DE3900593C2 - - Google Patents
Info
- Publication number
- DE3900593C2 DE3900593C2 DE3900593A DE3900593A DE3900593C2 DE 3900593 C2 DE3900593 C2 DE 3900593C2 DE 3900593 A DE3900593 A DE 3900593A DE 3900593 A DE3900593 A DE 3900593A DE 3900593 C2 DE3900593 C2 DE 3900593C2
- Authority
- DE
- Germany
- Prior art keywords
- cathode
- component
- anode
- electrolysis device
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 54
- 238000005868 electrolysis reaction Methods 0.000 claims description 39
- 239000000843 powder Substances 0.000 claims description 26
- 239000011261 inert gas Substances 0.000 claims description 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 11
- 230000001681 protective effect Effects 0.000 claims description 10
- 238000009413 insulation Methods 0.000 claims description 8
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 5
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 229910052681 coesite Inorganic materials 0.000 claims description 3
- 229910052906 cristobalite Inorganic materials 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 229910052682 stishovite Inorganic materials 0.000 claims description 3
- 229910052905 tridymite Inorganic materials 0.000 claims description 3
- 239000012535 impurity Substances 0.000 description 15
- 229910052783 alkali metal Inorganic materials 0.000 description 11
- 150000001340 alkali metals Chemical class 0.000 description 11
- 239000000356 contaminant Substances 0.000 description 7
- 239000012774 insulation material Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 239000011449 brick Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000007664 blowing Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000004031 devitrification Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011034 rock crystal Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 241000530268 Lycaena heteronea Species 0.000 description 1
- 239000006004 Quartz sand Substances 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011231 conductive filler Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910021488 crystalline silicon dioxide Inorganic materials 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000005188 flotation Methods 0.000 description 1
- 238000007499 fusion processing Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/009—Poling glass
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Silicon Compounds (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB8900635A GB2227026B (en) | 1989-01-12 | 1989-01-12 | Electrolysis apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE3900593A1 DE3900593A1 (de) | 1990-07-12 |
| DE3900593C2 true DE3900593C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-08-12 |
| DE3900593C3 DE3900593C3 (de) | 1998-11-12 |
Family
ID=10649924
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3900593A Expired - Fee Related DE3900593C3 (de) | 1989-01-12 | 1989-01-11 | Elektrolysevorrichtung |
Country Status (4)
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5242563A (en) * | 1992-03-12 | 1993-09-07 | The United States Of America As Represented By The Secretary Of The Navy | Molten salt reactor for potentiostatic electroplating |
| JPH0967138A (ja) * | 1995-06-22 | 1997-03-11 | Toshiba Corp | 半導体製造用石英及びその製造装置並びに製造方法 |
| US5628887A (en) * | 1996-04-15 | 1997-05-13 | Patterson; James A. | Electrolytic system and cell |
| FR2782077B1 (fr) * | 1998-08-04 | 2001-11-30 | Cerdec France Sa | Procede de reduction de collage a chaud dans des processus de moulage, et dispositif pour la mise en oeuvre de ce procede |
| US12042432B1 (en) | 2024-01-11 | 2024-07-23 | Michael Reynard | Method and device for the treatment of glaucoma |
| US12274640B1 (en) | 2024-11-08 | 2025-04-15 | Michael Reynard | Implant for electrolysis of aqueous humor |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR533753A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1922-03-10 | |||
| US1299947A (en) * | 1917-10-30 | 1919-04-08 | Norsk Hydro Elektrisk | Electrolysis of fused electrolytes. |
| GB616451A (en) * | 1945-09-15 | 1949-01-21 | Saint Gobain | Improvements in or relating to the manufacture of glass |
| DE1011594B (de) * | 1955-03-05 | 1957-07-04 | Quartz & Silice Soc | Verfahren zur Herstellung von Quarzglas |
| US2952591A (en) * | 1959-02-26 | 1960-09-13 | Union Carbide Corp | Electrolytic preparation of calcium carbide |
| DE1114614B (de) * | 1960-04-11 | 1961-10-05 | Der Gerresheimer Glashuettenwe | Verfahren und Vorrichtung zur Erhoehung der Festigkeit von Gegenstaenden aus Glas und anderen elektrisch nichtleitenden Stoffen |
| US3440153A (en) * | 1964-04-24 | 1969-04-22 | United Aircraft Corp | Electrolytic method of producing highly oriented crystalline structures |
| BE674212A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1964-12-23 | |||
| CH426279A (fr) * | 1965-06-15 | 1966-12-15 | Fiduciaire Generale S A | Cellule électrolytique pour la fabrication de silicium |
| GB1266862A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1968-05-14 | 1972-03-15 | ||
| GB1290856A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1969-06-09 | 1972-09-27 | ||
| US3811855A (en) * | 1972-10-10 | 1974-05-21 | Rca Corp | Method of treating a glass body to provide an ion-depleted region therein |
| US3879183A (en) * | 1973-08-15 | 1975-04-22 | Rca Corp | Corona discharge method of depleting mobile ions from a glass region |
| JPS5611329A (en) * | 1979-07-09 | 1981-02-04 | Nippon Kokan Kk <Nkk> | Measuring method of melted metal temperature in vessel |
| GB8427915D0 (en) * | 1984-11-05 | 1984-12-12 | Tsl Thermal Syndicate Plc | Vitreous silica products |
| GB8624561D0 (en) * | 1986-10-14 | 1986-11-19 | British Petroleum Co Plc | Separation process |
| JPH06104577B2 (ja) * | 1987-07-14 | 1994-12-21 | 東芝セラミックス株式会社 | 電解装置 |
-
1988
- 1988-12-29 US US07/291,592 patent/US5076902A/en not_active Expired - Lifetime
-
1989
- 1989-01-11 DE DE3900593A patent/DE3900593C3/de not_active Expired - Fee Related
- 1989-01-12 FR FR898900310A patent/FR2641549B1/fr not_active Expired - Lifetime
- 1989-01-12 GB GB8900635A patent/GB2227026B/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| FR2641549A1 (fr) | 1990-07-13 |
| FR2641549B1 (fr) | 1991-12-27 |
| DE3900593C3 (de) | 1998-11-12 |
| US5076902A (en) | 1991-12-31 |
| GB2227026A (en) | 1990-07-18 |
| GB2227026B (en) | 1992-12-23 |
| GB8900635D0 (en) | 1989-03-08 |
| DE3900593A1 (de) | 1990-07-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8363 | Opposition against the patent | ||
| 8366 | Restricted maintained after opposition proceedings | ||
| 8305 | Restricted maintenance of patent after opposition | ||
| D4 | Patent maintained restricted | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: COVALENT MATERIALS CORP., TOKYO, JP |
|
| 8328 | Change in the person/name/address of the agent |
Representative=s name: WITTE, WELLER & PARTNER, 70178 STUTTGART |
|
| 8339 | Ceased/non-payment of the annual fee |