DE3822921C2 - - Google Patents

Info

Publication number
DE3822921C2
DE3822921C2 DE3822921A DE3822921A DE3822921C2 DE 3822921 C2 DE3822921 C2 DE 3822921C2 DE 3822921 A DE3822921 A DE 3822921A DE 3822921 A DE3822921 A DE 3822921A DE 3822921 C2 DE3822921 C2 DE 3822921C2
Authority
DE
Germany
Prior art keywords
group
compound
photosensitive
mixture according
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3822921A
Other languages
German (de)
English (en)
Other versions
DE3822921A1 (de
Inventor
Mitsuru Koike
Nobuyuki Yoshida Shizuoka Jp Kita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE3822921A1 publication Critical patent/DE3822921A1/de
Application granted granted Critical
Publication of DE3822921C2 publication Critical patent/DE3822921C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE3822921A 1987-07-06 1988-07-06 Photopolymerisierbare zusammensetzung Granted DE3822921A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16819487 1987-07-06

Publications (2)

Publication Number Publication Date
DE3822921A1 DE3822921A1 (de) 1989-01-19
DE3822921C2 true DE3822921C2 (enExample) 1993-03-11

Family

ID=15863529

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3822921A Granted DE3822921A1 (de) 1987-07-06 1988-07-06 Photopolymerisierbare zusammensetzung

Country Status (2)

Country Link
US (1) US4950581A (enExample)
DE (1) DE3822921A1 (enExample)

