DE3879363D1 - Photopolymerisierbare zusammensetzung, die eine initiatorkombination von 1,4- oder 9,10-dimethoxyanthracen und einem trihalomethyl-(3h-)-chinazolin-4-on enthaelt. - Google Patents

Photopolymerisierbare zusammensetzung, die eine initiatorkombination von 1,4- oder 9,10-dimethoxyanthracen und einem trihalomethyl-(3h-)-chinazolin-4-on enthaelt.

Info

Publication number
DE3879363D1
DE3879363D1 DE8888117370T DE3879363T DE3879363D1 DE 3879363 D1 DE3879363 D1 DE 3879363D1 DE 8888117370 T DE8888117370 T DE 8888117370T DE 3879363 T DE3879363 T DE 3879363T DE 3879363 D1 DE3879363 D1 DE 3879363D1
Authority
DE
Germany
Prior art keywords
dimethoxyanthracen
chinazolin
trihalomethyl
composition containing
photopolymerizable composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8888117370T
Other languages
English (en)
Other versions
DE3879363T2 (de
Inventor
Wojciech A Wilczak
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Application granted granted Critical
Publication of DE3879363D1 publication Critical patent/DE3879363D1/de
Publication of DE3879363T2 publication Critical patent/DE3879363T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE8888117370T 1987-10-23 1988-10-19 Photopolymerisierbare zusammensetzung, die eine initiatorkombination von 1,4- oder 9,10-dimethoxyanthracen und einem trihalomethyl-(3h-)-chinazolin-4-on enthaelt. Expired - Fee Related DE3879363T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/112,797 US4945027A (en) 1987-10-23 1987-10-23 1,4 or 9,10 dimethoxyanthracene triggers for 2-tri(chloro or bromo)methyl-4(1H)-quinazolimone polymerization initiators

Publications (2)

Publication Number Publication Date
DE3879363D1 true DE3879363D1 (de) 1993-04-22
DE3879363T2 DE3879363T2 (de) 1993-06-24

Family

ID=22345897

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8888117370T Expired - Fee Related DE3879363T2 (de) 1987-10-23 1988-10-19 Photopolymerisierbare zusammensetzung, die eine initiatorkombination von 1,4- oder 9,10-dimethoxyanthracen und einem trihalomethyl-(3h-)-chinazolin-4-on enthaelt.

Country Status (5)

Country Link
US (1) US4945027A (de)
EP (1) EP0313006B1 (de)
JP (1) JPH01164938A (de)
KR (1) KR890007119A (de)
DE (1) DE3879363T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06110207A (ja) * 1992-09-29 1994-04-22 Toppan Printing Co Ltd 着色性樹脂組成物
JP6380907B2 (ja) * 2014-03-25 2018-08-29 川崎化成工業株式会社 エネルギー線重合性組成物
JP7228121B2 (ja) * 2018-04-25 2023-02-24 エア・ウォーター・パフォーマンスケミカル株式会社 光重合増感剤組成物

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3729313A (en) * 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US4310615A (en) * 1974-11-13 1982-01-12 Minnesota Mining And Manufacturing Company Image transfer element having release layer
JPS53747A (en) * 1976-06-24 1978-01-06 Toshiba Monofrax Hot resisting working clothes
JPS5928328B2 (ja) * 1977-11-29 1984-07-12 富士写真フイルム株式会社 光重合性組成物
DE2967425D1 (en) * 1978-06-02 1985-05-15 Du Pont Organic halogen compounds used in direct positive emulsions
JPS6053300B2 (ja) * 1978-08-29 1985-11-25 富士写真フイルム株式会社 感光性樹脂組成物
US4371605A (en) * 1980-12-09 1983-02-01 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates
JPS5815503A (ja) * 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
JPS5978339A (ja) * 1982-10-28 1984-05-07 Fuji Photo Film Co Ltd 光重合性組成物
JPS5989303A (ja) * 1982-11-12 1984-05-23 Fuji Photo Film Co Ltd 光重合性組成物
JPS59174831A (ja) * 1983-03-24 1984-10-03 Fuji Photo Film Co Ltd 光重合性組成物
JPS606010A (ja) * 1983-06-25 1985-01-12 Mitsubishi Heavy Ind Ltd 往復動機関の給，排気弁

Also Published As

Publication number Publication date
EP0313006A3 (en) 1989-10-18
DE3879363T2 (de) 1993-06-24
KR890007119A (ko) 1989-06-19
EP0313006A2 (de) 1989-04-26
US4945027A (en) 1990-07-31
EP0313006B1 (de) 1993-03-17
JPH01164938A (ja) 1989-06-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee