- Germany
- Prior art keywords
- producing
- acoustic wave
- surface acoustic
- wave device
- wave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
- H03H3/10—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
- H03H9/14538—Formation
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/25—Constructional features of resonators using surface acoustic waves
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49004—Electrical device making including measuring or testing of device or component part
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49016—Antenna or wave energy "plumbing" making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49156—Manufacturing circuit on or in base with selective destruction of conductive paths
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14680099A JP3317274B2 (ja) | 1999-05-26 | 1999-05-26 | 弾性表面波装置及び弾性表面波装置の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE60036050D1 true DE60036050D1 (de) | 2007-10-04 |
Family
ID=15415826
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60036050T Expired - Lifetime DE60036050D1 (de) | 1999-05-26 | 2000-05-26 | Verfahren zur Herstellung einer akustischen Oberflächenwellenanordnung |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US6516503B1 (de) |
| EP (1) | EP1056202B8 (de) |
| JP (1) | JP3317274B2 (de) |
| KR (1) | KR100560067B1 (de) |
| CN (1) | CN1173467C (de) |
| DE (1) | DE60036050D1 (de) |
Families Citing this family (85)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3317274B2 (ja) * | 1999-05-26 | 2002-08-26 | 株式会社村田製作所 | 弾性表面波装置及び弾性表面波装置の製造方法 |
| JP3925133B2 (ja) * | 2000-12-26 | 2007-06-06 | 株式会社村田製作所 | 弾性表面波装置の製造方法及び弾性表面波装置 |
| JP3801083B2 (ja) * | 2001-06-06 | 2006-07-26 | 株式会社村田製作所 | 弾性表面波装置 |
| TWI315607B (en) * | 2001-10-29 | 2009-10-01 | Panasonic Corp | Surface acoustic wave filter element, surface acoustic wave filter and communication device using the same |
| JP4166997B2 (ja) * | 2002-03-29 | 2008-10-15 | 富士通メディアデバイス株式会社 | 弾性表面波素子の実装方法及び樹脂封止された弾性表面波素子を有する弾性表面波装置 |
| JP4259576B2 (ja) * | 2004-03-12 | 2009-04-30 | 株式会社村田製作所 | 分波器及び弾性表面波フィルタ |
| DE102004037819B4 (de) * | 2004-08-04 | 2021-12-16 | Snaptrack, Inc. | Elektroakustisches Bauelement mit geringen Verlusten |
| JP2007202087A (ja) * | 2005-05-11 | 2007-08-09 | Seiko Epson Corp | ラム波型高周波デバイス |
| JP2007110342A (ja) * | 2005-10-12 | 2007-04-26 | Kyocera Corp | 弾性表面波素子及びその製造方法 |
| JP4917396B2 (ja) | 2006-09-25 | 2012-04-18 | 太陽誘電株式会社 | フィルタおよび分波器 |
| JP4521451B2 (ja) * | 2008-03-24 | 2010-08-11 | 富士通メディアデバイス株式会社 | 弾性表面波デバイス及びその製造方法 |
| JP5339582B2 (ja) | 2008-07-31 | 2013-11-13 | 太陽誘電株式会社 | 弾性波デバイス |
| US8258674B2 (en) * | 2008-11-03 | 2012-09-04 | Viorel Olariu | Surface acoustic wave sensor and system |
| JP4841640B2 (ja) | 2009-03-25 | 2011-12-21 | 太陽誘電株式会社 | 弾性波デバイスおよびその製造方法 |
| CN104734662B (zh) * | 2009-04-22 | 2017-09-22 | 天工滤波方案日本有限公司 | 弹性波元件和使用它的电子设备 |
| CN101923657B (zh) * | 2010-08-11 | 2012-11-07 | 上海交通大学 | 具有数据纠错功能的声表面波射频标签及其纠错方法 |
| JP5766457B2 (ja) * | 2011-02-09 | 2015-08-19 | 太陽誘電株式会社 | 弾性波デバイス及びその製造方法 |
| JP5672050B2 (ja) * | 2011-02-21 | 2015-02-18 | 株式会社村田製作所 | 弾性表面波フィルタ装置 |
| DE112014003731B4 (de) * | 2013-08-14 | 2022-07-28 | Murata Manufacturing Co., Ltd. | Bauelement für elastische Oberflächenwellen und elektronische Komponente |
| US9634644B2 (en) * | 2014-07-28 | 2017-04-25 | Skyworks Filter Solutions Japan Co., Ltd. | Acoustic wave elements and antenna duplexers, and modules and electronic devices using same |
| US10305448B2 (en) | 2014-07-28 | 2019-05-28 | Skyworks Filter Solutions Japan Co., Ltd. | Acoustic wave elements, antenna duplexers, modules and electronic devices using the same |
| US9641151B2 (en) * | 2014-07-31 | 2017-05-02 | Skyworks Filter Solutions Japan Co., Ltd. | Elastic wave filters and duplexers using same |
| CN106664072A (zh) * | 2014-07-31 | 2017-05-10 | 天工滤波方案日本有限公司 | 声波滤波器和使用其的双工器 |
| WO2016117483A1 (ja) * | 2015-01-22 | 2016-07-28 | 株式会社村田製作所 | 弾性波装置の製造方法、および弾性波装置 |
| CN109075764B (zh) | 2016-04-25 | 2019-06-18 | 株式会社村田制作所 | 弹性波装置及其制造方法 |
| US10187039B2 (en) * | 2016-06-07 | 2019-01-22 | Skyworks Filter Solutions Japan Co., Ltd. | Filter devices having reduced spurious emissions from lamb waves |
| JP6493630B2 (ja) | 2016-08-30 | 2019-04-03 | 株式会社村田製作所 | 弾性波装置及びその製造方法 |
| WO2018070369A1 (ja) * | 2016-10-11 | 2018-04-19 | 京セラ株式会社 | 弾性波装置 |
| CN106656098B (zh) * | 2016-12-23 | 2020-11-24 | 无锡市好达电子有限公司 | 一种超大带宽声表面波滤波器 |
| CN110337783B (zh) * | 2017-02-28 | 2023-02-28 | 株式会社村田制作所 | 弹性波装置及其制造方法 |
| US11929731B2 (en) | 2018-02-18 | 2024-03-12 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator with optimized electrode mark, and pitch |
| US11323090B2 (en) | 2018-06-15 | 2022-05-03 | Resonant Inc. | Transversely-excited film bulk acoustic resonator using Y-X-cut lithium niobate for high power applications |
| US11323089B2 (en) | 2018-06-15 | 2022-05-03 | Resonant Inc. | Filter using piezoelectric film bonded to high resistivity silicon substrate with trap-rich layer |
| US20210328574A1 (en) | 2020-04-20 | 2021-10-21 | Resonant Inc. | Small transversely-excited film bulk acoustic resonators with enhanced q-factor |
| US11146232B2 (en) | 2018-06-15 | 2021-10-12 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with reduced spurious modes |
| US10756697B2 (en) | 2018-06-15 | 2020-08-25 | Resonant Inc. | Transversely-excited film bulk acoustic resonator |
| US10491192B1 (en) | 2018-06-15 | 2019-11-26 | Resonant Inc. | Transversely-excited film bulk acoustic resonator |
| US11323096B2 (en) | 2018-06-15 | 2022-05-03 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with periodic etched holes |
| US11509279B2 (en) | 2020-07-18 | 2022-11-22 | Resonant Inc. | Acoustic resonators and filters with reduced temperature coefficient of frequency |
| US20220116015A1 (en) | 2018-06-15 | 2022-04-14 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with optimized electrode thickness, mark, and pitch |
| US11936358B2 (en) | 2020-11-11 | 2024-03-19 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator with low thermal impedance |
| US10790802B2 (en) | 2018-06-15 | 2020-09-29 | Resonant Inc. | Transversely excited film bulk acoustic resonator using rotated Y-X cut lithium niobate |
| DE102018109974B3 (de) * | 2018-04-25 | 2019-09-12 | RF360 Europe GmbH | Elektroakustisches Filter, Multiplexer und Verfahren zur Herstellung eines elektroakustischen Filters |
| US10998877B2 (en) * | 2018-06-15 | 2021-05-04 | Resonant Inc. | Film bulk acoustic resonator fabrication method with frequency trimming based on electric measurements prior to cavity etch |
| US11909381B2 (en) | 2018-06-15 | 2024-02-20 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonators with two-layer electrodes having a narrower top layer |
| US11349452B2 (en) | 2018-06-15 | 2022-05-31 | Resonant Inc. | Transversely-excited film bulk acoustic filters with symmetric layout |
| US10868510B2 (en) | 2018-06-15 | 2020-12-15 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with half-lambda dielectric layer |
| US11996822B2 (en) | 2018-06-15 | 2024-05-28 | Murata Manufacturing Co., Ltd. | Wide bandwidth time division duplex transceiver |
| US11329628B2 (en) | 2020-06-17 | 2022-05-10 | Resonant Inc. | Filter using lithium niobate and lithium tantalate transversely-excited film bulk acoustic resonators |
| US11171629B2 (en) | 2018-06-15 | 2021-11-09 | Resonant Inc. | Transversely-excited film bulk acoustic resonator using pre-formed cavities |
| US11323095B2 (en) | 2018-06-15 | 2022-05-03 | Resonant Inc. | Rotation in XY plane to suppress spurious modes in XBAR devices |
| US11967945B2 (en) | 2018-06-15 | 2024-04-23 | Murata Manufacturing Co., Ltd. | Transversly-excited film bulk acoustic resonators and filters |
| US10826462B2 (en) | 2018-06-15 | 2020-11-03 | Resonant Inc. | Transversely-excited film bulk acoustic resonators with molybdenum conductors |
| US11264966B2 (en) | 2018-06-15 | 2022-03-01 | Resonant Inc. | Solidly-mounted transversely-excited film bulk acoustic resonator with diamond layers in Bragg reflector stack |
| US11876498B2 (en) | 2018-06-15 | 2024-01-16 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator with multiple diaphragm thicknesses and fabrication method |
| US11901878B2 (en) | 2018-06-15 | 2024-02-13 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonators with two-layer electrodes with a wider top layer |
| US11146238B2 (en) | 2018-06-15 | 2021-10-12 | Resonant Inc. | Film bulk acoustic resonator fabrication method |
| US11374549B2 (en) | 2018-06-15 | 2022-06-28 | Resonant Inc. | Filter using transversely-excited film bulk acoustic resonators with divided frequency-setting dielectric layers |
| US11949402B2 (en) | 2020-08-31 | 2024-04-02 | Murata Manufacturing Co., Ltd. | Resonators with different membrane thicknesses on the same die |
| US11228296B2 (en) | 2018-06-15 | 2022-01-18 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with a cavity having a curved perimeter |
| US11728785B2 (en) | 2018-06-15 | 2023-08-15 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator using pre-formed cavities |
| US11916539B2 (en) | 2020-02-28 | 2024-02-27 | Murata Manufacturing Co., Ltd. | Split-ladder band N77 filter using transversely-excited film bulk acoustic resonators |
| US11349450B2 (en) | 2018-06-15 | 2022-05-31 | Resonant Inc. | Symmetric transversely-excited film bulk acoustic resonators with reduced spurious modes |
| US11888463B2 (en) | 2018-06-15 | 2024-01-30 | Murata Manufacturing Co., Ltd. | Multi-port filter using transversely-excited film bulk acoustic resonators |
| US11201601B2 (en) | 2018-06-15 | 2021-12-14 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with multiple diaphragm thicknesses and fabrication method |
| US11323091B2 (en) | 2018-06-15 | 2022-05-03 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with diaphragm support pedestals |
| US11901873B2 (en) | 2019-03-14 | 2024-02-13 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator with partial BRAGG reflectors |
| CN110429917A (zh) * | 2019-08-09 | 2019-11-08 | 宜确半导体（苏州）有限公司 | 声表面波滤波器及其制造方法 |
| US20210273629A1 (en) | 2020-02-28 | 2021-09-02 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with multi-pitch interdigital transducer |
| US11811391B2 (en) | 2020-05-04 | 2023-11-07 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator with etched conductor patterns |
| US11469733B2 (en) | 2020-05-06 | 2022-10-11 | Resonant Inc. | Transversely-excited film bulk acoustic resonators with interdigital transducer configured to reduce diaphragm stress |
| US11817845B2 (en) | 2020-07-09 | 2023-11-14 | Murata Manufacturing Co., Ltd. | Method for making transversely-excited film bulk acoustic resonators with piezoelectric diaphragm supported by piezoelectric substrate |
| US11264969B1 (en) | 2020-08-06 | 2022-03-01 | Resonant Inc. | Transversely-excited film bulk acoustic resonator comprising small cells |
| US11671070B2 (en) | 2020-08-19 | 2023-06-06 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonators using multiple dielectric layer thicknesses to suppress spurious modes |
| US11271539B1 (en) | 2020-08-19 | 2022-03-08 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with tether-supported diaphragm |
| US11894835B2 (en) | 2020-09-21 | 2024-02-06 | Murata Manufacturing Co., Ltd. | Sandwiched XBAR for third harmonic operation |
| US11476834B2 (en) | 2020-10-05 | 2022-10-18 | Resonant Inc. | Transversely-excited film bulk acoustic resonator matrix filters with switches in parallel with sub-filter shunt capacitors |
| US11405017B2 (en) | 2020-10-05 | 2022-08-02 | Resonant Inc. | Acoustic matrix filters and radios using acoustic matrix filters |
| US11728784B2 (en) | 2020-10-05 | 2023-08-15 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator matrix filters with split die sub-filters |
| US11929733B2 (en) | 2020-10-05 | 2024-03-12 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator matrix filters with input and output impedances matched to radio frequency front end elements |
| US11658639B2 (en) | 2020-10-05 | 2023-05-23 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator matrix filters with noncontiguous passband |
| US11405020B2 (en) | 2020-11-26 | 2022-08-02 | Resonant Inc. | Transversely-excited film bulk acoustic resonators with structures to reduce acoustic energy leakage |
| US11239816B1 (en) | 2021-01-15 | 2022-02-01 | Resonant Inc. | Decoupled transversely-excited film bulk acoustic resonators |
| CN113810014A (zh) * | 2021-09-23 | 2021-12-17 | 武汉敏声新技术有限公司 | 叉指型体声波谐振器及滤波器 |
| TWI802380B (zh) * | 2022-04-21 | 2023-05-11 | 立積電子股份有限公司 | 聲波裝置及其製造方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4243960A (en) * | 1978-08-14 | 1981-01-06 | The United States Of America As Represented By The Secretary Of The Navy | Method and materials for tuning the center frequency of narrow-band surface-acoustic-wave (SAW) devices by means of dielectric overlays |
| US4442574A (en) * | 1982-07-26 | 1984-04-17 | General Electric Company | Frequency trimming of saw resonators |
| DE3650562T2 (de) * | 1985-04-11 | 1997-03-20 | Toyo Communication Equip | Piezoelektrischer resonator zur erzeugung von oberschwingungen |
| JPS6247206A (ja) * | 1985-08-27 | 1987-02-28 | Nec Corp | 弾性表面波多重モ−ドフイルタ |
| JPH0326013A (ja) | 1989-06-22 | 1991-02-04 | Murata Mfg Co Ltd | 弾性表面波フィルター |
| CA2038474C (en) * | 1990-03-19 | 1994-09-20 | Yoshio Satoh | Surface-acoustic-waver filter having a plurality of electrodes |
| JPH0590872A (ja) * | 1991-09-27 | 1993-04-09 | Sumitomo Electric Ind Ltd | 表面弾性波素子 |
| US5221870A (en) * | 1991-09-30 | 1993-06-22 | Sumitomo Electric Industries, Ltd. | Surface acoustic wave device |
| JP3163606B2 (ja) | 1993-01-29 | 2001-05-08 | 住友電気工業株式会社 | 表面弾性波素子 |
| WO1995002279A1 (en) | 1993-07-06 | 1995-01-19 | Motorola, Inc. | Surface acoustic wave device |
| US5815900A (en) * | 1995-03-06 | 1998-10-06 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing a surface acoustic wave module |
| JP3189719B2 (ja) | 1996-12-25 | 2001-07-16 | 株式会社村田製作所 | 弾性表面波装置の製造方法 |
| JPH10303680A (ja) * | 1997-04-25 | 1998-11-13 | Nec Corp | 弾性表面波フィルタ |
| JP3781435B2 (ja) * | 1997-05-08 | 2006-05-31 | 株式会社東芝 | 弾性境界波デバイス及びその製造方法 |
| JP3171144B2 (ja) * | 1997-07-07 | 2001-05-28 | 株式会社村田製作所 | 表面波装置 |
| JP3515131B2 (ja) * | 1997-07-28 | 2004-04-05 | 株式会社東芝 | 弾性表面波素子およびその製造方法 |
| JPH11163655A (ja) * | 1997-12-01 | 1999-06-18 | Murata Mfg Co Ltd | 弾性表面波装置の製造方法 |
| JP3317274B2 (ja) * | 1999-05-26 | 2002-08-26 | 株式会社村田製作所 | 弾性表面波装置及び弾性表面波装置の製造方法 |
-
1999
- 1999-05-26 JP JP14680099A patent/JP3317274B2/ja not_active Expired - Fee Related
-
2000
- 2000-05-18 KR KR1020000026668A patent/KR100560067B1/ko not_active IP Right Cessation
- 2000-05-19 US US09/574,794 patent/US6516503B1/en not_active Expired - Fee Related
- 2000-05-26 CN CNB001089986A patent/CN1173467C/zh not_active Expired - Fee Related
- 2000-05-26 EP EP00401484A patent/EP1056202B8/de not_active Expired - Lifetime
- 2000-05-26 DE DE60036050T patent/DE60036050D1/de not_active Expired - Lifetime
-
2002
- 2002-10-10 US US10/269,569 patent/US6710514B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP1056202B1 (de) | 2007-08-22 |
| KR20010029728A (ko) | 2001-04-16 |
| KR100560067B1 (ko) | 2006-03-13 |
| CN1173467C (zh) | 2004-10-27 |
| JP3317274B2 (ja) | 2002-08-26 |
| US6516503B1 (en) | 2003-02-11 |
| JP2000341068A (ja) | 2000-12-08 |
| EP1056202A3 (de) | 2003-03-26 |
| CN1278123A (zh) | 2000-12-27 |
| EP1056202B8 (de) | 2007-10-10 |
| US20030038562A1 (en) | 2003-02-27 |
| EP1056202A2 (de) | 2000-11-29 |
| US6710514B2 (en) | 2004-03-23 |
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