Families Citing this family (113)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01229003A (ja) * 1988-03-09 1989-09-12 Fuji Photo Film Co Ltd 光重合性組成物
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
JP2571113B2 (ja) * 1988-12-29 1997-01-16 富士写真フイルム株式会社 光重合性組成物
GB8921116D0 (en) * 1989-09-18 1989-11-01 Du Pont Improvements in or relating to radiation sensitive compositions
US5100755A (en) * 1989-12-27 1992-03-31 The Mead Corporation Dye-benzyltriaryl borate photoinitiators and photohardenable composition containing these photoinitiators
US5055372A (en) * 1990-04-23 1991-10-08 The Mead Corporation Photohardenable composition containing borate salts and ketone initiators
US5153100A (en) * 1990-08-27 1992-10-06 E. I. Du Pont De Nemours And Company Borate coinitiators for photopolymerizable compositions
CA2053761A1 (en) * 1990-10-25 1992-04-26 Gregory C. Weed Borate coinitiators for photopolymerizable compositions
JP2639748B2 (ja) * 1990-10-31 1997-08-13 富士写真フイルム株式会社 感光性エレメントおよびその製造法
US5143818A (en) * 1991-02-01 1992-09-01 E. I. Du Pont De Nemours And Company Borate coinitiators for photopolymerizable compositions
US5147758A (en) * 1991-02-19 1992-09-15 E. I. Du Pont De Nemours And Company Red sensitive photopolymerizable compositions
EP0503674B1 (en) * 1991-03-15 1998-06-24 Fuji Photo Film Co., Ltd. Light-sensitive bistrihalomethyl-s-triazine compound and photopolymerizable composition containing same
EP0538997B1 (en) * 1991-10-25 1998-07-01 Minnesota Mining And Manufacturing Company Aminoketone sensitizers for aqueous soluble photopolymer compositions
EP0555749B1 (en) * 1992-02-14 1999-05-19 Shipley Company Inc. Radiation sensitive compositions and processes
US5346801A (en) * 1992-04-01 1994-09-13 Konica Corporation Method of forming images
US5846682A (en) * 1993-03-02 1998-12-08 Showa Denko K.K. Light decolorizable recording material, ink and toner
US5527921A (en) * 1995-03-21 1996-06-18 Minnesota Mining And Manufacturing Company Peroxycarboxylic ester initiators derived from nitrogen heterocycles
US5744511A (en) * 1995-04-19 1998-04-28 Tokuyama Corporation Visible ray polymerization initiator and visible ray polymerizable composition
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
EP0778292A3 (en) * 1995-12-04 1998-11-04 Bayer Corporation Method for the production of anhydride modified polyvinyl acetals useful for photosensitive compositions
WO1997021737A1 (en) * 1995-12-14 1997-06-19 Spectra Group Limited, Inc. Photoinitiator composition containing a borate salt and a hypervalent atom-containing salt
US6054501A (en) * 1996-06-12 2000-04-25 Nippon Kayaku Kabushiki Kaisha Photopolymerization initiator and energy ray curable composition containing the same
US6146789A (en) * 1996-08-15 2000-11-14 Three Bond Co., Ltd. Battery having a visible-light or near-infrared-light curing resin as an insulating seal
US6033829A (en) * 1997-06-30 2000-03-07 Showa Denko K.K. Photopolymerizable composition and dry film resist
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
US6740466B1 (en) 1999-11-15 2004-05-25 Fuji Photo Film Co., Ltd. Photopolymerizable composition and recording material using the same
EP1201722A1 (en) * 2000-10-23 2002-05-02 Loctite (R & D) Limited Polymerisation initiators, polymerisable compositions, and uses thereof
JP4512281B2 (ja) * 2001-02-22 2010-07-28 富士フイルム株式会社 ネガ型平版印刷版原版
JP4266077B2 (ja) 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
WO2003089536A2 (en) * 2002-04-19 2003-10-30 Loctite (R & D) Limited Polymerisation initiators based on ammonium tetraalkyl boranes, polymerisable compositions, and uses thereof for bonding low surface energy substrates
US6867271B1 (en) 2002-06-24 2005-03-15 Henkel Corporation Non-flammable and non-combustible adhesive bonding systems having adherence to low energy surfaces
JP4137577B2 (ja) * 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
US7338748B2 (en) * 2002-09-30 2008-03-04 Fujifilm Corporation Polymerizable composition and planographic printing plate precursor
JP2004126050A (ja) * 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
CN100590525C (zh) * 2002-12-18 2010-02-17 富士胶片株式会社 可聚合组合物和平版印刷版前体
JP4150261B2 (ja) * 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) * 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP4048133B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 感光性組成物及びそれを用いた平版印刷版原版
JP4048134B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 平版印刷版原版
JP2004252285A (ja) * 2003-02-21 2004-09-09 Fuji Photo Film Co Ltd 感光性組成物及びそれを用いた平版印刷版原版
JP2004287138A (ja) * 2003-03-24 2004-10-14 Konica Minolta Holdings Inc ホログラフィック記録用組成物、ホログラフィック記録メディア及びその記録方法
JP4299639B2 (ja) * 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
JP2005099284A (ja) * 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
US8202932B2 (en) * 2004-12-03 2012-06-19 Loctite (R&D) Limited Adhesive bonding systems having adherence to low energy surfaces
US7408012B1 (en) 2005-04-18 2008-08-05 Loctite (R&D) Limited Adhesive bonding systems having adherence to low energy surfaces
US7786183B2 (en) * 2005-06-20 2010-08-31 Dow Global Technologies Inc. Coated glass articles
US7781493B2 (en) 2005-06-20 2010-08-24 Dow Global Technologies Inc. Protective coating for window glass
EP1957457B1 (en) 2005-12-01 2013-02-27 Basf Se Oxime ester photoinitiators
WO2008077060A1 (en) 2006-12-19 2008-06-26 Dow Global Technologies, Inc. Improved composites and methods for conductive transparent substrates
EP2094463B1 (en) * 2006-12-19 2016-07-27 Dow Global Technologies LLC Encapsulated panel assemblies and method for making same
EP2121827B1 (en) * 2006-12-19 2016-10-19 Dow Global Technologies LLC Adhesion promotion additives and methods for improving coating compositions
