DE3822921A1 - Photopolymerisierbare zusammensetzung - Google Patents

Photopolymerisierbare zusammensetzung

Info

Publication number
DE3822921A1
DE3822921A1 DE3822921A DE3822921A DE3822921A1 DE 3822921 A1 DE3822921 A1 DE 3822921A1 DE 3822921 A DE3822921 A DE 3822921A DE 3822921 A DE3822921 A DE 3822921A DE 3822921 A1 DE3822921 A1 DE 3822921A1
Authority
DE
Germany
Prior art keywords
group
photopolymerizable composition
composition according
compound
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE3822921A
Other languages
German (de)
English (en)
Other versions
DE3822921C2 (enExample
Inventor
Mitsuru Koike
Nobuyuki Kita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE3822921A1 publication Critical patent/DE3822921A1/de
Application granted granted Critical
Publication of DE3822921C2 publication Critical patent/DE3822921C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE3822921A 1987-07-06 1988-07-06 Photopolymerisierbare zusammensetzung Granted DE3822921A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16819487 1987-07-06

Publications (2)

Publication Number Publication Date
DE3822921A1 true DE3822921A1 (de) 1989-01-19
DE3822921C2 DE3822921C2 (enExample) 1993-03-11

Family

ID=15863529

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3822921A Granted DE3822921A1 (de) 1987-07-06 1988-07-06 Photopolymerisierbare zusammensetzung

Country Status (2)

Country Link
US (1) US4950581A (enExample)
DE (1) DE3822921A1 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0377321A3 (en) * 1988-12-29 1991-11-06 Fuji Photo Film Co., Ltd. Photopolymerizable composition
EP0475153A1 (en) * 1990-08-27 1992-03-18 E.I. Du Pont De Nemours And Company Borate coinitiators for photopolymerizable compositions
EP0483648A3 (en) * 1990-10-25 1993-01-13 E.I. Du Pont De Nemours And Company Borate coinitiators for photopolymerizable compositions
EP0538997A1 (en) * 1991-10-25 1993-04-28 Minnesota Mining And Manufacturing Company Aminoketone sensitizers for aqueous soluble photopolymer compositions
US6740466B1 (en) 1999-11-15 2004-05-25 Fuji Photo Film Co., Ltd. Photopolymerizable composition and recording material using the same

Families Citing this family (108)

* Cited by examiner, † Cited by third party
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JPH01229003A (ja) * 1988-03-09 1989-09-12 Fuji Photo Film Co Ltd 光重合性組成物
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
GB8921116D0 (en) * 1989-09-18 1989-11-01 Du Pont Improvements in or relating to radiation sensitive compositions
US5100755A (en) * 1989-12-27 1992-03-31 The Mead Corporation Dye-benzyltriaryl borate photoinitiators and photohardenable composition containing these photoinitiators
US5055372A (en) * 1990-04-23 1991-10-08 The Mead Corporation Photohardenable composition containing borate salts and ketone initiators
JP2639748B2 (ja) * 1990-10-31 1997-08-13 富士写真フイルム株式会社 感光性エレメントおよびその製造法
US5143818A (en) * 1991-02-01 1992-09-01 E. I. Du Pont De Nemours And Company Borate coinitiators for photopolymerizable compositions
US5147758A (en) * 1991-02-19 1992-09-15 E. I. Du Pont De Nemours And Company Red sensitive photopolymerizable compositions
US5362874A (en) * 1991-03-15 1994-11-08 Fuji Photo Film Co., Ltd. Light-sensitive bistrihalomethyl-s-triazine compounds
EP0555749B1 (en) * 1992-02-14 1999-05-19 Shipley Company Inc. Radiation sensitive compositions and processes
US5346801A (en) * 1992-04-01 1994-09-13 Konica Corporation Method of forming images
US5846682A (en) * 1993-03-02 1998-12-08 Showa Denko K.K. Light decolorizable recording material, ink and toner
US5527921A (en) * 1995-03-21 1996-06-18 Minnesota Mining And Manufacturing Company Peroxycarboxylic ester initiators derived from nitrogen heterocycles
US5744511A (en) * 1995-04-19 1998-04-28 Tokuyama Corporation Visible ray polymerization initiator and visible ray polymerizable composition
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
EP0778292A3 (en) * 1995-12-04 1998-11-04 Bayer Corporation Method for the production of anhydride modified polyvinyl acetals useful for photosensitive compositions
AU1565497A (en) * 1995-12-14 1997-07-03 Spectra Group Limited, Inc. Photoinitiator composition containing a borate salt and a hypervalent atom-containing salt
US6054501A (en) * 1996-06-12 2000-04-25 Nippon Kayaku Kabushiki Kaisha Photopolymerization initiator and energy ray curable composition containing the same
US6146789A (en) * 1996-08-15 2000-11-14 Three Bond Co., Ltd. Battery having a visible-light or near-infrared-light curing resin as an insulating seal
US6033829A (en) * 1997-06-30 2000-03-07 Showa Denko K.K. Photopolymerizable composition and dry film resist
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
EP1201722A1 (en) * 2000-10-23 2002-05-02 Loctite (R & D) Limited Polymerisation initiators, polymerisable compositions, and uses thereof
JP4512281B2 (ja) * 2001-02-22 2010-07-28 富士フイルム株式会社 ネガ型平版印刷版原版
JP4266077B2 (ja) 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
AU2003225512A1 (en) * 2002-04-19 2003-11-03 Loctite (R And D) Limited Polymerisation initiators based on ammonium tetraalkyl boranes, polymerisable compositions, and uses thereof for bonding low surface energy substrates
US6867271B1 (en) 2002-06-24 2005-03-15 Henkel Corporation Non-flammable and non-combustible adhesive bonding systems having adherence to low energy surfaces
JP2004126050A (ja) * 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
JP4137577B2 (ja) * 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
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CN100590525C (zh) * 2002-12-18 2010-02-17 富士胶片株式会社 可聚合组合物和平版印刷版前体
JP4150261B2 (ja) * 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) * 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP4048134B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 平版印刷版原版
JP2004252285A (ja) * 2003-02-21 2004-09-09 Fuji Photo Film Co Ltd 感光性組成物及びそれを用いた平版印刷版原版
JP4048133B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 感光性組成物及びそれを用いた平版印刷版原版
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JP4299639B2 (ja) * 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
JP2005099284A (ja) * 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
US8202932B2 (en) * 2004-12-03 2012-06-19 Loctite (R&D) Limited Adhesive bonding systems having adherence to low energy surfaces
US7408012B1 (en) 2005-04-18 2008-08-05 Loctite (R&D) Limited Adhesive bonding systems having adherence to low energy surfaces
US7786183B2 (en) * 2005-06-20 2010-08-31 Dow Global Technologies Inc. Coated glass articles
US7781493B2 (en) 2005-06-20 2010-08-24 Dow Global Technologies Inc. Protective coating for window glass
CN102093282B (zh) 2005-12-01 2014-02-12 西巴控股有限公司 肟酯光敏引发剂
KR101434701B1 (ko) * 2006-12-19 2014-08-26 다우 글로벌 테크놀로지스 엘엘씨 접착 촉진 첨가제 및 코팅 조성물의 개선 방법
US7955696B2 (en) * 2006-12-19 2011-06-07 Dow Global Technologies Llc Composites and methods for conductive transparent substrates
US7939161B2 (en) * 2006-12-19 2011-05-10 Dow Global Technologies Llc Encapsulated panel assemblies and methods for making same
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EP0377321A3 (en) * 1988-12-29 1991-11-06 Fuji Photo Film Co., Ltd. Photopolymerizable composition
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US5153100A (en) * 1990-08-27 1992-10-06 E. I. Du Pont De Nemours And Company Borate coinitiators for photopolymerizable compositions
EP0483648A3 (en) * 1990-10-25 1993-01-13 E.I. Du Pont De Nemours And Company Borate coinitiators for photopolymerizable compositions
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