DE4042337C1 - Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them - Google Patents

Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them

Info

Publication number
DE4042337C1
DE4042337C1 DE4042337A DE4042337A DE4042337C1 DE 4042337 C1 DE4042337 C1 DE 4042337C1 DE 4042337 A DE4042337 A DE 4042337A DE 4042337 A DE4042337 A DE 4042337A DE 4042337 C1 DE4042337 C1 DE 4042337C1
Authority
DE
Germany
Prior art keywords
cathode
anode
degree
ionization
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE4042337A
Other languages
German (de)
English (en)
Inventor
Horst Dipl.-Phys. Dr. 4270 Dorsten De Ehrich
Brunhilde Dipl.-Phys. 4300 Essen De Hasse
Michael Dipl.-Phys. 4600 Dortmund De Mausbach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plasco Dr Ehrich Plasma-Coating 6501 Heidesheim De GmbH
Original Assignee
Plasco Dr Ehrich Plasma-Coating 6501 Heidesheim De GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasco Dr Ehrich Plasma-Coating 6501 Heidesheim De GmbH filed Critical Plasco Dr Ehrich Plasma-Coating 6501 Heidesheim De GmbH
Priority to DE4042337A priority Critical patent/DE4042337C1/de
Priority to DE4026494A priority patent/DE4026494A1/de
Priority to PCT/EP1991/001446 priority patent/WO1992003841A2/de
Priority to AU82911/91A priority patent/AU8291191A/en
Application granted granted Critical
Publication of DE4042337C1 publication Critical patent/DE4042337C1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE4042337A 1990-08-22 1990-08-22 Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them Expired - Lifetime DE4042337C1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE4042337A DE4042337C1 (en) 1990-08-22 1990-08-22 Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them
DE4026494A DE4026494A1 (de) 1990-08-22 1990-08-22 Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren
PCT/EP1991/001446 WO1992003841A2 (de) 1990-08-22 1991-08-01 Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren
AU82911/91A AU8291191A (en) 1990-08-22 1991-08-01 Device for evaporating material by means of a vacuum arc discharge and process

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4042337A DE4042337C1 (en) 1990-08-22 1990-08-22 Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them
DE4026494A DE4026494A1 (de) 1990-08-22 1990-08-22 Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren

Publications (1)

Publication Number Publication Date
DE4042337C1 true DE4042337C1 (en) 1991-09-12

Family

ID=39523631

Family Applications (2)

Application Number Title Priority Date Filing Date
DE4042337A Expired - Lifetime DE4042337C1 (en) 1990-08-22 1990-08-22 Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them
DE4026494A Granted DE4026494A1 (de) 1990-08-22 1990-08-22 Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE4026494A Granted DE4026494A1 (de) 1990-08-22 1990-08-22 Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren

Country Status (3)

Country Link
AU (1) AU8291191A (enrdf_load_stackoverflow)
DE (2) DE4042337C1 (enrdf_load_stackoverflow)
WO (1) WO1992003841A2 (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4203371C1 (enrdf_load_stackoverflow) * 1992-02-06 1993-02-25 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De
DE4223091C1 (en) * 1992-07-14 1993-07-01 Vtd-Vakuumtechnik Dresden Gmbh, O-8017 Dresden, De Water cooled holder for inserted exchangeable target - comprises housing, cooling plate and axially freely movable metal bellows, vacuum arc discharge vapour deposition appts.
WO1993014240A1 (de) * 1992-01-10 1993-07-22 Plasco Dr. Ehrich Plasma-Coating Gmbh Verfahren zur ionisation thermisch erzeugter materialdämpfe und vorrichtung zur durchführung des verfahrens
DE19600993A1 (de) * 1995-01-13 1996-08-08 Technics Plasma Gmbh Vorrichtung und Verfahren zur anodischen Verdampfung eines Materials mittels einer Vakuumlichtbogenentladung
DE102020124270A1 (de) 2020-09-17 2022-03-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Verfahren und Vorrichtung zur anodischen Bogenverdampfung

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4409761B4 (de) * 1994-03-22 2007-12-27 Vtd Vakuumtechnik Dresden Gmbh Einrichtung zur plasmagestützten Verdampfung in einem Bogenentladungsplasma
DE4444763C2 (de) * 1994-12-19 1996-11-21 Apvv Angewandte Plasma Vakuum Elektrode zur Materialverdampfung für die Beschichtung von Substraten
DE19521419C2 (de) * 1995-06-14 1997-11-27 Plasma Applikation Mbh Ges Verdampfereinheit zur Verdampfung von Materialien im elektrischen Vakuumbogen
US6223683B1 (en) 1997-03-14 2001-05-01 The Coca-Cola Company Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating
US6251233B1 (en) 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
ES2208203T3 (es) * 1999-11-17 2004-06-16 APPLIED FILMS GMBH & CO. KG Disposicion de electrodos.
US6720052B1 (en) 2000-08-24 2004-04-13 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US6740378B1 (en) 2000-08-24 2004-05-25 The Coca-Cola Company Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same
US6599584B2 (en) 2001-04-27 2003-07-29 The Coca-Cola Company Barrier coated plastic containers and coating methods therefor
US20030194563A1 (en) 2002-04-15 2003-10-16 Yu Shi Coating composition containing an epoxide additive and structures coated therewith

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1496697A (fr) * 1965-10-20 1967-09-29 Gen Precision Inc Appareil de revêtement de la surface d'un substrat
US3562141A (en) * 1968-02-23 1971-02-09 John R Morley Vacuum vapor deposition utilizing low voltage electron beam
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US4197157A (en) * 1975-03-19 1980-04-08 Arthur D. Little, Inc. Method for forming refractory tubing
DE3234100C2 (de) * 1982-09-17 1985-04-11 Gennadij Vasil'evič Ključko Plasmalichtbogeneinrichtung zum Auftragen von Überzügen
DE3413891C2 (de) * 1984-04-12 1987-01-08 Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich Verfahren und Vorrichtung zur Materialverdampfung in einem Vakuumbehälter

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1982002906A1 (en) * 1981-02-23 1982-09-02 Leonid Pavlovich Sablev Consumable cathode for electric-arc evaporator of metal
DE3239131A1 (de) * 1982-10-22 1984-04-26 Ulrich 8950 Kaufbeuren Goetz Verfahren zur thermischen verdampfung von metallen im vakuum
DE8703520U1 (de) * 1987-02-03 1987-10-01 Balzers Hochvakuum GmbH, 65205 Wiesbaden Von einem Begrenzungsring mit elektrisch leitender Oberfläche umgebene Kathode für eine Lichtbogenentladung
DE3829260A1 (de) * 1988-08-29 1990-03-01 Multi Arc Gmbh Plasmabeschichtungskammer mit entfernbarem schutzschirm
JPH06149358A (ja) * 1992-11-13 1994-05-27 Matsushita Electric Works Ltd 移動ロボット

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1496697A (fr) * 1965-10-20 1967-09-29 Gen Precision Inc Appareil de revêtement de la surface d'un substrat
US3562141A (en) * 1968-02-23 1971-02-09 John R Morley Vacuum vapor deposition utilizing low voltage electron beam
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US4197157A (en) * 1975-03-19 1980-04-08 Arthur D. Little, Inc. Method for forming refractory tubing
DE3234100C2 (de) * 1982-09-17 1985-04-11 Gennadij Vasil'evič Ključko Plasmalichtbogeneinrichtung zum Auftragen von Überzügen
DE3413891C2 (de) * 1984-04-12 1987-01-08 Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich Verfahren und Vorrichtung zur Materialverdampfung in einem Vakuumbehälter

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
DE-Z.: Vakuum-Technik 37, 1988, S. 176 *
SU-Z.: Soviet Phys. Letters 5, 1979, No. 8, S. 418 *
US-Z.: J. Vac. Sci. Technol. A(6), 1988, No. 1, S. 134 *
US-Z.: J. Vac. Sci. Technol. A(6), 1988, No. 4, S. 2499 *
US-Z.: J. Vac. Sci. Technol. A(7), 1989, No. 3, S. 2339 *
US-Z.: J. Vac. Sci. Technol. A(8), 1990, No. 3, S. 2160 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993014240A1 (de) * 1992-01-10 1993-07-22 Plasco Dr. Ehrich Plasma-Coating Gmbh Verfahren zur ionisation thermisch erzeugter materialdämpfe und vorrichtung zur durchführung des verfahrens
DE4203371C1 (enrdf_load_stackoverflow) * 1992-02-06 1993-02-25 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De
DE4223091C1 (en) * 1992-07-14 1993-07-01 Vtd-Vakuumtechnik Dresden Gmbh, O-8017 Dresden, De Water cooled holder for inserted exchangeable target - comprises housing, cooling plate and axially freely movable metal bellows, vacuum arc discharge vapour deposition appts.
DE19600993A1 (de) * 1995-01-13 1996-08-08 Technics Plasma Gmbh Vorrichtung und Verfahren zur anodischen Verdampfung eines Materials mittels einer Vakuumlichtbogenentladung
DE102020124270A1 (de) 2020-09-17 2022-03-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Verfahren und Vorrichtung zur anodischen Bogenverdampfung

Also Published As

Publication number Publication date
WO1992003841A3 (de) 1992-04-16
AU8291191A (en) 1992-03-17
WO1992003841A2 (de) 1992-03-05
DE4026494A1 (de) 1992-02-27
DE4026494C2 (enrdf_load_stackoverflow) 1992-05-21

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