US20110123929A1 (en) 2007-01-23 2011-05-26 Fujifilm Corporation Oxime compound, photosensitive composition, color filter, production method for the color filter, and liquid crystal display element
WO2008123110A1 (ja) * 2007-04-04 2008-10-16 Hitachi Chemical Company, Ltd. 感光性接着剤組成物、フィルム状接着剤、接着シート、接着剤パターン、接着剤層付半導体ウェハ、半導体装置、及び、半導体装置の製造方法
CN101687794B (zh) 2007-05-11 2013-09-11 巴斯夫欧洲公司 肟酯光引发剂
CN101679394B (zh) 2007-05-11 2013-10-16 巴斯夫欧洲公司 肟酯光引发剂
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
CN101868444A (zh) 2007-09-19 2010-10-20 富士胶片株式会社 炔属化合物、其盐、其缩合物、及其组合物
CN101903483B (zh) 2007-12-18 2014-09-10 陶氏环球技术公司 对玻璃粘合剂具有增强的粘合性的窗玻璃用保护涂层
US8507726B2 (en) 2008-11-03 2013-08-13 Basf Se Photoinitiator mixtures
CN103153952B (zh) 2010-10-05 2016-07-13 巴斯夫欧洲公司 苯并咔唑化合物的肟酯衍生物及其在可光聚合组合物中作为光敏引发剂的用途
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
GB2491170B (en) 2011-05-26 2013-11-06 Henkel Ireland Ltd Two-part polymerisable compositions
EP3242165B1 (en) 2011-06-21 2018-11-14 Basf Se Printing diffraction gratings on polymer substrate
JP6113181B2 (ja) 2011-12-07 2017-04-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
CN104284888B (zh) 2012-05-09 2017-10-27 巴斯夫欧洲公司 肟酯光敏引发剂
AU2013276625B2 (en) 2012-06-14 2017-09-14 Basf Se Method for manufacturing security elements and holograms
EP2895922B1 (en) 2012-09-17 2018-04-18 Basf Se Security elements and method for their manufacture
EP2909165B1 (en) 2012-10-19 2018-05-30 IGM Group B.V. Hybrid photoinitiators
AU2014270602B2 (en) 2013-05-21 2017-07-13 Basf Se Security elements and method for their manufacture
WO2015004565A1 (en) 2013-07-08 2015-01-15 Basf Se Oxime ester photoinitiators
JP6605455B2 (ja) * 2013-10-04 2019-11-13 ビーエーエスエフ ソシエタス・ヨーロピア 高光沢金属効果紙
ES2706881T3 (es) 2014-05-30 2019-04-01 Igm Resins Italia Srl Fotoiniciadores de óxido de acilfosfina multifuncionales
EP3189083B2 (en) 2014-09-04 2023-07-05 IGM Group B.V. Polycyclic photoinitiators
CN107207456B (zh) 2015-02-02 2021-05-04 巴斯夫欧洲公司 潜酸及其用途
US20180058009A1 (en) 2015-03-30 2018-03-01 Basf Se High gloss metal effect papers and boards
JP6725663B2 (ja) 2015-12-15 2020-07-22 常州強力先端電子材料有限公司Ｃｈａｎｇｚｈｏｕ Ｔｒｏｎｌｙ Ａｄｖａｎｃｅｄ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ Ｃｏ．，Ｌｔｄ． フルオレン類多官能光開始剤およびその製造ならびに使用、フルオレン類光開始剤含有感光性樹脂組成物およびその使用
EP3507279B1 (en) 2016-09-02 2020-10-14 IGM Group B.V. Polycyclic glyoxylates as photoinitiators
KR102197059B1 (ko) 2016-09-13 2020-12-31 창저우 트론리 어드벤스드 일렉트로닉 머티어리얼스 컴퍼니, 리미티드 플루오렌 광개시제, 그 제조 방법, 이를 갖는 광경화성 조성물, 및 광경화 분야에서 그 용도
JP7032416B2 (ja) 2017-02-17 2022-03-08 常州強力先端電子材料有限公司 フルオレニルアミノケトン類光開始剤、その調製方法及びフルオレニルアミノケトン類光開始剤を含有するｕｖ光硬化性組成物
WO2019162374A1 (en) 2018-02-23 2019-08-29 Basf Se Organomodified metal oxide or metalloid oxide polymer film
EP3768514A1 (en) 2018-03-22 2021-01-27 Agfa Nv A lithographic printing plate precursor
WO2019206845A1 (en) 2018-04-25 2019-10-31 Basf Se Process for the production of strongly adherent (embossed) films on flexible substrates
JP7408909B2 (ja) 2018-09-07 2024-01-09 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 多機能性ビスアシルホスフィンオキシド光開始剤
EP3856807A1 (en) 2018-09-24 2021-08-04 Basf Se Photocurable composition for use in 3d printing
CN112639034A (zh) 2018-09-24 2021-04-09 巴斯夫欧洲公司 用于3d打印的可uv固化组合物
CA3116462A1 (en) 2018-10-25 2020-04-30 Basf Se Compositions, comprising silver nanoplatelets
GB2580162B (en) 2018-12-21 2022-07-13 Henkel IP & Holding GmbH One-part photocurable (meth) acrylate compositions
JP7472429B2 (ja) 2018-12-28 2024-04-23 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 光開始剤
EP3680274A1 (en) 2019-01-14 2020-07-15 Basf Se Hydroxyurethane (meth)acrylate prepolymers for use in 3d printing
EP3680263A1 (en) 2019-01-14 2020-07-15 Basf Se Limonene-based (meth)acrylates for use in 3d printing
WO2020152021A1 (en) 2019-01-21 2020-07-30 Basf Se Security element
US12296391B2 (en) 2019-01-29 2025-05-13 Basf Se Security element
EP3965983A1 (en) 2019-05-06 2022-03-16 Basf Se Compositions, comprising silver nanoplatelets
WO2021070152A1 (en) 2019-10-11 2021-04-15 Igm Resins Italia S.R.L. Coumarin glyoxylates for led photocuring
WO2021089313A1 (en) 2019-11-07 2021-05-14 Basf Se Water-washable compositions for use in 3d printing
US20230241675A1 (en) 2020-04-23 2023-08-03 Basf Se Compositions, comprising platelet-shaped transition metal particles
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
US20230417936A1 (en) * 2021-12-27 2023-12-28 Lawrence Livermore National Security, Llc Polyvinyl toluene scintillators produced using cationic photoinitiators for additively manufactured radiation detectors
WO2023161049A1 (en) 2022-02-24 2023-08-31 Igm Resins Italia S.R.L. Photoinitiators
AU2023231419A1 (en) 2022-03-10 2024-09-19 Basf Se Casting lacquer for screen printing
CN119137225A (zh) 2022-05-06 2024-12-13 Igm集团公司 包含氧化膦光引发剂、基于噁唑的敏化剂和胺添加剂的光引发剂包
EP4273200A1 (en) 2022-05-06 2023-11-08 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers
KR20250006220A (ko) 2022-05-06 2025-01-10 아이지엠 그룹 비.브이. 포스핀 산화물 광개시제, 쿠마린계 감응제 및 아민 첨가제를 포함하는 광개시제 패키지
WO2024074945A1 (en) 2022-10-05 2024-04-11 Igm Resins Italia S.R.L. Polymeric (meth)acrylate photoinitiators
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
WO2025027517A1 (en) 2023-08-03 2025-02-06 Igm Resins Italia S.R.L. 10,11 -dihydro-5h-dibenzo[b,f]azepine derivatives as photoinitiatiors in photopolymerisation for use in photocurable compositions
EP4534614A1 (en) 2023-10-02 2025-04-09 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers
WO2025140854A2 (en) 2023-12-28 2025-07-03 Igm Resins Italia S.R.L. NOVEL SOLID FORM OF BIS(2,4,6-TRIMETHYLBENZOYL)-n-OCTYL-PHOSPHINE OXIDE
EP4578918A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Photosensitizers for photopolymerization
EP4579344A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Thioalkylcoumarin photosensitizers for photopolymerization

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5651735A (en) * 1979-10-03 1981-05-09 Asahi Chem Ind Co Ltd Photoreactive composition
US4636459A (en) * 1985-03-06 1987-01-13 Fuji Photo Film Co., Ltd. Photopolymerizable compositions
US4772541A (en) * 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
EP0223587B1 (en) * 1985-11-20 1991-02-13 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
GB8602683D0 (en) * 1986-02-04 1986-03-12 Univ Strathclyde Liquid metering device

Also Published As

Publication number Publication date
DE3822921A1 (de) 1989-01-19
US4950581A (en) 1990-08-21

Similar Documents

Publication Publication Date Title
DE3822921C2 (enExample)
DE3822909C2 (de) Photopolymerisierbares Gemisch
DE69327741T2 (de) Photopolymerisierbare Zusammensetzung
DE68921867T2 (de) Photopolymerisierbare Zusammensetzung.
EP0730201B1 (en) Sensitized photopolymerizable compositions and use thereof in lithographic printing plates
DE69222234T2 (de) Photopolymerisierbare Zusammensetzung
US4505793A (en) Photopolymerizable compositions
DE3834960C2 (de) Lichtempfindliches Gemisch
DE68921019T2 (de) Lichtempfindliche Zusammensetzungen.
DE3801065C2 (enExample)
DE10356847B4 (de) Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
DE3907666A1 (de) Photopolymerisierbare zusammensetzung
DE69305334T2 (de) Sichtbare photosensibilisatore für photopolymerisierbare zusammensetzungen
EP0332044A1 (de) 4,6-Bis-trichlormethyl-s-triazin-2-ylgruppen enthaltende heterocyclische Verbindungen, Verfahren zu ihrer Herstellung und lichtempfindliches Gemisch, das diese Verbindungen enthält
DE3851921T2 (de) Photopolymerisierbare Zusammensetzung.
DE4027301A1 (de) Photopolymerisierbares gemisch und daraus hergestelltes photopolymerisierbares aufzeichnungsmaterial
EP0321828B1 (de) Photopolymerisierbares Gemisch und daraus hergestelltes Aufzeichnungsmaterial
DE10307451A1 (de) Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
US4774163A (en) Photopolymerizable composition including an unsaturated monomer, a photopolymerization initator and a carbozole compound
EP0321826B1 (de) Photopolymerisierbares Gemisch und daraus hergestelltes Aufzeichnungsmaterial
EP0196561B1 (en) Photosensitive lithographic printing plate
DE69423504T2 (de) Photopolymerisierbare zusammensetzung
DE10326324B4 (de) Lithographiedruckplatten-Vorläufer mit 1,4-Dihydropyridin-Sensibilisator enthaltender Beschichtung, Verfahren zum Bebildern und Bebilderte Lithographiedruckplatte
DE4129279A1 (de) Photopolymerisierbare zusammensetzung
DE102004022137B3 (de) π-verzweigte Sensibilisatoren enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente

Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8181 Inventor (new situation)

Free format text: KOIKE, MITSURU KITA, NOBUYUKI, YOSHIDA, SHIZUOKA, JP

D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee