DE60012865D1 - Entspiegelungsfilm, Verfahren zur Herstellung des Entspiegelungsfilms und Entspiegelungsglas - Google Patents

Entspiegelungsfilm, Verfahren zur Herstellung des Entspiegelungsfilms und Entspiegelungsglas

Info

Publication number
DE60012865D1
DE60012865D1 DE60012865T DE60012865T DE60012865D1 DE 60012865 D1 DE60012865 D1 DE 60012865D1 DE 60012865 T DE60012865 T DE 60012865T DE 60012865 T DE60012865 T DE 60012865T DE 60012865 D1 DE60012865 D1 DE 60012865D1
Authority
DE
Germany
Prior art keywords
reflective film
reflective
producing
glass
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60012865T
Other languages
English (en)
Other versions
DE60012865T2 (de
Inventor
Takakazu Nakada
Kenichi Motoyama
Rie Gunji
Makoto Wakabayashi
Hitoshi Furusho
Hiroyoshi Fukuro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of DE60012865D1 publication Critical patent/DE60012865D1/de
Application granted granted Critical
Publication of DE60012865T2 publication Critical patent/DE60012865T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31551Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31609Particulate metal or metal compound-containing
    • Y10T428/31612As silicone, silane or siloxane
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31652Of asbestos
    • Y10T428/31663As siloxane, silicone or silane
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31652Of asbestos
    • Y10T428/31667Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Silicon Polymers (AREA)
  • Paints Or Removers (AREA)
DE60012865T 1999-12-14 2000-12-05 Entspiegelungsfilm, Verfahren zur Herstellung des Entspiegelungsfilms und Entspiegelungsglas Expired - Lifetime DE60012865T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP35387099 1999-12-14
JP35387099 1999-12-14

Publications (2)

Publication Number Publication Date
DE60012865D1 true DE60012865D1 (de) 2004-09-16
DE60012865T2 DE60012865T2 (de) 2005-08-25

Family

ID=18433784

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60012865T Expired - Lifetime DE60012865T2 (de) 1999-12-14 2000-12-05 Entspiegelungsfilm, Verfahren zur Herstellung des Entspiegelungsfilms und Entspiegelungsglas

Country Status (6)

Country Link
US (1) US6472012B2 (de)
EP (1) EP1108692B1 (de)
JP (1) JP5019014B2 (de)
KR (1) KR100653585B1 (de)
DE (1) DE60012865T2 (de)
TW (1) TW468053B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103443750B (zh) * 2011-01-20 2017-02-15 日产化学工业株式会社 触摸屏用涂布组合物、涂膜及触摸屏

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CA2374944A1 (en) 1999-06-10 2000-12-21 Nigel Hacker Spin-on-glass anti-reflective coatings for photolithography
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
EP1391491B1 (de) * 2001-04-24 2008-04-09 Nissan Chemical Industries, Limited Verfahren zur herstellung eines dicken films auf basis von siliciumdioxid
AU2002227106A1 (en) 2001-11-15 2003-06-10 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
US20060074172A1 (en) * 2002-09-19 2006-04-06 Optimax Technology Corporation Antiglare and antireflection coatings of surface active nanoparticles
JP3879657B2 (ja) * 2002-11-20 2007-02-14 日東電工株式会社 反射防止層用硬化性樹脂組成物、反射防止層、反射防止フィルム、光学素子および画像表示装置
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
TW200530350A (en) * 2003-12-18 2005-09-16 Nissan Chemical Ind Ltd Water repellent coating film having low refractive index
US20070155897A1 (en) * 2003-12-19 2007-07-05 Nissan Chemical Industries Limited Coating film having low refractive index and large water contact angle
JP4449616B2 (ja) * 2004-07-21 2010-04-14 パナソニック株式会社 タッチパネル
JP2006257407A (ja) * 2005-02-16 2006-09-28 Fuji Photo Film Co Ltd 硬化性樹脂組成物、硬化膜、反射防止フィルム、偏光板、及び液晶表示装置
JP2007031697A (ja) * 2005-06-10 2007-02-08 Hitachi Chem Co Ltd 被アルカリ処理被膜形成用組成物、被アルカリ処理被膜及びその製造方法、積層体、反射防止膜、並びに電子部品
JP2007031696A (ja) * 2005-06-10 2007-02-08 Hitachi Chem Co Ltd 樹脂組成物、シリカ系被膜及びその製造方法、積層体、並びに、電子部品
US7550040B2 (en) * 2005-06-17 2009-06-23 Nissan Chemical Industries, Ltd. Coating fluid for forming film, and film thereof and film-forming process
JP2007119635A (ja) * 2005-10-28 2007-05-17 Ito Kogaku Kogyo Kk 塗料組成物
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
KR101021659B1 (ko) 2009-12-07 2011-03-17 주식회사 에이치와이티씨 태양전지 모듈용 글래스에 사용하기 위하여 광투과율을 증대시켜 주는 코팅액을 제조하는 방법과 이에 의하여 제조된 코팅액 조성물
US20110151222A1 (en) * 2009-12-22 2011-06-23 Agc Flat Glass North America, Inc. Anti-reflective coatings and methods of making the same
CN102858784B (zh) * 2010-02-04 2015-07-01 Lg化学株式会社 新的氟化化合物、包含该氟化化合物的组合物以及使用该组合物制备膜的方法
TW201300459A (zh) * 2011-03-10 2013-01-01 Dow Corning 用於抗反射塗層的聚矽烷矽氧烷(polysilanesiloxane)樹脂
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
KR101526650B1 (ko) 2012-11-21 2015-06-05 (주)엘지하우시스 광학특성이 우수한 반사방지 필름
KR101526649B1 (ko) * 2012-11-21 2015-06-05 (주)엘지하우시스 하드코팅층을 포함하는 광특성이 우수한 반사방지 필름
CN103978746B (zh) * 2014-05-06 2016-06-08 上海天马有机发光显示技术有限公司 一种膜及其制备方法、显示面板及显示装置
EP3194502A4 (de) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen
US11168226B2 (en) * 2017-03-31 2021-11-09 Sumitomo Chemical Company, Limited Composition
JP6805966B2 (ja) * 2017-05-24 2020-12-23 Agc株式会社 カバー部材、カバー部材の製造方法および表示装置
CN108893054B (zh) * 2018-07-17 2020-10-23 中国南玻集团股份有限公司 玻璃易洁液及其制备方法、易洁玻璃及其制备方法与应用

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JPH0688902A (ja) * 1993-02-03 1994-03-29 Seiko Epson Corp 無機コート膜を有する光学物品及びその表面改質方法
US5800925A (en) 1995-03-07 1998-09-01 Agency Of Industrial Science & Technology Nonlinear optical materials and process for producing the same
JP3433845B2 (ja) * 1994-08-02 2003-08-04 尾池工業株式会社 耐擦傷性と耐久性に優れた反射防止フィルム
JP3635692B2 (ja) * 1994-10-20 2005-04-06 日産化学工業株式会社 低屈折率反射防止膜
EP1304366B2 (de) * 1995-03-20 2012-10-03 Toto Ltd. Verwendung einer photokatalytisch superhydrophil gemachten Oberfläche mit beschlaghindernder Wirkung
JP2865065B2 (ja) * 1995-06-14 1999-03-08 東陶機器株式会社 親水性表面を備えた複合材
JP3424876B2 (ja) * 1995-07-04 2003-07-07 松下電器産業株式会社 画像表示装置及びその製造方法
TW376408B (en) 1995-12-01 1999-12-11 Nissan Chemical Ind Ltd Coating film having water repellency and low refractive index
JP4032185B2 (ja) 1995-12-01 2008-01-16 日産化学工業株式会社 低屈折率及び撥水性を有する被膜
JPH09231821A (ja) * 1995-12-22 1997-09-05 Toto Ltd 照明器具及び照度維持方法
TW397927B (en) 1996-02-16 2000-07-11 Nissan Chemical Ind Ltd Process for forming a liquid crystal alignment film
JPH09278431A (ja) * 1996-04-18 1997-10-28 Central Glass Co Ltd 親水性膜およびその製造方法
JPH10259037A (ja) 1997-03-19 1998-09-29 Central Glass Co Ltd 撥水性被膜およびその形成法
JPH11147277A (ja) * 1997-11-18 1999-06-02 Ichikoh Ind Ltd 親水性被膜形成基材及びその製造方法
US6271326B1 (en) 1998-04-30 2001-08-07 Jsr Corporation Olefin polymer, process for manufacturing the same, curable resin composition, and antireflection coating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103443750B (zh) * 2011-01-20 2017-02-15 日产化学工业株式会社 触摸屏用涂布组合物、涂膜及触摸屏

Also Published As

Publication number Publication date
KR20010070303A (ko) 2001-07-25
JP5019014B2 (ja) 2012-09-05
KR100653585B1 (ko) 2006-12-04
EP1108692A1 (de) 2001-06-20
US20010012565A1 (en) 2001-08-09
EP1108692B1 (de) 2004-08-11
US6472012B2 (en) 2002-10-29
DE60012865T2 (de) 2005-08-25
JP2001235604A (ja) 2001-08-31
TW468053B (en) 2001-12-11

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