DE60032425D1 - Ätzvorrichtung - Google Patents

Ätzvorrichtung

Info

Publication number
DE60032425D1
DE60032425D1 DE60032425T DE60032425T DE60032425D1 DE 60032425 D1 DE60032425 D1 DE 60032425D1 DE 60032425 T DE60032425 T DE 60032425T DE 60032425 T DE60032425 T DE 60032425T DE 60032425 D1 DE60032425 D1 DE 60032425D1
Authority
DE
Germany
Prior art keywords
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60032425T
Other languages
English (en)
Other versions
DE60032425T2 (de
Inventor
Shigeharu Arisa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Seimitsu Co Ltd
Original Assignee
Tokyo Seimitsu Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Seimitsu Co Ltd filed Critical Tokyo Seimitsu Co Ltd
Application granted granted Critical
Publication of DE60032425D1 publication Critical patent/DE60032425D1/de
Publication of DE60032425T2 publication Critical patent/DE60032425T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Dicing (AREA)
DE60032425T 1999-08-19 2000-08-16 Ätzvorrichtung Expired - Fee Related DE60032425T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP23219099 1999-08-19
JP23219099A JP3348700B2 (ja) 1999-08-19 1999-08-19 エッチング装置

Publications (2)

Publication Number Publication Date
DE60032425D1 true DE60032425D1 (de) 2007-02-01
DE60032425T2 DE60032425T2 (de) 2007-04-19

Family

ID=16935413

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60032425T Expired - Fee Related DE60032425T2 (de) 1999-08-19 2000-08-16 Ätzvorrichtung

Country Status (4)

Country Link
US (1) US6569282B1 (de)
EP (1) EP1077472B1 (de)
JP (1) JP3348700B2 (de)
DE (1) DE60032425T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002343756A (ja) * 2001-05-21 2002-11-29 Tokyo Seimitsu Co Ltd ウェーハ平面加工装置
AT502233B1 (de) * 2001-06-07 2007-04-15 Thallner Erich Vorrichtung zum lösen eines trägers von einer halbleiterscheibe
JP2003007648A (ja) * 2001-06-18 2003-01-10 Disco Abrasive Syst Ltd 半導体ウェーハの分割システム
US20030230323A1 (en) * 2002-06-14 2003-12-18 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for improving scrubber cleaning
JP2005276987A (ja) * 2004-03-24 2005-10-06 Lintec Corp 極薄チップの製造プロセス及び製造装置
US7644512B1 (en) * 2006-01-18 2010-01-12 Akrion, Inc. Systems and methods for drying a rotating substrate
KR100876155B1 (ko) * 2006-11-28 2008-12-26 삼성전자주식회사 웨이퍼 보호테이프 커팅장치, 백 래핑설비 및 이를 사용한웨이퍼 보호테이프 커팅방법
JP4964107B2 (ja) * 2007-12-03 2012-06-27 東京応化工業株式会社 剥離装置
US8642448B2 (en) * 2010-06-22 2014-02-04 Applied Materials, Inc. Wafer dicing using femtosecond-based laser and plasma etch
US8703581B2 (en) * 2011-06-15 2014-04-22 Applied Materials, Inc. Water soluble mask for substrate dicing by laser and plasma etch
US8834662B2 (en) * 2012-03-22 2014-09-16 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method of separating wafer from carrier
JP6099118B2 (ja) * 2012-04-26 2017-03-22 Ｎｅｃエンジニアリング株式会社 シート貼付システム及びシート貼付方法
JP6166872B2 (ja) * 2012-07-27 2017-07-19 リンテック株式会社 シート貼付装置およびシート貼付方法
KR102559647B1 (ko) * 2016-08-12 2023-07-25 삼성디스플레이 주식회사 기판 연마 시스템 및 기판 연마 방법
KR101901139B1 (ko) * 2016-12-29 2018-09-21 주식회사 에스에프에이 냉각식 기판 이송장치 및 이를 구비하는 하향식 기판 에칭장치
DE102018109531A1 (de) * 2018-04-20 2019-10-24 Christian-Albrechts-Universität Zu Kiel Klebe-Fügevorrichtung sowie Klebe-Fügeverfahren für eine metallische Oberfläche
US11889742B2 (en) * 2020-11-04 2024-01-30 Samsung Display Co., Ltd. Apparatus of manufacturing display device and method of manufacturing display device

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2598305B2 (ja) * 1988-06-06 1997-04-09 日東電工株式会社 半導体ウエハの処理システム
JPH06302572A (ja) 1993-04-12 1994-10-28 Hitachi Ltd 半導体装置の製造方法及びテープ貼付剥離装置
US5474647A (en) * 1993-11-15 1995-12-12 Hughes Aircraft Company Wafer flow architecture for production wafer processing
US5590445A (en) * 1994-03-22 1997-01-07 Teikoku Seiki Kabushiki Kaisha Tape extension device for semiconductor producing apparatus and semiconductor producing apparatus with tape extension device
US5672239A (en) * 1995-05-10 1997-09-30 Tegal Corporation Integrated semiconductor wafer processing system
US5891298A (en) * 1995-08-31 1999-04-06 Nitto Denko Corporation Method and apparatus for peeling protective adhesive tape from semiconductor wafer
US6239038B1 (en) * 1995-10-13 2001-05-29 Ziying Wen Method for chemical processing semiconductor wafers
JPH09223680A (ja) 1996-02-16 1997-08-26 Disco Abrasive Syst Ltd エッチング機能付き研磨装置
JPH10163135A (ja) 1996-12-05 1998-06-19 Disco Abrasive Syst Ltd 半導体加工用シート及びそのシートを用いたダイシン グ方法並びに研磨方法
US6149758A (en) * 1997-06-20 2000-11-21 Lintec Corporation Sheet removing apparatus and method
US6218727B1 (en) * 1997-08-07 2001-04-17 Infineon Technologie Ag Wafer frame
JP3993918B2 (ja) * 1997-08-25 2007-10-17 富士通株式会社 半導体装置の製造方法
JP3888754B2 (ja) 1997-12-08 2007-03-07 日東電工株式会社 半導体ウエハの自動貼付け装置
JP3560823B2 (ja) * 1998-08-18 2004-09-02 リンテック株式会社 ウェハ転写装置

Also Published As

Publication number Publication date
EP1077472B1 (de) 2006-12-20
EP1077472A3 (de) 2006-01-18
DE60032425T2 (de) 2007-04-19
JP3348700B2 (ja) 2002-11-20
JP2001057357A (ja) 2001-02-27
EP1077472A2 (de) 2001-02-21
US6569282B1 (en) 2003-05-27

Similar Documents

Publication Publication Date Title
DE60142916D1 (de) Ätzverfahren
NO2010019I2 (no) 6-per-deoksy-6-per-(2-karboksetyl)tio-y-cyklodextrin
DE60038175D1 (de) Plasmaätzkammer
DE19983871T1 (de) Fönvorrichtung
DE10084676T1 (de) Einmallanzettvorrichtung
ATA51899A (de) Handstempel
ATE357433T1 (de) 4-pyrimidinyl-n-acyl-l-phenylanine
FI4231U1 (fi) Kotelo
DE60010160T2 (de) Albumblatt
ATE297895T1 (de) 4-pyridinyl-n-acyl-l-phenylalanine
DE59900683D1 (de) Plasmaätzanlage
DE60038153D1 (de) Fahzeugaufhängungen
DE60032862D1 (de) Laserätzverfahren
DE60032425D1 (de) Ätzvorrichtung
FI990089A (fi) Maalikoostumukset
DE50000805D1 (de) Aufsitzspanner
DE10085008T1 (de) Oberflächenbehandlungsdüse
DE19983890T1 (de) Ventiltaktgebungsjustiereinrichtung
DE10082008D2 (de) Ausbeulgerät
ATE269311T1 (de) Benzoylpyridazine
ATE440824T1 (de) Nitro-sulfobenzamide
ATA107599A (de) Heizwasserbereiter
DE10085167T1 (de) Gangumschalteinrichtung
DE29907427U1 (de) Etui
DE60006389D1 (de) Gasfeder

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee